The invention discloses a pulsed high-intensity
magnetic field generation device and method. The device comprises a
vacuum chamber; the spiral
backflow assembly is located in the vacuum cavity and comprises a conductive bottom plate, a conductive top plate located over the conductive bottom plate and a plurality of conductive spiral rods, a first through hole is formed in the conductive bottom plate, one end of each conductive spiral rod is connected to the conductive bottom plate, and the other end of each conductive spiral rod is connected to the conductive top plate; the plurality of conductive screw rods are uniformly distributed in the circumferential direction around the axis of the first through hole and have the same spiral direction; the
plasma generating
assembly comprises a first conductive block penetrating through the first through hole and not making contact with the bottom plate, a second conductive block located over the first conductive block and connected with the conductive top plate and a plurality of micron-sized conductive wires, one ends of the micron-sized conductive wires are connected to the first conductive block, and the other ends of the micron-sized conductive wires are connected to the second conductive block; the plurality of micron-sized conductive wires are uniformly distributed in the circumferential direction around the axis of the first through hole; the positive
electrode of the
pulse current source is electrically connected to the conductive bottom plate, and the negative
electrode is electrically connected to the first conductive block. The invention aims to generate pulsed
magnetic field intensity by using a simple device structure.