A method of manufacturing a patterned film by which an accurately patterned film is formed when film formation is performed by using the AD method. The method includes the steps of: (a) disposing a multilayered
mask containing at least one soft
mask layer formed of a soft material and at least one
hard mask layer formed of a hard material on a substrate or an
electrode formed on the substrate; (b) spraying
powder formed of a brittle material toward the substrate, on which the multilayered
mask has been disposed, and allowing the
powder to collide with an under layer to deposit the
powder thereon, thereby forming a brittle material layer; and (c) removing the multilayered mask after step (b).