31results about How to "Exposed to light" patented technology

A method for managing UV irradiation for treating substrates in the course of treating multiple substrates consecutively with UV light, includes: exposing a first UV sensor to the UV light at first intervals to measure illumination intensity of the UV light so as to adjust the illumination intensity to a desired level based on the measured illumination intensity; and exposing a second UV sensor to the UV light at second intervals to measure illumination intensity of the UV light so as to calibrate the first UV sensor by equalizing the illumination intensity measured by the first UV sensor substantially with the illumination intensity measured by the second UV sensor, wherein each second interval is longer than each first interval.

A reflective member is fixedly or movably provided near the pupil plane of a projection optical system with which a projection exposure apparatus is equipped. A collimated measuring beam with an exposure wavelength is incident from the object plane side or image plane side of the projection optical system, and the intensity of the beam reflected by the reflective member is detected photoelectrically to measure a value corresponding to the attenuation factor (transmissivity or reflectivity) of the projection optical system or the variation with time of the attenuation factor (transmissivity or reflectivity) of the projection optical system. In accordance with the measurement results, the exposing conditions when a photosensitive substrate is exposed are corrected to avoid the deterioration of the exposure control precision due to the variation of the attenuation factor (transmissivity variation or reflectivity variation) which is caused in the projection optical system and illumination optical system of a projection exposure apparatus which uses ultraviolet illumination light.

Introducing ultraviolet (UV) light to activate a photocatalytic oxidation coating applied to interior portions of footwear alters the environment inside a shoe or other footwear to destroy microorganisms or inhibit their growth. Visible light can also be used to prevent further microorganism growth. Introducing forced air flow through the footwear removes dampness in and thereby deodorizes the footwear. A preferred embodiment comprises an adjustable shoe tree equipped with a UV germicidal light source and electronic safeguards that prevent appreciable leakage of UV radiation outside the shoe.

Introducing ultraviolet (UV) light to alter the environment inside a shoe or other footwear destroys microorganisms or inhibits their growth. Visible light can also be used to prevent further growth. Introducing forced air flow through the footwear removes dampness in and thereby deodorizes the footwear. A preferred embodiment comprises an adjustable shoe tree equipped with a UV germicidal light source and electronic safeguards that prevent appreciable leakage of UV radiation outside the shoe.

A photosensitive material (for example, a glass substrate coated with a photoresist) is exposed to light in a predetermined pattern by illuminating the photosensitive material with exposure light by an exposure head which emits light that has been modulated by a spatial light modulation device. The exposure head and the photosensitive material are moved in a sub-scan direction at least twice for each photosensitive material. The operation of the spatial light modulation device is controlled in each of sub-scan movements to form an exposed area, of which the exposure amount is at least at two different levels, in the photosensitive material.

In a pattern formation method of this invention, a resist film is formed on a substrate and the resist film is exposed to a solution including a compound having a hydrophilic group. Thereafter, with an immersion liquid provided on the resist film having been exposed to the solution, pattern exposure is performed by selectively irradiating the resist film with exposing light, and the resist film is developed after the pattern exposure. Thus, a resist pattern made of the resist film is formed.

Introducing ultraviolet (UV) light to alter the environment inside a shoe or other footwear destroys microorganisms or inhibits their growth. Visible light can also be used to prevent further growth. Introducing forced air flow through the footwear removes dampness in and thereby deodorizes the footwear. A preferred embodiment comprises an adjustable shoe tree equipped with a UV germicidal light source and electronic safeguards that prevent appreciable leakage of UV radiation outside the shoe.

Disclosed is a chip substrate. The chip substrate includes: conductive portions laminated in one direction to constitute the chip substrate; insulation portions alternately laminated with the conductive portions to electrically isolate the conductive portions; a cavity formed at a predetermined depth in a recessed shape in a region including the insulation portions on an upper surface of the chip substrate; and a groove portion disposed outside the cavity in a spaced-apart relationship with the cavity and formed at a predetermined depth in a recessed shape. According to the present invention, an adhesive agent is applied in a groove portion formed in advance. It is therefore possible to prevent the adhesive agent from being exposed to the light emitted from optical elements and to prevent the adhesive agent from being denatured. This makes it possible to enhance the reliability of lens bonding. Furthermore, there is no need to use an expensive resistant adhesive agent. An existing typical adhesive agent may be used as it is. This provides an effect of saving costs. Thus, there is an advantage in that a low-priced existing bonding material may be applied to a high-priced UV-C (deep-UV) package.

A device that can sterilize material passing through it efficiently by utilizing an appropriate light source that can be powered by external sources (including use of an electromagnetic field to transmit energy) or by a power source that is contained within the device itself, which may include elements to create turbulence within the material passing through it, and elements to reflect the light source where useful but trap the light from escaping to ensure safety. The device may be rigid or flexible, possibly including a mechanism to fold or collapse the device for delivery through a port or lumen and expanded or unfolded prior to use.

A color electrophotographic image forming apparatus forms an image on a recording material. A plurality of cartridges is detachably mounted to a main assembly of the apparatus. The apparatus includes a cartridge supporting member for supporting the cartridges. The cartridge supporting member is movable between an inside position inside the main assembly and an outside position outside the main assembly. The apparatus also includes a shutter member movably provided on the cartridge supporting member. The shutter member is movable between an open position in which a photosensitive member supported by the cartridge supporting member is exposed and a closed position in which the photosensitive member is protected. The apparatus further includes a shutter moving device for moving the shutter member to the closed position when the cartridge supporting member is moved from the inside position to the outside position and for moving the shutter member to the open position when the cartridge supporting member is moved from the outside position to the inside position.

Photosensitive paste compositions, barrier ribs of plasma display panels (PDPs) prepared using the same, and PDPs including the barrier ribs are provided. The photosensitive paste composition includes an organic-inorganic complex sol and an inorganic material, wherein the average refractive index (N1) of the organic-inorganic complex sol and the average refractive index (N2) of the inorganic material satisfy the equation −0.2≦N1−N2≦0.2. Using the photosensitive paste composition, patterned barrier ribs for PDPs having high resolution and high precision can be made by exposure to light only once. Barrier ribs having higher reflective indices than conventional barrier ribs can also be obtained.

A line head includes: a first substrate having a plurality of organic electroluminescent devices; a bonding layer disposed on the first substrate and having optical transparency; a second substrate bonded to the first substrate with the bonding layer therebetween and having a reflective film that covers at least a part of the bonding layer; and a plurality of exit portions respectively from which light that has passed through the bonding layer is exited, the light emitted from the organic electroluminescent devices.

An electron beam exposure system includes: an electron beam generation unit for generating an electron beam; an electron beam exposure mask having opening portions for proximity effect correction, which opening portions are arranged so that sizes of the opening portions change at a predetermined rate in order of arrangement; a mask deflection unit for deflecting the electron beam on the electron beam exposure mask; a substrate deflection unit for deflecting the electron beam passed through the exposure mask and projecting the electron beam onto a substrate; and a control unit for controlling deflection amounts in the mask deflection unit and the substrate deflection unit. The direction or directions of the change may be any one of a row direction and a column direction or may be the row and column directions.

A line head includes: a first substrate having a plurality of organic electroluminescent devices; a bonding layer disposed on the first substrate and having optical transparency; a second substrate bonded to the first substrate with the bonding layer therebetween and having a reflective film that covers at least a part of the bonding layer; and a plurality of exit portions respectively from which light that has passed through the bonding layer is exited, the light emitted from the organic electroluminescent devices.

A method of manufacturing an inkjet printhead includes forming a heater and an electrode on a substrate, forming a flow path forming layer by coating a first negative photoresist composition on the substrate, forming a sacrifice layer, planarizing the flow path forming layer and the sacrifice layer, forming a nozzle layer by coating a second negative photoresist composition on the flow path forming layer, forming an ink feed hole in the substrate, and eliminating the sacrifice layer, wherein the first and second negative photoresist compositions include a prepolymer which comprises one selected from the group consisting of a glycidyl ether functional group, a ring-opened glycidyl ether functional group, and an oxytein functional group in a monomer repeat unit, and one selected from the group consisting of a phenol novolac resin-based backbone, a bisphenol-A-based backbone, a bisphenol-F-based backbone, and an alicyclic backbone; a cationic initiator; a solvent; and a plasticizer.

A lighting device comprises a light head, two light sources, and a safeguard mechanism. The light head houses the two light sources. The first light source emits predominantly ultraviolet (UV) light (<400 nm) for germicidal illumination, and the second light source emits predominantly visible light (>400 nm) for general lighting. The lighting device may operate in two modes. The first operation mode is the general lighting mode, where the second light source is on for providing general lighting. The second operation mode is the germicidal lighting mode, where the first light source is on for providing germicidal lighting. The safeguard mechanism prevents the first light source in the germicidal lighting mode from turning on and causing accidental human exposure to the UV light from the first light source.

An image forming apparatus includes a photosensitive body, a light scanning lamp, and a lamp controller. The image forming apparatus has a surface capable of accepting an electric potential. The light scanning lamp can scan a lamp light toward the photosensitive body to change the electric potential of the photosensitive body. The lamp controller moves between a blocking position to block the lamp light from reaching the surface of the photosensitive body, and an unblocking position that is spaced from the blocking position and allows the lamp light to reach the surface of the photosensitive body.

An electron beam exposure system is designed to correct a proximity effect. The electron beam exposure system includes: an electron beam generation unit for generating an electron beam; an electron beam exposure mask having opening portions that are arranged so that sizes of the opening portions change at a predetermined rate in order of arrangement; a mask deflection unit for deflecting the electron beam on the electron beam exposure mask; a substrate deflection unit for deflecting and projecting the electron beam onto a substrate; and a control unit for controlling deflection amounts in the mask deflection unit and the substrate deflection unit. The direction or directions of the change may be any one of a row direction and a column direction or may be the row and column directions.

A light shield plate 12 having outer openings 14 and 15 is fixed to the outside of a cartridge body 11 in which inner openings 18 and 19 for exposing a photosensitive recording medium 4 to the outside are formed. A shutter 13 for opening and closing the inner openings 18 and 19 is incorporated movably between the cartridge body 11 and the light shield plate 12. Closing-side ends 55e and 55f of the shutter 13 and shutter-closing-side edges 18a and 19a of the inner openings 18 and 19 and / or shutter-closing-side edges 14a and 15a of the outer openings 14 and 15 are inclined from each other.

A light-deprivation system includes shades having a fixed end that form a perimeter that defines a growing environment, cables attached to a free end of each shade, a cable guide located near a pinnacle of the light-deprivation system, and a winch to draw the shades. The cables run from the free end of each shade, through the cable guide, to the winch. Operation of the winch draws the shades simultaneously to block substantially all light from sources external to the growing environment from reaching the growing environment.

A light shield plate 12 having outer openings 14 and 15 is fixed to the outside of a cartridge body 11 in which inner openings 18 and 19 for exposing a photosensitive recording medium 4 to the outside are formed. A shutter 13 for opening and closing the inner openings 18 and 19 is incorporated movably between the cartridge body 11 and the light shield plate 12. Closing-side ends 55e and 55f of the shutter 13 and shutter-closing-side edges 18a and 19a of the inner openings 18 and 19 and / or shutter-closing-side edges 14a and 15a of the outer openings 14 and 15 are inclined from each other.

Disclosed is a chip substrate. The chip substrate includes: conductive portions laminated in one direction to constitute the chip substrate; insulation portions alternately laminated with the conductive portions to electrically isolate the conductive portions; a cavity formed at a predetermined depth in a recessed shape in a region including the insulation portions on an upper surface of the chip substrate; and a groove portion disposed outside the cavity in a spaced-apart relationship with the cavity and formed at a predetermined depth in a recessed shape. According to the present invention, an adhesive agent is applied in a groove portion formed in advance. It is therefore possible to prevent the adhesive agent from being exposed to the light emitted from optical elements and to prevent the adhesive agent from being denatured. This makes it possible to enhance the reliability of lens bonding. Furthermore, there is no need to use an expensive resistant adhesive agent. An existing typical adhesive agent may be used as it is. This provides an effect of saving costs. Thus, there is an advantage in that a low-priced existing bonding material may be applied to a high-priced UV-C (deep-UV) package.

A light-deprivation system includes shades having a fixed end that form a perimeter that defines a growing environment, cables attached to a free end of each shade, a cable guide located near a pinnacle of the light-deprivation system, and a winch to draw the shades. The cables run from the free end of each shade, through the cable guide, to the winch. Operation of the winch draws the shades simultaneously to block substantially all light from sources external to the growing environment from reaching the growing environment.