The invention relates to a mirror arrangement, in particular for a microlithographic projection
exposure system, comprising a mirror (20), a sensor unit (41, 42, 44, 47, 49) and a
control unit (38). The mirror (20) comprises a mirror body (23) and a reflective surface (24) provided on the mirror body (23). The sensor unit (41, 42, 44, 47, 49) comprises a sensor element (41, 49) and a
signal path (50) extending to the
control unit (38) in order to transmit a measurement
signal representative of the temperature of the sensor element (41, 49) to the
control unit (38). A sensor element (41, 49) is arranged in a substrate of the mirror body (23), the sensor element comprising a plurality of
electrical conductor paths (41) integrated in the substrate of the mirror body (23), and the
electrical conductor paths (41) form a plurality of intersection points (51), and the
electrical conductor paths (41) are electrically conductively connected to one another at the intersection points (51). The invention also relates to a method for measuring the temperature of a mirror (20).