The invention relates to
skin-core structure micro-pore
silicon carbide fiber and the preparation method, the
fiber is characterized in that both the
skin layer and the core part contain the micro-pore with
pore diameter less than 2 nm, and the micro-pore
volume content of the
skin is higher than the core part; the ratio between the skin
layer thickness and the
radius is 0.1 to 0.9; according to the differences of the
skin thickness, the specific surface area of the
fiber is 400m<2> / g to 1400m<2> / g, and the average
pore diameter is 1.30 to 1.60 nm; the C content of the skin layer is more than 90 wt percent, the residual is Si, or Si and O; the C content of the core part is 27 to 35 wt percent, the O content is 10 to 20 wt percent, and the residual is Si. The preparation method is characterized in that the
Si element of the skin layer is etched through the KOH
activation method and the skin-core structure is formed, simultaneously, the micro-pore with higher proportion is formed, the specific surface area and the conducting property of the fiber can be adjusted through the method. The skin-core structure micro-pore
silicon carbide fiber of the invention can be used in the physico
chemical adsorption field, catalyst carrier field, and wave-absorbed stealth field.