This invention provides a substrate
processing apparatus and method capable of accurately determining the
processing liquid within a drain section. The substrate
processing apparatus (100) includes a chamber (112), a substrate holding section (120), a processing liquid supply section (130), a drain section (190), at least one near-
infrared light source (140), a near-
infrared camera (150), and a control section (102). The substrate holding section is housed within the chamber. The substrate holding section holds a substrate (W). The processing liquid supply section supplies various processing liquids to the substrate at different timings. The drain section drains the various processing liquids out of the chamber. At least one near-
infrared light source irradiates an area (AR1) containing at least a portion of the drain section using near-infrared light. The near-infrared camera captures images of the various processing liquids within the drain section irradiated by near-infrared light and generates captured images. The control section determines the type of processing liquid within the drain section based on the captured images.