The invention relates to a
passivation method of an
excimer laser gas configuration device. The method is characterized in that the method comprises the following steps: 1, carrying out
passivation preprocessing: cleaning the
excimer laser gas configuration device to remove impurities therein, and blowing the
excimer laser gas configuration device by N2; 2, carrying out
passivation processing: inletting a
mixed gas of F2 and He to the
excimer laser gas configuration device, maintaining a constant temperature and a
constant pressure for a period of time, and blowing the
excimer laser gas configuration device by N2; and 3, inletting N2 to the
excimer laser gas configuration device, and sealing to complete the passivation of the excimer laser gas configuration device. The He gas with small molecular weight and strong
diffusion capability is used to substitute N2 used in the prior art, and passivation temperature conditions are changed, so an oxidation film which is stable and compact is tough and firm because of the increased penetration degree, thereby the further
corrosion of a
metal matrix can be effectively controlled. A configured excimer laser which has the advantages of stable output energy and uniform
energy distribution can completely satisfy requirements of
laser treatment for ophthalmic operations and costs low.