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59 results about "Exposure Start Time" patented technology

The time at which the exposure begins.

Shooting control method and system for optical motion capturing camera

ActiveCN107181918AImproved ability to capture objectsAvoid long-term highlightingTelevision system detailsColor television detailsMotion captureBrightness perception
The invention provides a shooting control method and system for an optical motion capturing camera, wherein the optical motion capturing camera comprises an infrared light source. The shooting control method comprises the steps of acquiring the distance between a captured object and the infrared light source; and adjusting shooting parameters of the optical motion capturing camera according to the distance, wherein the shooting parameters comprises the exposure time and the brightness of the infrared light source. The shooting parameters of the optical motion capturing camera are automatically adjusted according to the distance between the captured object and the infrared light source of the optical motion capturing camera, the brightness of the infrared light source and the exposure time of the optical motion capturing camera can be adjusted in an adaptive manner, the infrared light source is prevented from staying at a highlight state for a long time, the heat generation amount is reduced, and the service life is prolonged. Meanwhile, a phenomenon of motion blurring generated by too long exposure time when an object which is close to the camera and high in moving speed is shot can be avoided, and the object capturing capacity of the motion capturing camera is improved.
Owner:SHENZHEN REALIS MULTIMEDIA TECH CO LTD

Interference exposure system and exposure method thereof

The invention discloses an interference exposure system which is used for exposing a substrate coated with photoresist. According to the system, incident light is divided into at least two light beams through a beam-splitting device, and at least two interference arms are correspondingly formed; each interference arm is provided with a shutter for controlling whether the interference arm is involved in exposure and the exposure time; at least one interference arm is provided with a phase compensator used for changing the beam phase of the interference arm. The interference exposure method comprises the following steps of: providing a substrate, and coating photoresist on the surface of the substrate; providing incident light, dividing the incident light into two light beams, and correspondingly forming two interference arms; adjusting the beam phase of one interference arm in the two interference arms, so that the beam phase of the interference arm is changed by 180 degrees*N, and N is an integer; performing repeated exposure on the photoresist on the substrate by utilizing the two interference arms, rotating the substrate, and forming multiple groups of interference patterns of which interference fringes are superposed on the photoresist on the substrate. The interference exposure system has the advantages that holes and columnar patterns can be flexibly formed on the positive and negative photoresists.
Owner:SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD

Exposure time adjusting method for earth observation frame transfer area array CCD image motion matching

The invention discloses an exposure time adjusting method for earth observation frame transfer area array CCD image motion matching and relates to a frame transfer area array CCD exposure time adjusting method for solving the problem that when the exposure time is too short, the signal to noise ratio is too low, and when the exposure time exceeds one equivalent line period, obvious image blurringoccurs, so that the dynamic transfer function declines along the orbit direction in the existing earth observation imaging application. The method comprises the steps of (1) light-sensitive area useless charge frame transfer phase; (2) controllable-time image motion matching exposure phase; (3) light-sensitive area useful charge frame transfer and original storage area same-line useless charge dumping phase; (4) storage area residual useless charge and light-sensitive area transition-line charge dumping phase; and (5) storage area useful charge frame reading phase. According to the method, theinterval of two times of frame transfer in the light-sensitive area is changed to control the exposure time, a mechanical shutter is not needed, and the original hardware circuit is not modified; andin addition, the image blurring problem under long exposure time is effectively solved.
Owner:CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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