9 results about "Terminal cleaning" patented technology

The invention relates to the field of semiconductor cleaning, and discloses a cleaning process for improving the surface quality of a wafer, which comprises the steps of wafer pre-cleaning and wafer terminal cleaning, in the wafer pre-cleaning step, the wafer is sequentially subjected to first organic solution cleaning, pure water ultrasonic cleaning, mechanical scrubbing and second organic solution cleaning; and in the wafer terminal cleaning step, the wafer is sequentially subjected to organic emulsion solution cleaning, SPM cleaning, HQDR cleaning, high-concentration SC1 cleaning, QDR cleaning, SC2 cleaning, DHF cleaning, low-concentration SC1 cleaning, ozone water combined cleaning and spin-drying. According to the method, the cleaning process is integrated and optimized from the cleaning mechanism, the pertinence is higher, the cleaning process is more complete, the method has the advantages of being better in particulate matter cleaning effect, more thorough in stubborn pollutant removal, bidirectional in microstructure protection and the like, the wafer quality is greatly improved, operation is easy and convenient to implement, the cleaning cost is effectively reduced, and the method has good popularization prospects.

The utility model belongs to the technical field of medical instruments, and discloses a control terminal for a diffuse oxygenerator, the control terminal comprises a shell, a regulating valve, a diffuse air box and a wet mist assembly, the shell is internally provided with a mounting cavity, the regulating valve communicates with an air inlet pipeline and is located in the mounting cavity, and the diffuse air box is arranged in the mounting cavity and communicates with the regulating valve; gas entering the dispersion gas box through the adjusting valve is released to the outside of the shell through the dispersion gas box, the wet mist assembly is detachably installed on the side portion of the shell and used for outputting gas humidification and / or generating atomized liquid, and therefore a user can take down the wet mist assembly from the shell when filling liquid into the control terminal, and the user can conveniently fill the liquid into the control terminal. Therefore, the effect of conveniently filling the liquid into the control terminal is achieved, meanwhile, the situation that the cleanliness of the control terminal is affected and an internal circuit of the control terminal is damaged due to the fact that the liquid is scattered to the outside is avoided, the effect of guaranteeing the service life of the control terminal is achieved, and then the use experience of a user is improved.

The invention discloses a liquid path supply system and method for DNA synthesis and a DNA synthesis system. Wherein the liquid path supply system comprises a reaction reagent supply system, a switching system and a cleaning source supply system, and the cleaning source supply system comprises a reaction reagent cleaning system matched with the reaction reagent supply system and a valve terminal cleaning system matched with the switching system; the switching system comprises a multiple one-in-one valve terminal and a reagent switching assembly, an outlet and a plurality of inlets are formed in the side face of the valve terminal, an input branch channel, a conveying branch channel and an output main channel are arranged in the valve terminal, one end of the input branch channel communicates with the corresponding inlet, and the other end of the input branch channel is connected with the switching system; the conveying branch channel is connected with an outlet of the switching system; outlets of all the conveying branch channels converge in the same intersection area, the intersection area communicates with an inlet of the output main channel, and an outlet of the output main channel communicates with the public outlet. According to the method, different reagents can be switched into the public pipeline corresponding to the closed reaction cavity in a pollution-free manner.

This invention provides a portable universal server testing device, relating to the field of server testing. It includes a connecting cable with an integrally formed connector at its upper end. A protective sleeve is slidably mounted on the outer wall of the connector. A capping assembly is fixedly connected to the top of the protective sleeve. A placement groove is formed on the outer side of the protective sleeve, and a cleaning component is placed inside the groove. A dust removal plate is detachably installed inside the groove. The cleaning component includes a cleaning plate with a rotating ring fixedly mounted on its top. A connecting shaft is rotatably mounted inside the rotating ring. The purpose is to provide a sealed protection for the connector when idle by using the protective sleeve and capping assembly, preventing dust accumulation inside and protecting the terminal surface. Furthermore, the cleaning component can quickly scrape and clean difficult areas on the terminal surface, and the dust removal plate, in conjunction with the device, can perform its own dust vibration cleaning during storage, improving the convenience of terminal cleaning and the overall lifespan of the device.

The automatic terminal cleaning device provided by the embodiment of the utility model comprises a chuck assembly, the chuck assembly comprises an upper chuck and a lower chuck arranged opposite to the upper chuck, one side, close to the lower chuck, of the upper chuck is provided with a first working surface, the upper chuck is internally provided with a cleaning liquid channel, and the lower chuck is provided with a second working surface; an outlet of the cleaning fluid channel is located in the first working face. The supply assembly comprises a cleaning liquid supply part and an electromagnetic valve; the cleaning fluid supply piece is communicated with an inlet of the cleaning fluid channel through a pipeline, and the electromagnetic valve is arranged on the pipeline. According to the embodiment, automatic titration is achieved by arranging the electromagnetic valve, and the cleaning efficiency is improved.

1. Name of the product in this design: Terminal cleaning tool. 2. Purpose of this design: To clean the pin terminals of a charging gun or the socket terminals of a charging socket. 3. The key design feature of this product is its shape. 4. The image or photograph that best illustrates the design's key points: a 3D model.

The utility model relates to a kind of protective devices for cleaning, for the protection when rail vehicle electrical component terminal cleaning, including two protective components rotatably connected in the same side, two protective components can form protective space in closed state, protective space is used to accommodate the need protection part of the object to be cleaned, one of the protective components is provided with a fixing component, and the fixing component is used to fix the object to be cleaned with the need protection part into the protective space. The protective device for cleaning of the utility model avoids damage to the need protection part when cleaning the surface of the object to be cleaned.

The invention discloses a connecting terminal cleaning method which comprises the following steps: preparing a cleaning solution which comprises 99.70-99.94 parts of water; 0.05 to 0.2 part of citric acid; 0.01 to 0.1 part of sodium chloride or hydrogen peroxide; putting a to-be-cleaned metal piece into the cleaning solution; the metal part is cleaned in an ultrasonic treatment mode; and the cleaned metal piece is taken out and washed. Efficient cleaning is achieved through the composite effect of ultrasonic waves cooperating with citric acid and sodium chloride or hydrogen peroxide. The cleaning liquid takes water as a main body and is matched with a small amount of citric acid and sodium chloride or hydrogen peroxide, oxides on the metal part can be mildly removed without physical friction, a metal matrix is prevented from being scratched, and the mechanical property and the appearance precision of the metal matrix are guaranteed; ultrasonic waves can accelerate the reaction, manual repeated operation is omitted, and the cleaning efficiency is greatly improved to adapt to efficient production; meanwhile, ultrasonic energy can penetrate into special-shaped parts, porous or complex curved surface areas of the metal parts, oxide residues are completely eradicated in cooperation with the cleaning fluid, workpiece scrapping is reduced, and the production cost and resource waste are reduced.

The application relates to the technical field of semiconductor manufacturing, and discloses a terminal cleaning method for a silicon carbide substrate. The method comprises the following steps: sequentially adopting concentrated sulfuric acid / hydrogen peroxide strong oxidation cleaning, hydrogen peroxide surface pretreatment, hydrochloric acid modified ammonia water / hydrogen peroxide cooperative cleaning, dilute hydrogen fluoride etching and hot nitrogen gradient drying, and the organic residues, metal contaminants and nanoparticles on the surface of the silicon carbide substrate are synchronously and efficiently removed. Meanwhile, by controlling the cleaning conditions of each step, the damage to the surface of the silicon carbide substrate is avoided, and the nitrogen gradient drying is used to eliminate the secondary adsorption problem of particles caused by the traditional centrifugal drying. The whole process is efficient, stable and low in damage, can significantly improve the quality and final performance of the silicon carbide device, meets the strict requirements of industrialization on the ultra-clean substrate, and has a wide application prospect in the field of power semiconductor manufacturing.