The invention discloses a mark point
layout method and device for rotation monitoring and a medium. The method comprises the steps of obtaining a curved surface normal vector and a curved surface center point of a curved
surface structure to be monitored; acquiring the optimal position of the binocular camera; obtaining a threshold value of a
sight angle of the binocular camera according to the eccentricity of the elliptical
distortion of the circular mark point; obtaining the relationship between the
visibility of points on each position of the curved surface and the rotation angle of the curved
surface structure; obtaining the relationship between the elliptical
distortion and the rotation angle of the circular mark point; obtaining an image available frame of each
point location under the
sight line of the current rotation angle; and constructing mark point selection logic to obtain an optimal
layout position of the mark points. The positioning method of the binocular camera and the positioning method of the position of the mark point are adopted to optimize the
layout of the mark point, the elliptical
distortion of the mark point is reduced, the precision of rotation monitoring is improved, the layout of the mark point can be optimized, the measurement blind area is avoided, the number of the mark point is reduced, the time for pasting and removing the mark point in the measurement operation is shortened, and the measurement efficiency is improved.