The invention discloses a method of forming a flip-
chip semiconductor encapsulation device. The method includes the following steps that:
copper columns are formed on a pad pattern of a
semiconductor chip, and one end of each
copper column, which is far away from the pad pattern, is plated with a
barrier layer, and a predetermined amount of solder is distributed on the barrier
layers, and the solder is coated with
soldering flux; lead frames are provided, and the surfaces of the lead frames are plated with insulating
layers, and openings corresponding to the positions of the
copper columns, are formed in the insulating
layers and
expose a part of leads of the lead frames respectively; the
semiconductor chip is mounted on the lead frames in a flip manner, and the solder contacts with the exposed leads; when refluxing is performed, the solder is melt, and
solder interconnection structures are formed between the copper columns and the exposed leads by means of the
soldering flux; and after the refluxing, a film is attached to a non-
active surface of the chip, and then, encapsulation is performed, and the film is removed, and therefore, the flip-chip semiconductor encapsulation device can be formed. According to the method, the non-
active surface of the chip is not covered with the encapsulation material, so that the formed flip-chip
semiconductor device can have an excellent heat dissipation effect.