Patents
Literature
Patsnap Eureka AI that helps you search prior art, draft patents, and assess FTO risks, powered by patent and scientific literature data.

10results about How to "Reduce electron cloud density" patented technology

High-temperature-resistant nanofiltration membrane and preparation method thereof

The invention relates to the technical field of nanofiltration membranes, in particular to a high-temperature-resistant nanofiltration membrane and a preparation method thereof. The nanofiltration membrane is prepared by the method. The method comprises the following steps: preparing a nano layer; coating the surface of the porous support layer with a CHO-SiO2 nano particle solution with the required mass concentration to form a base membrane containing a nano layer; preparing a high-temperature-resistant nanofiltration membrane; immersing the base membrane into a water phase solution, taking out the base membrane after the first soaking treatment is completed, and air-drying water drops on the surface of the base membrane; secondly, soaking the base membrane into an oil phase solution, taking out the base membrane after the second soaking treatment is completed, and drying the base membrane to obtain the high-temperature-resistant nanofiltration membrane, the water-phase solution comprises polyamine, an acid absorbent, inorganic salt and a first organic solvent; the polyamine is a dibenzo N heterocyclic derivative; the oil phase solution comprises multi-element acyl chloride. The invention can solve the problem that the film is easy to fall off after being formed by directly introducing nanoparticles in the prior art.
Owner:HUNAN OVAY TECH CO LTD

Bio-based self-repairing polyurethane hot melt adhesive and preparation method thereof

The invention discloses a bio-based self-repairing polyurethane hot melt adhesive and a preparation method thereof. The preparation method comprises the following steps: uniformly mixing soybean oil-based polyol, PEG-400 and 1, 4-butanediol to obtain a mixture A, uniformly mixing the mixture A with MDI, reacting to obtain a prepolymer B, adding propyl gallate into the prepolymer B, heating until the propyl gallate is completely dissolved and is uniformly mixed with the prepolymer B, adding a catalyst, and reacting to obtain the bio-based self-repairing polyurethane hot melt adhesive. According to the invention, soybean oil-based polyol is used as a soft segment, MDI is used as a hard segment, 1, 4-butanediol is used as a chain extender, and propyl gallate is used as a cross-linking agent, so that the polyurethane resin for the bio-based hot melt adhesive is prepared; the contradictory problem of high strength and low softening point of polyurethane is solved through reversible reaction of phenolic hydroxyl group of propyl gallate and isocyanate, and the hot melt adhesive film with high bonding strength, low softening point, processability and repairability is provided.
Owner:QUANGANG PETROCHEM RES INST OF FUJIAN NORMAL UNIV

A method for preparing mesophase asphalt by catalysis using a promoter-Lewis acid system

The present invention relates to a method for preparing mesophase asphalt by catalysis of a co-catalyst-Lewis acid system, using raw material asphalt with low softening point, Lewis acid as main catalyst, acetic acid and isopropyl chloride as co-catalysts for catalytic polymerization. First, the Lewis acid and raw material asphalt are ground and evenly put into a customized reactor at a mass ratio of 6 to 12:100, and then the co-catalyst and Lewis acid are added to the reactor at a molar ratio of 4 to 60:100, and the reactor is kept at a constant temperature for 3-8 hours under the condition of 200-400°C. By adding a small amount of co-catalyst, the catalytic activity of Lewis acid can be improved, and in the case of low Lewis acid addition, a fused mesophase asphalt is directly generated in one step. The catalyst used in the present invention has good safety, is non-toxic and non-corrosive, and has a mild and convenient reaction process.
Owner:BEIJING UNIV OF CHEM TECH

A near-infrared photoactivated nitrogen mustard drug compound, its preparation method and application

This invention discloses a near-infrared photoactivated nitrogen mustard drug compound, its preparation method, and its applications. The general structural formula of the near-infrared photoactivated nitrogen mustard drug compound is shown below: where R1 and R2 are both optionally selected from methyl, ethyl, n-propyl, n-butyl, n-pentyl, and n-hexyl. This compound reduces the toxic side effects of nitrogen mustard through a prodrug strategy. This compound utilizes the synergistic effect of nitrogen mustard chemotherapy and photodynamic therapy with a photosensitizer to effectively inhibit tumor growth. Simultaneously, the introduction of the photosensitizer imparts fluorescence changes before and after nitrogen mustard drug release, enabling visualization of drug release. This compound has broad application prospects in reducing drug toxicity and anti-tumor activity. The near-infrared photoactivated nitrogen mustard prodrug / drug preparation method provided by this invention is simple, uses inexpensive and readily available raw materials, has a simple synthesis process, and is easy to separate and purify, making it suitable for large-scale production and widespread application.
Owner:CENT SOUTH UNIV

A kind of high temperature resistant nylon engineering plastic and preparation method thereof

The present invention relates to a kind of high temperature resistant nylon engineering plastic and preparation method thereof, and belongs to the technical field of polymer materials. The high temperature resistant nylon engineering plastic comprises, by weight, 80-120 parts of nylon resin, 4-6 parts of inorganic filler, 4-6 parts of glass fiber, 2-10 parts of heat-resistant modifier, 1-2 parts of coupling agent, 1-3 parts of polyethylene wax, 0.5-1.5 parts of antioxidant, and 1-2 parts of flame retardant; the carbonyl and maleimide groups of the heat-resistant modifier strengthen the intermolecular effect, improve the glass transition temperature and melting point, and the intermediate products 1 and 2 enhance the high temperature resistance. In addition, the sulfone group absorbs electrons to enhance thermal stability, and the tetrahydrofuran ring and acrylate resist decomposition, thereby improving stability and water resistance; the flame retardant boron and nitrogen cooperate, form a B-O-C carbon layer at high temperature, release flame retardant gas, and significantly improve flame retardant performance. The high temperature resistant nylon engineering plastic prepared by the present invention not only has good high temperature resistance and water resistance, but also has excellent flame retardant performance.
Owner:GUANGDONG HUANSU ZHONGCHUANG IND CO LTD

High-purity spherical zinc oxide-silica synergistic photocatalytic air purification material

This invention belongs to the field of air purification materials technology, specifically relating to a high-purity spherical zinc oxide-silica synergistic photocatalytic air purification material. By weight, it comprises 100 parts of silica-coated high-purity spherical zinc oxide, 1-3 parts of a silanized porphyrin trifluoromethyl functional polymer, 2400-2950 parts of ethanol, 101.5-204 parts of deionized water, and 0.006-0.06 parts of glacial acetic acid. The high-purity spherical zinc oxide-silica synergistic photocatalytic air purification material prepared by this invention exhibits improved interface stability, a broadened spectral response range, and pollutant degradation capabilities.
Owner:JIAN YUSHUN NEW MATERIALS CO LTD

A class of chiral organic photosensitive semiconductors, their preparation methods and applications

The present invention belongs to the field of organic optoelectronic technology, and discloses a class of chiral organic photosensitive semiconductors and a preparation method and application thereof. The structure of the class of chiral organic photosensitive semiconductors is shown below. The organic photosensitive semiconductor of the present invention has strong chemical stability and chemical modifiability based on the quinoxaline unit; the electronegativity of its nitrogen atom is greater than that of the carbon atom, and the electron cloud density of the conjugated orbit of the heterocyclic ring is reduced by replacing the C atom with an N atom in the six-membered heterocyclic ring, that is, the electron deficiency of the heterocyclic ring is increased, which is beneficial to reduce the LUMO energy level of the compound, thereby adjusting the optical and carrier transport properties of the semiconductor compound, and can be used to prepare a circularly polarized light detector.
Owner:SOUTH CHINA UNIV OF TECH

Method for removing titanium impurities from phosphoric acid solutions

PendingCN122585994AReduce electron cloud densityincrease the length
The application discloses a method for removing titanium impurities in phosphoric acid solution, which comprises the following steps: extracting the phosphoric acid solution containing titanium impurities by using an organic solvent, and collecting the organic phase; mixing the organic phase with the phosphoric acid solution, adding an oxidant and hydrofluoric acid, and mixing uniformly to obtain a mixed solution; adding an ammonium fluoride solution dropwise into the mixed solution to react, and obtaining a reaction solution; washing, clarifying and separating the phases of the reaction solution, and back-extracting the organic phase to obtain the phosphoric acid solution from which the titanium impurities are removed; the removal method is characterized in that: firstly, trace H2O2 is used to convert titanium into active peroxotitanium species; secondly, the initiation effect of NH4F is used to activate the activity of fluoride ions; finally, HF is used as a main fluorine source to form a stable fluorotitanium complex and migrate to the acid phase, and low-titanium purified phosphoric acid is obtained after separation, so that the removal of titanium impurities is realized.
Owner:GUANGXI CHUAN JIN NUO CHEM CO LTD

A hollow hierarchical nano-wire sensing material, a preparation method thereof, and an ammonia gas sensor

This application discloses a hollow hierarchical nanowire sensitive material, its preparation method, and an ammonia sensor. The preparation method includes the following steps: (1) adding hollow carbon nanofibers to a mixture of ethanol and water and mixing evenly, then adding nickel salt and urea sequentially, and reacting at 70-90°C. The resulting precipitate is washed and dried, and then calcined at 300-400°C to obtain nickel oxide nanowires; (2) adding the nickel oxide nanowires obtained in the above steps to water and dispersing evenly, then adding aniline, protic acid, and an initiator sequentially, and reacting at 0-4°C. The resulting precipitate is washed and dried to obtain the hollow hierarchical nanowire sensitive material. This application can improve the sensitivity of ammonia sensor monitoring.
Owner:FUJIAN JIUCE GAS GRP CO LTD

Self-repairing polyurethane hot melt adhesive and preparation method thereof

The invention discloses a self-repairing polyurethane hot melt adhesive and a preparation method thereof. The preparation method comprises the following steps: uniformly stirring adipic acid polyester polyol, polypropylene glycol and 1, 4-butanediol to obtain a mixture A, uniformly mixing the mixture A with MDI, reacting to obtain a prepolymer B, adding propyl gallate into the prepolymer B, heating until the propyl gallate is completely dissolved and is uniformly mixed with the prepolymer B, adding a catalyst, and stirring to obtain a mixture B; and reacting to obtain the self-repairing polyurethane hot melt adhesive. Polypropylene glycol and adipic acid series polyester glycol are adopted as soft segments, MDI is adopted as a hard segment, 1, 4-butanediol is adopted as a chain extender, propyl gallate is adopted as a cross-linking agent, the polyurethane resin for the hot melt adhesive is prepared, and the contradiction problem of high strength and low softening point of polyurethane is solved through the reversible reaction of phenolic hydroxyl groups of propyl gallate and isocyanate. Through reversibility of phenolic carbamate formed by gallic acid phenolic hydroxyl groups and isocyanate, the hot melt adhesive film with high bonding strength, low softening point, processability and repairability is provided.
Owner:QUANGANG PETROCHEM RES INST OF FUJIAN NORMAL UNIV