The invention relates to a fluorescent pattern preparation method based on a glass
perovskite composite material, and belongs to the technical field of micro-nano
processing and
fluorescent materials. The method aims to solve the problem that the conventional
perovskite material cannot be compatible with a standard photoetching process due to the fact that the
ionic crystal characteristic of the
perovskite material is easily dissolved and damaged by polar solvents such as a developing solution and the like in a photoetching patterning process. Glass perovskite
powder with high
chemical stability is prepared by wrapping a perovskite luminous body in an inorganic
glass matrix, and the glass perovskite
powder is uniformly compounded with a negative wet film
photoresist to form a fluorescent composite
photoresist; and then preparing a high-resolution fluorescent pattern on the substrate by adopting standard photoetching processes such as
spin coating,
exposure and development. The obtained fluorescent pattern shows stable
luminescence performance under excitation of 365 nm
ultraviolet light, and has good process compatibility and
environmental stability while keeping high
photoluminescence efficiency. The method is suitable for the fields of micro display, anti-counterfeiting
encryption, photoelectric integration and the like.