An apparatus and method for cold
plasma skin resurfacing is provided. In one aspect, a
mask for use in fractionated
skin resurfacing is provided. The
mask includes a plurality of apertures distributed across a surface of the
mask. The mask may be made of a flexible material including an
adhesive surface, such that the mask may be applied to a contoured surface of a patient's
skin while remaining fixed in place. The material is resistant to the effects of a cold
plasma beam. In this way, a cold
plasma beam applicator may be used to scan or apply a cold
plasma beam over a surface of the mask, such that only the portions of a patient's skin exposed by the apertures of the mask are treated by the cold
plasma beam.