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33 results about "Incorrect Measurement" patented technology

System and method for detecting body temperature

The invention relates to the field of detection techniques for body temperatures, and particularly relates to a system and a method for detecting a body temperature. The system for detecting the body temperature comprises an intelligent terminal, a CPU (central processing unit) module, a shooting module and a body temperature detecting module, wherein the CPU module, the shooting module and the body temperature detecting module are arranged in the intelligent terminal respectively; the CPU module is used for controlling the on and off of the body temperature detecting function of the body temperature detecting module; the shooting module is used for aiming at a to-be-detected object; the body temperature detecting module is used for detecting the surface temperature of a human body of the to-be-detected object and displaying the detected surface temperature of the human body in a shooting preview interface of the shooting module. The system and the method for detecting the body temperature are simple to operate, a measurement of the body temperature can be completed so long as a mobile phone is at hand, a thermometer is not needed to be sought everywhere, the problem of an inaccurate measurement caused by an incorrect measurement technique does not need to be worried, so that the temperature measurement is convenient and quick, and further, the carrying is convenient.
Owner:LETV HLDG BEIJING CO LTD +1

Device and method for automatic detection of incorrect measurements by means of quality factors

What is disclosed is a device (1) for automatic detection of a possible incorrect measurement, wherein the device (1) comprises at least one reflected light illumination apparatus (14) and/or a transmitted light illumination apparatus (6) and at least one imaging optical system (9) and one detector (11) of a camera (10) for imaging structures (3) on a substrate (2), wherein a first program portion (17) is linked to the detector (11) of the camera (10), said detector being provided for determining the position and/or dimension of the structure (3) on the substrate (2), wherein the device (1) determines and records a plurality of measurement variables Mj, j ε {1, . . . , L}, from which at least one variable G can be determined, wherein a second program portion (18) is linked to the detector (11) of the camera (10), said program portion calculating an analysis of the measurement variables Mj with regard to a possible incorrect measurement. Also disclosed is a method for automatic detection of a possible incorrect measurement wherein an analysis of the measurement variables Mj with regard to a possible incorrect measurement is calculated with a second program portion (18) which is linked to the detector (11) of the camera (10).
Owner:VISTEC SEMICON SYST JENA

Process for measuring temperature of reaction chamber of vapor deposition equipment

The invention provides a method for measuring the temperature of a reaction chamber of a vapor deposition device. The temperature of the reaction chamber is measured by arranging temperature detecting units inside and outside the reaction chamber respectively in the prior art, which has the problems of cost waste, incorrect measurement and hidden danger. The invention provides a temperature measuring method which includes that: an inner temperature detecting unit and an outer temperature detecting unit are respectively arranged inside and outside the reaction chamber of the vapor deposition device; then the temperature of the vapor deposition device is changed to cover the permitted temperature range of the vapor deposition device; then the temperature detected by the inner and outer temperature detecting units is read and the temperature deviation value of the inner temperature and the outer temperature is calculated; then the inner temperature detecting unit is dismounted, vapor deposition is carried out again by the vapor deposition device, and then the temperature detected by the outer temperature detecting unit is read; finally, the temperature of the reaction chamber of the vapor deposition device is calculated according to the temperature deviation value and the temperature detected by the outer temperature detecting unit. The method of the invention can measure the temperature of the reaction chamber safely and accurately with low cost.
Owner:SEMICON MFG INT (SHANGHAI) CORP

Monitoring system for instrument operation process and using method of monitoring system

InactiveCN110197605AShow measurement resultsReduce the risk of practicingCosmonautic condition simulationsSimulatorsElectrical resistance and conductanceMonitoring system
The invention relates to the technical field of simulation multimeter, in particular to a monitoring system of an instrument operation process and a using method of the monitoring system. The problemthat incorrect measurement results or instrument damage is prone to occurring due to the fact that a beginner uses a real universal meter in the prior art is solved. The monitoring system includes a simulation multimeter and a simulation signal generating module, wherein a data processing module is embedded in the simulation multimeter, the data processing module is connected with a display driving module in a communicating mode, and the display driving module is connected with a pulse identification module in a communicating mode; the pulse identification module is connected with a gear signal module in a communicating mode, the gear signal module is connected with a power signal module in a communicating mode; and the simulation signal generating module uses a pulse signal to define an analog power source or a period connector and uses a unidirectional power source and a resistor plug to define different pulses, the plug is enabled to be inserted into an inserting hole of the simulation multimeter to read the pulse signal and display the measurement results.
Owner:HANGZHOU SHENBANG TECH CO LTD

Precise Step Counting Method Using Human Body Capacitance

Disclosed is a precise step counting method using human body capacitance, relating to the field of electronic communications, and in particular to a method for implementing precise step counting using human body capacitance. At present, a wearable intelligent device having a step counting function measures a number of steps by means of an inertial sensor, but has limited precision in a measurement result. Due to the complexity of motion of a human body, missed measurement and incorrect measurement often occur in the inertial sensor-based measurement of the number of steps. The recognition and calculation of the number of steps also occupy a large number of hardware resources. In this respect, a precise step counting method based on human body capacitance, a human body's electrostatic field, or a human body surface potential is provided. When a human body is walking, the actions of leg lifting and leg lowering would change human body capacitance, and the number of steps can be conveniently and quickly measured by detecting a change in a physical signal caused by a change in the human body capacitance, such as a change in a voltage signal of human body skin and a change in a frequency. The method implements precise step counting without occupying hardware spaces and resources, has the advantage of low power consumption, and can be embedded into all current wearable intelligent devices that require a step counting function).
Owner:WANG YONGFANG

Device and method for automatic detection of incorrect measurements by means of quality factors

What is disclosed is a device (1) for automatic detection of a possible incorrect measurement, wherein the device (1) comprises at least one reflected light illumination apparatus (14) and / or a transmitted light illumination apparatus (6) and at least one imaging optical system (9) and one detector (11) of a camera (10) for imaging structures (3) on a substrate (2), wherein a first program portion (17) is linked to the detector (11) of the camera (10), said detector being provided for determining the position and / or dimension of the structure (3) on the substrate (2), wherein the device (1) determines and records a plurality of measurement variables Mj, jε{1, . . . , L}, from which at least one variable G can be determined, wherein a second program portion (18) is linked to the detector (11) of the camera (10), said program portion calculating an analysis of the measurement variables Mj with regard to a possible incorrect measurement. Also disclosed is a method for automatic detection of a possible incorrect measurement wherein an analysis of the measurement variables Mj with regard to a possible incorrect measurement is calculated with a second program portion (18) which is linked to the detector (11) of the camera (10).
Owner:VISTEC SEMICON SYST JENA
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