The invention provides
semiconductor processing equipment and a direct-
current voltage signal control system thereof. According to the
system, a first
signal generation module and a second
signal generation module are controlled to work independently, the starting states are mutually exclusive, direct-
current electric energy is obtained to generate a first direct-
current voltage signal and a second direct-
current voltage signal which are not overlapped in a
time domain, and the first direct-current
voltage signal and the second direct-current
voltage signal are provided for
semiconductor processing equipment to form bias
voltage; and the acceleration process of charged particles in the
plasma is controlled. According to the invention, the
system structure can be simplified, quick-response switch control can be realized,
short circuit of a circuit can be prevented, the safety and stability of
system operation can be improved, the flexibility of signal regulation and control can be enhanced, the
pulse waveform can be optimized in a targeted manner, and the
processing performance of
semiconductor processing can be improved.