The invention relates to the technical field of
semiconductor probe cleaning
abrasive paper, in particular to gradient
elastomer abrasive paper for cleaning a
semiconductor probe and a preparation method of the gradient
elastomer abrasive paper. According to the technical scheme, the abrasive paper comprises a base, an abrasive paper body, a supporting plate, a mounting frame and a placement box, the supporting plate is arranged above the base, a supporting
pipe is rotatably mounted in the supporting plate, the placement box is arranged at the upper end of the supporting
pipe, and the abrasive paper body is arranged above the placement box; the abrasive paper body sequentially comprises a working face, a middle
transition layer, a buffering supporting layer and a flexible base material from bottom to top. According to the invention, on the basis of the rule of'
negative correlation between
coating thickness and roughness', through a multi-stage differential thickness
coating process and in combination with an equipment structure of negative pressure adsorption and pressure ring dual fixation, on the premise of not changing a core formula, independent and accurate regulation and control of
surface roughness, decoupling of cleaning power and probe protection functions are realized,
chip accommodating and heat dissipation performances are improved, and the service life of the
chip is prolonged. And the cleaning requirements of advanced-process
semiconductor probes are met.