Deflection
electrode arrangement for an X-
ray source, wherein the deflection
electrode arrangement comprises: a first
electrode plate (1) comprising a first connecting section (11) and a plurality of first tooth sections (12), wherein the plurality of first tooth sections (12) are arranged on the first connecting section (1) and spaced apart from one another, and each first tooth section (12) extends from the first connecting section (11) such that the first electrode plate (1) is formed in a comb shape; and a second electrode plate (2) comprising a second connecting section (21) and a plurality of second tooth sections (22), wherein the plurality of second tooth sections (22) are arranged on the second connecting section (21) and spaced apart from each other, and each second tooth section (22) extends from the second connecting section (21) such that the second electrode plate (2) is shaped in a comb form, wherein the first electrode plate (1) and the second electrode plate (2) are arranged such that the first electrode plate (1) and the second electrode plate (2) do not contact each other, and wherein the plurality of first tooth sections (12) and the plurality of second tooth sections (22) are at least partially offset to form multiple
electron beam passes (S1, S2, S3, ...), wherein each
electron beam pass (S1, S2, S3, ...) is arranged between an adjacent first tooth section (12) and an adjacent second tooth section (22), the X-
ray source includes: a plurality of
cathode units (5) for generating
electron beams from different positions; and an
anode (6) for receiving the electron beams from different positions, wherein the first electrode plate (1) and the second electrode plate (2) of the deflection electrode arrangement are arranged between the plurality of
cathode units (5) and the
anode (6), wherein each
cathode unit (5) is arranged such that it is aligned with an electron beam passage (S1, S2, S3, ...) of the deflection electrode arrangement, so that the electron beams generated by the plurality of cathode units (5) can each pass through the corresponding electron beam passages (S1, S2, S3, ...) and reach the
anode (6), and wherein potentials can be applied to the first electrode plate (1) and the second electrode plate (2) so that the electron beams are deflected when passing through the respective electron beam passages (S1, S2, S3, ...), and wherein when a
high voltage is applied to the anode (6) at exit positions of the respective electron beam passages (S1, S2, S3, ...) focusing electric fields are generated in order to focus the electron beams.