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158results about "Sulfur dyes" patented technology
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Multiplex Cellular Assays Using Detectable Cell Barcodes
InactiveUS20110263457A1Improve throughputReduce consumptionOrganic chemistryMicrobiological testing/measurementMultiplexingAnalyte
Owner:THE BOARD OF TRUSTEES OF THE LELAND STANFORD JUNIOR UNIV
Light-emitting material for organo-electroluminescence device and for organic electroluminescence device which the material is applied
InactiveUS6280859B1Methine/polymethine dyesOrganic chemistryOrganic electroluminescenceLight emission
A light-emitting material which serves to emit light having a high brightness and is almost free of deterioration in light emission, and an organic EL device for which the light-emitting material is adapted, the material having the formula [1],
Owner:TOYO INK SC HOLD CO LTD
Resist composition, method of forming resist pattern, compound and acid generator including the same
A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the acid-generator component (B) includes an acid generator (B1) composed of a compound having a base dissociable group within a cation moiety.
Owner:TOKYO OHKA KOGYO CO LTD
Photoacid generators and lithographic resists comprising the same
Owner:THE UNIV OF NORTH CAROLINA AT CHAPEL HILL
High refractive index pressure-sensitive adhesives
InactiveUS20090105437A1Reduce glareReduces reflectanceOrganic chemistryArtificial dyesRefractive indexMonomer
The present invention provides pressure-sensitive adhesives having a refractive index of at least 1.50. The pressure-sensitive adhesives comprise at least one monomer containing a substituted or an unsubstituted biphenyl group.
Owner:3M INNOVATIVE PROPERTIES CO
Photoactive compounds
Owner:MERCK PATENT GMBH
Polyoxyalkylenepolyols and process for producing ring-opened polymer
InactiveUS6531566B1Improve responseImprove adhesionOrganic compound preparationOther chemical processesPolyolHydrogen
A polyoxyalkylene polyol or monool (I) of the general formula (1) below, in which not less than 40% of the terminally located hydroxyl-containing groups, namely -AO-H groups, are primary hydroxyl-containing groups of the general formula (2) below, or;a method of producing ring-opening polymerization products, by subjecting a heterocyclic compound to ring-opening addition polymerization with an active hydrogen-containing compound, using as a catalyst tris(pentafluorophenyl)borane, tris(pentafluorophenyl)aluminum, etc.
Owner:SANYO CHEM IND LTD
Reversible multicolor recording medium and recording method using same
A reversible multicolor thermal recording medium capable of recording and erasing repeatedly high-contrast clear images free of color fogging without causing color deterioration and a method for recording on the recording medium. The reversible multicolor recording medium includes recording layers numbered from the first to the nth, which are formed on a supporting substrate separately and independently in sequential order, the recording layers each containing a reversible thermal color developing composition differing from one another in the hue of the developed color and further containing a light-heat converting composition which generates heat upon absorption of near infrared rays with a wavelength in different ranges, and the recording layers having respectively the absorption peak wavelengths λ max 1, λ max 2, . . . , λ max n, in the near infrared region such that 1500 nm>λ max 1>λ max 2> . . . >λ max n>750 nm.
Owner:SONY CORP
Sulfonium salt, photo-acid generator, and photosensitive resin composition
ActiveUS8617787B2Increase photosensitivityImprove compatibilityOrganic compound preparationPhotosensitive materialsHalogenAlkoxy group
There is provided a sulfonium salt having high photosensitivity to the i-line. The invention relates to a sulfonium salt represented by formula (1) described below: [in formula (1), R1 to R6 each independently represent an alkyl group, a hydroxy group, an alkoxy group, an alkylcarbonyl group, an arylcarbonyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an arylthiocarbonyl group, an acyloxy group, an arylthio group, an alkylthio group, an aryl group, a heterocyclic hydrocarbon group, an aryloxy group, an alkylsulfinyl group, an arylsulfinyl group, an alkylsulfonyl group, an arylsulfonyl group, a hydroxy(poly)alkyleneoxy group, an optionally substituted amino group, a cyano group, a nitro group, or a halogen atom, m1 to m6 each represent the number of occurrences of each of R1 to R6, m1, m4, and m6 each represent an integer of 0 to 5, m2, m3, and m5 each represent an integer of 0 to 4, and X− represents a monovalent polyatomic anion].
Owner:SAN APRO
Communication facilitation
InactiveUS20050063004A1Facilitate communicationEnhanced interactionTelevision system detailsTelevision system scanning detailsData shippingComputer science
Owner:SILVERBROOK RES PTY LTD
Fluorogenic dyes
Owner:NOVARTIS VACCINES & DIAGNOSTICS INC
Lubricating oil additive and lubricating oil composition containing same
ActiveUS20110190185A1Disruptive effectImprove suppression propertiesOrganic chemistryOrganic compound preparationOligomerBoiling point
An overbased salt of an oligomerized alkylhydroxyaromatic compound for use in a lubricating oil composition is disclosed, wherein the alkyl group of the alkylhydroxyaromatic compound is derived from an olefin mixture comprising propylene oligomers having an initial boiling point of at least about 195° C. and a final boiling point of greater than 325° C. and up to about 400° C. as measured by ASTM D86. Also disclosed is a propylene oligomer having an initial boiling point of at least about 195° C. and a final boiling point of greater than 325° C. and up to about 400° C. as measured by ASTM D8, wherein the propylene oligomer contains a distribution of carbon atoms that comprise at least about 50 weight percent of C14 to C20 carbon atoms.
Owner:CHEVRON ORONITE SA
![Aryl or heteroaryl substituted 3,4-dihydroanthracene and aryl or heteroaryl substituted benzo[1,2-g]-chrom-3-ene, benzo[1,2-g]-thiochrom-3-ene and benzo [1,2-g]-1,2-dihydroquinoline derivatives having retinoid antagonist or retinoid inverse agonist type biological activity](https://images-eureka.patsnap.com/patent_img/73151be6-0019-4ff5-bac1-6fd6fc5e3b6f/US20070265449A1-20071115-C00001.png "Aryl or heteroaryl substituted 3,4-dihydroanthracene and aryl or heteroaryl substituted benzo[1,2-g]-chrom-3-ene, benzo[1,2-g]-thiochrom-3-ene and benzo [1,2-g]-1,2-dihydroquinoline derivatives having retinoid antagonist or retinoid inverse agonist type biological activity")
![Aryl or heteroaryl substituted 3,4-dihydroanthracene and aryl or heteroaryl substituted benzo[1,2-g]-chrom-3-ene, benzo[1,2-g]-thiochrom-3-ene and benzo [1,2-g]-1,2-dihydroquinoline derivatives having retinoid antagonist or retinoid inverse agonist type biological activity](https://images-eureka.patsnap.com/patent_img/73151be6-0019-4ff5-bac1-6fd6fc5e3b6f/US20070265449A1-20071115-C00002.png "Aryl or heteroaryl substituted 3,4-dihydroanthracene and aryl or heteroaryl substituted benzo[1,2-g]-chrom-3-ene, benzo[1,2-g]-thiochrom-3-ene and benzo [1,2-g]-1,2-dihydroquinoline derivatives having retinoid antagonist or retinoid inverse agonist type biological activity")
![Aryl or heteroaryl substituted 3,4-dihydroanthracene and aryl or heteroaryl substituted benzo[1,2-g]-chrom-3-ene, benzo[1,2-g]-thiochrom-3-ene and benzo [1,2-g]-1,2-dihydroquinoline derivatives having retinoid antagonist or retinoid inverse agonist type biological activity](https://images-eureka.patsnap.com/patent_img/73151be6-0019-4ff5-bac1-6fd6fc5e3b6f/US20070265449A1-20071115-C00003.png "Aryl or heteroaryl substituted 3,4-dihydroanthracene and aryl or heteroaryl substituted benzo[1,2-g]-chrom-3-ene, benzo[1,2-g]-thiochrom-3-ene and benzo [1,2-g]-1,2-dihydroquinoline derivatives having retinoid antagonist or retinoid inverse agonist type biological activity")
Light-emitting material for organo-electroluminescence device and for organic electroluminescence device which the material is applied
InactiveUS20010033944A1Organic chemistryMethine/polymethine dyesOrganic electroluminescenceLight emission
Owner:TOYO INK SC HOLD CO LTD
Mono-, oligo- and poly-difluorovinyl-(hetero)arylenes, their synthesis and their use as charge transport materials
InactiveUS20030062536A1Liquid crystal compositionsNon-insulated conductorsPolyvinyldifluorideSemiconductor
Owner:MERCK PATENT GMBH
Use of silylated sulfonate monomers to improve contact lens wettability
InactiveUS7732546B2Silicon organic compoundsOrganic compound preparationHydrophilic monomerHydrophile
Owner:BAUSCH & LOMB INC
Anti-Leukocyte Adhesion for the Mitigation of Potential Adverse Events caused by CD3-Specific Binding Domains
Owner:AMGEN RES (MUNICH) GMBH
Resist composition, method of forming resist pattern, compound and acid generator
A compound represented by general formula (b-14); and acid generator consisting of the compound; and a resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-14):wherein R7″ to R9″ each independently represents an aryl group or an alkyl group, wherein two of R7″ to R9″ may be bonded to each other to form a ring with the sulfur atom, and at least one of R7″ to R9″ represents a substituted aryl group in which a portion or all of the hydrogen atoms are substituted with an alkoxyalkyloxy group or an alkoxycarbonylalkyloxy group; and X− represents an anion.
Owner:TOKYO OHKA KOGYO CO LTD
Process for introducing vat dyes and chemicals into textiles
ActiveUS20070033748A1Efficient reductionDye is reduced efficientlyTextile treatment machine partsDyeing processYarnVat dye
A process for using reduced vat dyes in a continuous dyeing process for production of dyed yarns and fabrics of different colors. In the process, dye composition is introduced to a treatment unit for reduction to desired dye composition. The dye concentration in the treatment unit is lower than feeding dye concentration so that dye precipitation does not occur, but significantly higher than the circulating dye concentration so that the dye is reduced efficiently. Although the preferred location for the treatment unit is before the circulation line, it may be at any location before the dip-dye tank.
Owner:SANKO TEKSTIL ISLETMELERI SANAYI & TICARET A S
Sulfur modified silanes for the elaboration of high refractive index materials
ActiveUS20090287015A1Improving dirty mark resistanceGood optical performanceSilicon organic compoundsArtificial dyesThiolSilanes
A composition having a polythiol reactant and an alkenyl silane reactant which are combined to form a polysulfide polysilane. In the process, the reactants are combined in a thiol-ene addition process driven by UV radiation. The polysulfide polysilane is then hydrolyzed and may be combined with other hydrolyzed compounds. For coatings, the polysulfide polysilane is hydrolyzed and may optionally be combined with nanoparticles. For bulk materials, the polysulfide polysilane is hydrolyzed, concentrated and heated to form a high refractive index material which can be used to form lenses.
Owner:ESSILOR INT CIE GEN DOPTIQUE
Sulfonium salt, photo-acid generator, and photosensitive resin composition
ActiveUS20110300482A1Increase photosensitivityImprove compatibilityOrganic compound preparationPhotosensitive materialsArylHalogen
There is provided a sulfonium salt having high photosensitivity to the i-line. The invention relates to a sulfonium salt represented by formula (1) described below: [in formula (1), R1 to R6 each independently represent an alkyl group, a hydroxy group, an alkoxy group, an alkylcarbonyl group, an arylcarbonyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an arylthiocarbonyl group, an acyloxy group, an arylthio group, an alkylthio group, an aryl group, a heterocyclic hydrocarbon group, an aryloxy group, an alkylsulfinyl group, an arylsulfinyl group, an alkylsulfonyl group, an arylsulfonyl group, a hydroxy(poly) alkyleneoxy group, an optionally substituted amino group, a cyano group, a nitro group, or a halogen atom, m1 to m6 each represent the number of occurrences of each of R1 to R6, m1, m4, and m6 each represent an integer of 0 to 5, m2, m3, and m5 each represent an integer of 0 to 4, and X− represents a monovalent polyatomic anion].
Owner:SAN APRO
Iodonium salt photoinitiators containing urethane groups for cationic curing
InactiveUS6380277B1Stable to hydrolysisCost-effective and simple mannerSilicon organic compoundsCarbamic acid derivatives preparationCarbamatePhotoinitiator
The present invention relates to iodonium salts containing urethane groups of reduced crystallization tendency, to a process for their preparation, and to their use for the radiation curing of cationically curing compositions.
Owner:GOLDSCHMIDT GMBH
Infrared shielding filter, solid-state imaging element, and imaging/display device
ActiveCN105122095AFully effective occlusionImprove transmittanceTelevision system detailsOther chemical processesInfraredSpectral transmittance
An infrared shielding filter is provided with an infrared absorption layer formed from a transparent resin that includes infrared absorbing bodies and a selective wavelength shielding layer laminated on this infrared absorption layer, and satisfies the following requirements. (i) In a spectral transmittance curve for an incident angle of 0°, an average transmittance of 80% or greater for wavelengths of 450 - 600 nm, a transmittance of 2.0% or less for wavelengths of 700 - 1200 nm, and transmittance variation D0 given by the following equation of less than 0.04, D0(% / nm) = (Tmax∙0 − Tmin∙0) / (λ(Tmax∙0) − λ(Tmin∙0)) (ii) In a spectral transmittance curve for an incident angle of 30°, an average transmittance of 80% or greater for wavelengths of 450 - 600 nm, a transmittance of 2.0% or less for wavelengths of 700 - 1200 nm, and transmittance variation D30 given by the following equation of less than 0.04. D30(% / nm) = (Tmax∙30 − Tmin∙30) / (λ(Tmax∙30) − λ(Tmin∙30))
Owner:ASAHI GLASS CO LTD
Photopolymer formulation for producing holographic media having highly crosslinked matrix polymers
ActiveUS9146456B2Fast and high crosslinkingMethine/polymethine dyesOrganic chemistryPhotopolymerPhotoinitiator
Owner:COVESTRO DEUTSCHLAND AG
Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition
ActiveUS7799505B2Pattern collapse is improvedEnhance the imageOrganic chemistryOrganic compound preparationPhotochemistryPolycyclic Hydrocarbons
The invention is related to an arylsulfonium salt compound having a polycyclic hydrocarbon structure in a cation moiety.
Owner:FUJIFILM CORP
Positive photosensitive composition
ActiveUS20100136479A1Improve performancePowerfulOrganic chemistryPhotosensitive materialsArylActinic Rays
A positive photosensitive composition includes at least one compound that when exposed to actinic rays or radiation, generates any of the sulfonic acids of general formula (I) and a resin whose solubility in an alkali developer is increased by the action of an acid,wherein each of X1 and X2 independently represents a fluorine atom or a fluoroalkyl group, R1 represents a group with a polycyclic structure, provided that the polycyclic structure may have a substituent, and R2 represents a hydrogen atom, a chain alkyl group, a monocyclic alkyl group, a group with a polycyclic structure or a monocyclic aryl group, provided that each of the chain alkyl group, monocyclic alkyl group, polycyclic structure and monocyclic aryl group may have a substituent, and provided that R1 and R2 may be bonded to each other to thereby form a polycyclic structure.
Owner:FUJIFILM CORP
Resist composition, method of forming resist pattern, compound and acid generator
A compound represented by general formula (b-14); and acid generator consisting of the compound; and a resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-14):wherein R7″ to R9″ each independently represents an aryl group or an alkyl group, wherein two of R7″ to R9″ may be bonded to each other to form a ring with the sulfur atom, and at least one of R7″ to R9″ represents a substituted aryl group in which a portion or all of the hydrogen atoms are substituted with an alkoxyalkyloxy group or an alkoxycarbonylalkyloxy group; and X− represents an anion.
Owner:TOKYO OHKA KOGYO CO LTD
Preparation of functionalized anionic polymerization initiators
InactiveUS20060036050A1Improve stabilityAvoid the needSilicon organic compoundsLithium organic compoundsOrganolithium compoundsCompound (substance)
A process for preparing a functionalized polymerization initiator, the process comprising combining a functionalized styryl compound and an organolithium compound.
Owner:BRIDGESTONE CORP
Salt and coloring curing combination
ActiveCN102838578AImprove solubilityLiquid crystal compositionsOrganic chemistryCarbon numberFluoride
The invention provides a salt. The salt contains at least one anion selected from anodes respectively represented by formulas ( I ), (II), (III) and (IV) and cation having xanthene skeleton, wherein in the formula (I), X1 and X2 respectively represent fluorine atoms or alkyl fluoride group with carbon number of 1-4, or X1 and X2 are bonded to form alkylene fluoride group with carbon number of 2-4; in the formula (II), X3-X5 respectively represent fluorine atoms or alkyl fluoride groups with carbon number of 1-4; in the formula (III), Y1 represents the alkylene fluoride group with carbon number of 1-4; in the formula (IV), Y2 represents the alkyl fluoride group with carbon number of 1-4.
Owner:SUMITOMO CHEM CO LTD +1
Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition
ActiveUS20080138742A1Enhance the imagePattern collapse is improvedOrganic chemistryOrganic compound preparationPhotochemistryPolycyclic Hydrocarbons
The invention is related to an arylsulfonium salt compound having a polycyclic hydrocarbon structure in a cation moiety.
Owner:FUJIFILM CORP
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