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47results about "Charged particle radiation pressure manipulation" patented technology

Device for realizing light-induced track rotation based on double-light beam misalignment method and method

The invention belongs to the optical micromanipulation system technical field and relates to a device for realizing light-induced track rotation based on a double-light beam misalignment method and a method. The device is composed of two sets of capture light generating systems, a transparent sample pool, a lighting system and a measurement system; the lighting system and the measurement system are adopted as auxiliary systems, so that the rotation track of particles can be measured; the two sets of capture light generating systems are located at two sides of the transparent sample pool and respectively generate Gaussian beams with the same power; the Gaussian beams are inputted into the transparent sample pool from the two sides of the transparent sample pool and irradiate the particles along the tangential direction of the particles to be captured; the lighting system below the transparent sample pool is utilized to provide lighting; and the measurement system above the transparent sample pool is utilized to perform observation and measure the rotation track and rotation amplitude of the particles, and at same time, measure the track rotation speed of the particles. The device and the method have the advantages of high control precision, simple and convenient operation, simple experiment system and the like.
Owner:NAT UNIV OF DEFENSE TECH

Undulator

The invention provides an undulator. The undulator at least comprises M permanent magnet cycles which are sequentially arranged along the direction to which an electron beam transmits; each permanent magnet cycle is composed of four rows of permanent magnet structures, each row comprising N rows of permanent magnet sets, wherein each row of permanent magnet sets comprises K permanent magnet units; M, N and K are all the natural numbers more than and equal to 1; the permanent magnet structures in the four rows are pairwise coupled and then are oppositely arranged at two sides in the along to which the electron beam transmits and relatively displace to form at least one combined magnetic field through which the electron beam emits elliptically polarized light, circularly polarized light or linearly polarized light in any polarizing angle of 0 to 360 degrees, and the electron velocity direction is deviated from the direction of an axis of the undulator. The undulator has the advantages that either linearly polarized light or elliptically and circularly polarized lights can be produced, and the electron velocity direction is deviated from the direction of the axis of the undulator all the times, so that the thermal load of the synchronously-radiated beam lines can be greatly reduced.
Owner:SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI

an undulator

The present invention provides an undulator, wherein the undulator includes at least: M permanent magnet periods arranged in sequence along the electron beam transmission direction, each of the permanent magnet periods includes four rows of permanent magnet structures, and each row of permanent magnets The magnet structure includes N rows of permanent magnet groups, and each row of permanent magnet groups includes K permanent magnet units, wherein M, N, and K are all natural numbers greater than or equal to 1; the permanent magnet structures of the four rows are paired and opposite It is arranged on both sides of the electron beam transmission direction, and can form at least one composite magnetic field through relative displacement, so that when the electron beam passes through the composite magnetic field, it can generate elliptically polarized light, circularly polarized light, or any polarization angle from 0° to 360° direction of linearly polarized light, and make the direction of electron velocity deviate from the axis direction of the undulator. The invention can generate not only linearly polarized light, but also elliptical and circularly polarized light, and can make the direction of electron velocity never along the axial direction of the undulator, thereby greatly reducing the thermal load of the synchrotron radiation beamline.
Owner:SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI
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