Method for preparing diamond film through multiple-doped hot filament chemical vapor deposition

A technology of diamond thin film and hot wire chemistry, which is applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of processing accuracy and surface finish, difficulty in grinding and polishing, and decrease in tool durability. Achieve the effect of improving insulation performance and smoothness, and facilitating adhesion
CN102586762AActive Publication Date: 2012-07-18SHANGHAI JIAO TONG UNIV +1
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Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
SHANGHAI JIAO TONG UNIV
Publication Date
2012-07-18

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Abstract

The invention discloses a method for preparing a diamond film through multiple-doped hot filament chemical vapor deposition and a reaction gas conveying device for the method. The method uses silicon, silicon carbide or silicon nitride ceramics, hard alloy and high-melting-point metal materials (including tungsten, tantalum, molybdenum, titanium and the like) as a substrate and adopts a chemical vapor deposition (CVD) method as the deposition means, an organic compound containing Si, an organic compound containing Si and N, an organic compound containing Si and B or an organic compound containing Si, N and B are simultaneously added into reaction gas hydrogen and acetone (or acetone and carbinol) steam to form a multiple-doped system. a submicron or nanoscale diamond film coating is obtained through the reaction, and the coating thickness can be adjusted in a range of 10-50 mum. The diamond film has the characteristics of abrasion resistance, corrosion resistance, high insulation resistance (in a boron-free occasion), smooth surface, small friction coefficient, easy grinding and polishing and the like, namely has the double advantages of a micro-diamond coating and a nano-diamond coating.
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Description

technical field

[0001] The invention relates to a preparation method in the field of thin film technology, in particular to a method for preparing a diamond thin film by multi-component doped hot wire chemical vapor deposition and a reaction gas delivery device. Background technique

[0002] Chemical vapor deposition (referred to as CVD method, Chemical Vapor Deposition) diamond film has various excellent physical and chemical properties, its hardness is extremely high, and the friction coefficient between metal and ceramics is small, it has excellent thermal conductivity and Excellent chemical stability. Intrinsic diamond film is a good insulator, and it is an excellent semiconductor material after doping. In addition, the optical transmittance of diamond film coating is also very good. At present, CVD diamond technology has been practically applied, such as coating molds, cutting tools and wear-resistant devices in the field of tools, electrochemical corrosion-resistant a...

Claims

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