The invention discloses a parameterized curve
mask OPC method and device based on segmented Bezier, a medium and a product, and relates to the technical field of
semiconductor manufacturing, and the method comprises the steps: carrying out the continuous transmission
mask optimization of a target pattern, and obtaining a CTM
mask with an auxiliary pattern; performing
level set optimization to obtain a mask
layout; after the contour of the mask
layout is thinned, a Bezier curve is used for fitting, and a pixelated mask is obtained; constructing a mask
error factor matrix by taking an edge placement error as a target, and solving to obtain the movement amount of a
control point; adjusting the position of the
control point according to the movement amount of the
control point and the angular bisector direction to obtain a new control point; and performing Bezier
curve fitting on the new control point, and calculating a weighted edge placement error of an evaluation point in a fitting result. According to the invention, the
imaging quality can be ensured while the data volume is reduced.