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14 results about "Iodine compounds" patented technology

The most common compounds of iodine are the iodides of sodium and potassium (KI) and the iodates (KIO3). occurs naturally only in combination in small quantities (as in sea water or rocks) Iodine compounds are used as germicides, antiseptics, and dyes.

Resist composition, laminate, and pattern formation method

This invention provides a non-chemically amplified resist composition that exhibits excellent sensitivity and resolution in photolithography using high-energy rays, as well as a pattern formation method using the resist composition. [Solution] A resist composition comprising a hypervalent iodine compound represented by formula (1), a carboxyl group-containing compound, and a solvent. TIFF2026086143000141.tif46166 (In the formula, R 11 R is a hydrocarbyl group having 1 to 10 carbon atoms, which may contain a halogen atom or a heteroatom. 21 X is a C1-C40 hydrocarbyl group which may contain a halogen atom or a heteroatom. 31 Or it is S. 31 This is a hydrocarbyl group which may contain a hydrogen atom, a halogen atom, or a heteroatom.
Owner:SHIN ETSU CHEMICAL CO LTD

Hypervalent iodine compound, resist composition, laminate obtained from the resist composition, and patterning process

PendingUS20260193177A1HalogenImage resolution
The present invention is a hypervalent iodine compound having a structure represented by the following general formula (1), where R1 and R2 each independently represent a halogen atom or a hydrocarbyl group having 1 to 10 carbon atoms and optionally containing a heteroatom, the R1 and the R2 optionally being bonded to each other to form a ring together with the carbon atoms bonded thereto and the atoms between the carbon atoms. This can provide: a non-chemically amplified resist composition excellent in sensitivity and resolution in lithography using a high-energy beam, especially electron beam (EB) lithography and EUV lithography; a laminate obtained from the resist composition; and a patterning process using the resist composition.
Owner:SHIN ETSU CHEMICAL CO LTD

A method for preparing functionalized polyolefins

PendingCN122080274AImidePolymer science
This invention discloses a method for preparing functionalized polyolefins, belonging to the field of polymer modification technology. The method includes the following steps: homogenizing a polyolefin, a grafting monomer, and a high-valent iodine compound, followed by heating to obtain the functionalized polyolefin; wherein the grafting monomer is selected from at least one of N-hydroxyphthalimide and its derivatives, and N-hydroxysuccinimide and its derivatives. This method uses a high-valent iodine compound as an initiator, which preferentially activates the polyolefin molecular chain and forms a pre-bonded complex with the grafting monomer. This significantly inhibits the non-selective β-fracture degradation and inter-chain crosslinking of the polyolefin backbone caused by free radicals, maintains the stability of the base molecular weight, and achieves efficient grafting of the grafting monomer.
Owner:CHAIN WALK NEW MATERIAL TECH (GUANGZHOU) CO LTD

A CT-enhanced hydrogel and a preparation method and application thereof

The present application relates to the technical field of CT enhanced imaging hydrogel, and particularly relates to a CT enhanced imaging hydrogel, a preparation method and application thereof. The CT enhanced imaging hydrogel is obtained by in-situ cross-linking reaction of a hydrogel framework and an iodine-substituted cross-linking agent. The hydrogel framework comprises a multi-arm polyethylene glycol derivative. The amino compound is modified by an iodine-containing compound, and then condensed by an amino-carboxyl condensing agent to obtain the iodine-substituted cross-linking agent, which can introduce iodine atoms with a wider density range, and has a low influence on the cross-linking reaction of the amino group of the multi-arm polyethylene glycol derivative and the iodine-substituted cross-linking agent. The obtained hydrogel has obvious imaging advantages and safety.
Owner:SHANGHAI RUINING BIOTECH CO LTD

High color rendering, long life magnetic ring coupled plasma light source and preparation method thereof

PendingCN122291372AKryptonRare-earth element
This invention discloses a high color rendering index (Ra) and long lifespan magnetic ring-coupled plasma light source and its preparation method. The light source is an electrodeless source, comprising a bulb shell, an inorganic ceramic protective layer, a luminescent filler encapsulated inside the bulb shell, a mixed buffer gas, and a magnetic ring coupler fitted outside the bulb shell. The luminescent filler contains sulfur (S), selenium (Se), rare earth triiodine compounds, alkali metal bromine compounds, and alkali metal iodine compounds. The mixed buffer gas is a mixture of argon (Ar) and krypton (Kr) or argon (Ar) and xenon (Xe). The preparation method includes five steps: bulb shell pretreatment, inorganic ceramic protective layer preparation, luminescent filler filling, vacuuming and gas filling, and fusion sealing. This invention achieves ultra-high color rendering indexes (Ra>95, R9>90) by optimizing the luminescent formula and structural design. It contains no toxic substances and meets environmental standards, solving the technical pain points of poor color rendering, short lifespan, and insufficient environmental friendliness of traditional plasma light sources.
Owner:GUANGZHOU PUMI OPTOELECTRONICS CO LTD

Resist composition, laminate, and patterning process

PendingUS20260202745A1Carboxyl radicalSolvent
The present invention is a resist composition including at least one kind of hypervalent iodine compounds selected from the following formulae (1), (2), and (3), a carboxy group-containing compound, and a solvent. In the formula, n1 represents 0 to 2; n2 represents 0 to 2; n3 represents 0 to 3; R11 to R13 represent a halogen atom or a hydrocarbyl group having 1 to 10 carbon atoms; X1 to X3 represent *—O—XA1— or *—XA2(—R14)—C(═O)—; XA1 represents a carbonyl group or a hydrocarbylene group having 1 to 10 carbon atoms; XA2 represents nitrogen or sulfur; and R14 represents a hydrogen atom, a halogen atom, or a hydrocarbyl group having 1 to 20 carbon atoms. This can provide a non-chemically amplified resist composition that is excellent in sensitivity and a resolution limit in photolithography with a high-energy beam, in particular in electron beam (EB) lithography and EUV lithography.
Owner:SHIN ETSU CHEMICAL CO LTD

Method for enhancing microfossils by micro-nano energy spectrum CT scanning

ActiveCN117110333BRock sampleImage domain
This invention discloses a method for micro-nano energy-spectral CT-enhanced scanning of microfossils, comprising: purifying a rock sample containing microfossils to obtain pure microfossils; placing the pure microfossils in a sample container filled with an iodine compound solution to stain the pure microfossils, and then creating a CT scanning container using two pipette tips; performing CT scanning and data processing on the CT scanning container containing the stained pure microfossils and the iodine compound solution using micro-nano energy-spectral CT, obtaining high-energy and low-energy tomographic data containing the iodine compound solution and the stained pure microfossils; performing image domain material decomposition processing on the high-energy and low-energy tomographic data respectively, and then fusing the image domain processing results to obtain the three-dimensional structure of the internal and external parts of the pure microfossils. This invention can efficiently and non-destructively acquire high-contrast CT images of microfossils, clearly displaying the three-dimensional structure of the internal and external parts of the microfossils.
Owner:INST OF VERTEBRATE PALEONTOLOGY & PALEOANTHROPOLOGY CHINESE ACAD OF SCI

Negative resist pattern forming process

PendingUS20260186409A1Polymer sciencePhotoresist
A negative resist pattern forming process, comprising: (i) forming a resist film on a substrate using a resist composition containing a hypervalent iodine compound, a carboxy group-containing polymer, and a solvent; (ii) exposing the resist film with a high-energy radiation; and (iii) developing the exposed resist film using a developer that dissolves an unexposed portion and does not dissolve an exposed portion.
Owner:SHIN ETSU CHEMICAL CO LTD

High-valent iodine compound, resist composition, laminate obtained from the resist composition, and pattern forming method

PendingCN122344147ACarbon numberHalogen
The present invention relates to a high-valent iodine compound, a resist composition, a laminate obtained from the resist composition, and a pattern forming method. The object of the present invention is to provide a non-chemically amplified resist composition and a laminate obtained therefrom, which are excellent in sensitivity and resolution in high-energy ray, particularly in electron beam (EB) lithography and EUV lithography, and a pattern forming method using the resist composition. The means for solving the object is a high-valent iodine compound characterized by a structure represented by the following general formula (1). [Chemical Formula 1] wherein R 1 ~ R 2 are each independently a halogen atom, or a hydrocarbon group having a carbon number of 1 to 10 which can also contain a hetero atom. Also, R 1 and R 2 may be bonded to each other and form a ring together with the carbon atoms to which they are bonded and the atoms between the carbon atoms.
Owner:SHIN ETSU CHEMICAL CO LTD

A pueraria powder-based iodine complex, and a preparation method and application thereof

ActiveCN120919191Breduce stimulationInhibit pathogenic bacteriaPhysiologyPotassium iodine
The application discloses a pueraria powder-based iodine compound and a preparation method and application thereof, and comprises the following steps: mixing pueraria powder with water to form a pueraria powder water suspension; performing hydrothermal gelatinization and respiration treatment on the pueraria powder water suspension to obtain a gelatinized and respiration pueraria powder suspension; adding potassium iodide, potassium iodate and acid into the gelatinized and respiration pueraria powder suspension, adjusting the pH value of the system to be acidic, performing reaction, and obtaining the pueraria powder-based iodine compound through post-treatment. The application constructs a loading framework through gelatinization and respiration of pueraria powder, realizes stable loading of iodine by relying on in-situ reaction, and realizes the multiple effects of low stimulation, efficient inhibition of digestive tract pathogenic bacteria and precise regulation of intestinal microecology by synergistic effect of the strong bactericidal capacity of iodine which is not prone to drug resistance and the inherent intestinal flora regulation activity of pueraria powder, so that the pain points of instability and strong irritation of traditional iodine preparations are solved, and a new way for treating digestive tract infectious diseases is opened up.
Owner:ANHUI UNIVERSITY OF TRADITIONAL CHINESE MEDICINE

Resist composition, laminate, and pattern formation method

This invention provides a non-chemically amplified resist composition that exhibits excellent sensitivity and critical resolution in photolithography using high-energy rays, particularly EB lithography and EUV lithography, as well as a laminate and pattern formation method using the resist composition. [Solution] A resist composition characterized by comprising at least one hypervalent iodine compound selected from the following formulas (1), (2), and (3), a carboxyl group-containing compound, and a solvent. TIFF2026104178000091.tif34166
Owner:SHIN ETSU CHEMICAL CO LTD

Resist composition, laminate and patterning process

PendingUS20260211319A1Carboxyl radicalHeteroatom
The present invention provides a resist composition which can achieve high sensitivity and high resolvability in a patterning process. A resist composition containing a hypervalent iodine compound represented by the following formula (1), a carboxy group-containing compound, and a solvent.R11 is a halogen atom, or a hydrocarbyl group having 1 to 10 carbon atoms and optionally containing a heteroatom. R12 is a halogen atom, or a hydrocarbyl group having 1 to 40 carbon atoms and optionally containing a heteroatom. R14 is a halogen atom, or a hydrocarbyl group having 1 to 40 carbon atoms and optionally containing a heteroatom. R13 is a carbonyl group, or a hydrocarbylene group having 1 to 10 carbon atoms and optionally containing a heteroatom. X1 is an oxygen atom, a nitrogen atom, or a sulfur atom, and when X1 is a nitrogen atom, R15 is present.
Owner:SHIN ETSU CHEMICAL CO LTD

High color rendering full spectrum plasmonic luminescent material

PendingCN122302886ARare-earth elementKrypton
This invention discloses a high color rendering, full-spectrum plasma luminescent material, relating to the field of plasma luminescence technology. It aims to address the shortcomings of existing plasma luminescent materials, such as insufficient color rendering, presence of toxic and harmful substances, poor stability, short lifespan, and inability to form a continuous spectrum. The luminescent material is prepared from the following components by weight: 50-80 parts sulfur (S), 20-50 parts selenium (Se), 1-5 parts a triiodine compound of rare earth elements, 0.1-1 parts an alkali metal bromine compound, and 0.5-3 parts an alkali metal iodine compound. Optionally, europium iodide (EuI2), indium iodide (InI), and excess pure iodine (I2) are added. It is encapsulated in a mixed buffer gas of argon (Ar) and krypton (Kr), with the inner wall of the quartz bubble shell coated with an Al2O3 protective film. The raw materials of this invention are non-toxic and environmentally friendly, complying with RoHS and other environmental regulations. It can form a continuous spectrum close to sunlight, and exhibits long lifespan and strong stability.
Owner:GUANGZHOU PUMI OPTOELECTRONICS CO LTD