The invention relates to a preparation method of a
surface acoustic wave filter
chip with a frequency adjustment structure, and the method comprises the following steps: S1, carrying out the
spin coating of a layer of
photoresist on one side surface of a substrate, and carrying out the photoetching operation for patterning; s2, evaporating a layer of
titanium-
aluminum electrode on one side surface of the
patterned substrate, removing the
photoresist, completing
electrode patterning, and forming an interdigital
metal region on one side surface of the substrate; and S3,
sputtering silicon dioxide on one side surface of the substrate in a magnetron
sputtering manner, so that the substrate between the interdigital
metal regions is filled with the
silicon dioxide filling layer, and a
silicon dioxide
protection layer is formed on the interdigital
metal regions and the
silicon dioxide filling layer. According to the
surface acoustic wave filter, the combination mode of the interdigital metal area and the
silicon dioxide material is ingeniously designed, complex trim operation is avoided, the
frequency characteristic of the
surface acoustic wave filter is effectively improved, meanwhile, the
structural stability and the production efficiency of the device are guaranteed, and the production cost is reduced.