This application provides a
mask layout correction method,
system, medium, program product, and terminal based on a combination of
membrane computing and the
DBSCAN algorithm. The method involves obtaining an initial
layout, performing preliminary clustering on the initial
layout using a preset clustering method to obtain several partitions and their corresponding density and contour features; obtaining initial density and contour parameters for
DBSCAN clustering; iteratively optimizing the initial clustering parameters of the
DBSCAN clustering using a preset
membrane computing algorithm based on the density and contour features of each partition to obtain the optimal clustering parameters for each partition; performing
DBSCAN clustering on each partition based on the corresponding optimal clustering parameters to obtain the core region,
boundary region, and sparse region of the initial layout; and correcting the core region,
boundary region, and sparse region based on a preset correction strategy to obtain the corrected layout of the initial layout. This improves the accuracy of
mask layout correction.