This invention relates to the field of
simulation technology, and in particular to a
simulation method, apparatus, device, and storage medium for
chemical vapor deposition (CVD). The method, through a complete chain centered on building a
simulation library, initializing encapsulated objects,
processing input parameters, matching encapsulated objects, adaptive adjustment, and executing the simulation, transforms traditional flow
field simulation models fixed in a single
scenario into independently manageable, repeatedly invoked, and multi-condition adaptable
engineering analysis units. This effectively solves the problems in existing technologies where simulation objects are mostly customized and difficult to reuse, parameter adjustments rely on manual operation by professional simulation personnel leading to low efficiency, and
instability issues such as calculation
divergence and result
distortion easily occur when switching between multiple operating conditions. It significantly improves the
engineering applicability, operational convenience, and result reliability of simulation analysis, providing efficient and stable
technical support for the entire lifecycle of CVD equipment from R&D design and process debugging to
mass production optimization, making the decision-making process more scientific and rational.