The utility model relates to the technical field of
wafer cleaning, in particular to
wafer cleaning equipment convenient for stable supply of cleaning liquid, which comprises a bearing plate, a supply component and a guide component are respectively arranged at the top of the bearing plate, and the guide component is positioned on the side surface of the supply component. Through cooperative use of a liquid supply
barrel, a stirring motor, a stirring frame, a filter screen, a heating plate and a temperature sensor, in order to ensure that a cleaning liquid is uniformly mixed in the liquid supply
barrel and prevent a
precipitation or layering phenomenon, a stirring measure is adopted, so that the stability and consistency of the cleaning liquid are ensured; the temperature of cleaning liquid can be accurately controlled through cooperation of a heating plate and a temperature sensor, the cleaning effect is further improved, a
drying fan, an air blowing head, a liquid pumping pump, a liquid pumping
pipe, a moving block and a
threaded rod are arranged and used in cooperation, and in order to ensure that the cleaned
wafer can be timely and evenly dried, the
drying effect is improved. And secondary
pollution or oxidation caused by residual water on the surface of the wafer is avoided.