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Texturing additive for inverted pyramid textured monocrystalline silicon wafer and application thereof

A single crystal silicon wafer and inverted pyramid technology, applied in the direction of single crystal growth, single crystal growth, sustainable manufacturing/processing, etc., can solve the problems of large environmental pollution control, high cost, inability to use both texturing equipment, etc. Inexpensive, simple to manufacture and use, the effect of reducing the chance of compounding

Active Publication Date: 2018-04-24
CHANGZHOU SHICHUANG ENERGY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Wet chemical etching uses precious metals, which is expensive; and wet chemical etching also uses a large amount of hydrofluoric acid and nitric acid, which puts great pressure on environmental protection and pollution control; in addition, the use of metal catalysis to prepare suede requires strict cleaning of silicon wafers. Remove the nano-metal particles remaining between the textured microstructures, otherwise the nano-metal particles will be brought into the subsequent process (such as diffusion), which is fatal to the silicon wafer itself and the diffusion equipment
[0005] To sum up, the conventional texturing process of monocrystalline silicon wafers based on alkaline solution can only produce convex pyramid textured surfaces on the surface of single crystal silicon wafers, but cannot form inverted pyramid textured textures.
However, the existing monocrystalline silicon wafer wet chemical etching texturing process for forming the textured surface of the inverted pyramid requires the catalysis of silver, copper and other precious metal ions, and the texturing equipment cannot be used for the lye texturing process, and the texturing equipment needs to be replaced equipment

Method used

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  • Texturing additive for inverted pyramid textured monocrystalline silicon wafer and application thereof
  • Texturing additive for inverted pyramid textured monocrystalline silicon wafer and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] 1) Prepare texturing additives: add 0.5g nonionic surfactant, 60g cationic surfactant, 10g polyethylene glycol, and 20g organic salt into the deionized solution, mix well to make 100g texturing additive solution;

[0031] The non-ionic surfactant is polyoxyethylene ether containing alkylphenol, high-carbon fatty alcohol polyoxyethylene ether, fatty acid polyoxyethylene ester, polyoxyethylene amine, alkyl alcohol amide, ethanolamine, sucrose ester, alkyl alcohol One of amides;

[0032] The cationic surfactants include fatty amine salts, ethanolamine salts, quaternary ammonium salts, imidazoline, polyethylene polyamine salts, morpholine guanidines, and triazine derivatives;

[0033] Described organic salt is two kinds in sodium acetate, pyridinium acetate, sodium ethylate;

[0034] The molecular weight of the polyethylene glycol is 200;

[0035] 2) Prepare the texturing liquid: add 100g of the texturing additive solution prepared in step 1) to 2Kg of the alkali solution...

Embodiment 2

[0039] 1) Prepare texturing additives: Add 50g of nonionic surfactant, 1g of cationic surfactant, 2g of polyethylene glycol, and 1g of organic salt into the deionized solution, mix well to make 100g of texturing additive solution;

[0040] The nonionic surfactants include polyoxyethylene ethers containing alkylphenols, polyoxyethylene ethers of high-carbon fatty alcohols, polyoxyethylene fatty acid esters, polyoxyethylene amines, alkanolamides, ethanolamines, sucrose esters, and alkyl alcohols. amides;

[0041] The cationic surfactant is one of fatty amine salts, ethanolamine salts, quaternary ammonium salts, imidazoline, polyethylene polyamine salts, morpholine guanidines, and triazine derivatives;

[0042] Described organic salt is the one in sodium acetate, pyridinium acetate, sodium ethylate;

[0043] The molecular weight of the polyethylene glycol is 2000;

[0044] 2) Configure the texturing liquid: add 100g of the texturing additive solution prepared in step 1) to 50Kg o...

Embodiment 3

[0048] 1) Configure texturing additives: add 20g nonionic surfactant, 25g cationic surfactant, 6g polyethylene glycol, and 12g organic salt into deionized solution, mix well to make 100g texturing additive solution;

[0049] The nonionic surfactants include polyoxyethylene ethers containing alkylphenols, polyoxyethylene ethers of high-carbon fatty alcohols, polyoxyethylene fatty acid esters, polyoxyethylene amines, alkanolamides, ethanolamines, sucrose esters, and alkyl alcohols. Five of the amides;

[0050] The cationic surfactants include three types of fatty amine salts, ethanolamine salts, quaternary ammonium salts, imidazoline, polyethylene polyamine salts, morpholine guanidines, and triazine derivatives;

[0051] Described organic salt comprises sodium acetate, pyridinium acetate, sodium ethylate;

[0052] The molecular weight of the polyethylene glycol is 1200;

[0053] 2) Configure the texturing liquid: add 100g of the texturing additive solution prepared in step 1) ...

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Abstract

The invention discloses a texturing additive for inverted pyramid textured monocrystalline silicon wafer and application thereof. The texturing additive comprises the following components: a nonionicsurfactant, a cationic surfactant, polyethylene glycol, an organic salt and the balance water. An alkali solution added with the texturing additive provided by the invention can be used for preparation of an inverted pyramid texture on a monocrystalline silicon wafer surface, catalysis of silver, copper and other precious metal ions is not needed, the texturing cost can be lowered, environmental pollution is reduced, therefore the texturing additive is more conducive to the process stability of crystalline silicon solar cells, and has good practical value. By using the alkali solution added with the texturing additive provided by the invention for texturing of a monocrystalline silicon wafer surface, a uniform, fine and dense textured inverted pyramid can be obtained. And the texturing additive provided by the invention does not contain isopropanol or ethanol, has no toxicity, corrosiveness, irritation, also has no burning or explosion hazard, and can avoid environmental pollution. Moreover, the manufacturing and use process of the texturing additive is simple, employs cheap equipment and has good repeatability.

Description

technical field [0001] The invention relates to a texturizing additive for an inverted pyramid textured single crystal silicon wafer and an application thereof. Background technique [0002] In order to improve the performance and efficiency of monocrystalline silicon solar cells, it is necessary to fabricate a textured surface on the surface of the monocrystalline silicon wafer. The effective textured structure can make the incident sunlight reflect and refract multiple times on the surface of the silicon wafer, which not only significantly reduces the The reflectivity of the chip or cell, and change the direction of incident light in the silicon, prolonging the optical path, thereby increasing the absorption rate of the silicon chip for infrared light. [0003] The textured surface of a conventional monocrystalline silicon wafer is a pyramid textured surface formed by etching the surface of a silicon wafer with an alkali solution, and the textured surface has a convex pyra...

Claims

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Application Information

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IPC IPC(8): C30B33/10C30B29/06H01L31/18
CPCC30B29/06C30B33/10H01L31/1804Y02E10/547Y02P70/50
Inventor 杨立功符黎明
Owner CHANGZHOU SHICHUANG ENERGY CO LTD
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