104 results about "Merit function" patented technology

The invention provides a method for designing progressive surfaces and lenses produced using image blur to construct a merit function. The shape of a lens surface, or surfaces, is arbitrarily defined and optimized to minimize the image blur based merit function.

Photomask patterns are represented using contours defined by level-set functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks.

Photomask patterns are represented using contours defined by mask functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks.

An optimized aspheric lens has improved optics when implanted into a patient having a curved retina. Light entering the optimized aspheric lens on-axis or at an angle to the optical axis is properly focused by the lens, reducing aberrations and producing a much smaller spot size of light on the retina. A method of selecting the optimized values for variables of the lens design, such as base radii of the front and back surface of the lens, conic constants of the front and back surfaces, and/or center thickness of the lens, among other possible parameters is provided. The method includes calculating changes in a merit function while changing the various values for the variables and selecting an optimized merit function.

The present invention increases the survivability of a helicopter by prioritizing a threat engagement sequence for a laser-based countermeasure system based on the determined relative lethality of each detected visually trained threat (e.g., small arms fire). The system and method defines a plurality of threat effectiveness merit factors, or lethality factors, that are determinable from available helicopter navigation and sensor data, to quantify the danger associated with each detected threat. The system and method then combines the defined lethality factors using a mathematical function, such as a merit function, to numerically quantify the level of threat posed by each threat. The calculated threat values for each of the detected threats are compared to prioritize the threats for engagement by a laser-based countermeasure system, such as a Visual Acquisition Disrupter (VAD) system.

An optical proximity correction method is provided using a modified merit function based upon yield. Known failure mechanisms related to layout geometries are used to derive yield functions based upon distance values between layout features, such as, edge features. In comparing the edge points on the predicted layout pattern with the corresponding point on the design layout pattern, a yield test is first undertaken before movement of the points on the predicted layout pattern to a position of higher yield. Where yield is acceptable, no further movement is made. Where incremental movement of points results in coming within acceptable proximity before acceptable yield is reached, the point is flagged for further consideration.

A spontaneous data communication network includes antenna/transceiver sets located in mobile (e.g., vehicles such as cars, buses, trucks, ferries, etc.) or stationary units (e.g., computers, manufacturing equipment, office furniture, office equipment, road signs, overpasses, bridges, etc.). Each antenna/transceiver set directs network traffic based on optimizing a merit function or penalty function to reduce costs of congestion for stochastically changing demands and flows in a data communication system. The routers exchange values with neighboring routers. Based on the exchanged values and values local to a router, flow conditions are checked and if necessary the local values are adjusted until the flow conditions are satisfied or a time period expires. Adjustments are associated with optimizing a merit function or penalty function. Based on the adjusted values, the router adjusts parameters to be used to direct packets of the network traffic flows to other routers or other destinations within the data communication system. An aggregation scheme is used for reducing the number of values stored in a single router module.

Simultaneous grayscale and geometric registration of images, such as mammograms, facilitates temporal comparison and enhances the speed and reliability of computer aided diagnosis (CAD) detection of medical abnormalities. The method generally includes optimizing a merit function, e.g., sum of squared errors, containing parameters associated with a transformation function for simultaneous geometric and grayscale registering of the images, the optimizing of the merit function being performed by determining optimal values of the parameters using data in the images and registering one image to the other by applying the geometric and grayscale transformation function using the optimal values of the parameters. The optimizing may be performed iteratively from coarse to fine resolutions using a modified Levenberg-Marquardt method for optimizing nonlinear parameters with linear regression for optimizing linear parameters. A final iteration may be performed after removing pixel value pairs from the images that correspond to outliers of a joint pixel value histogram.

A method for determining a motion estimate, comprising: capturing at least two digital images of a scene at different capture times; designating one of the digital images as a reference digital image; designating a plurality of image regions; determining motion estimates for each image region by shifting the image regions within the non-reference digital images according to each of a plurality of spatial offsets relative to the image region within the reference digital image, computing merit function values for each spatial offset providing an indication of a difference between the image region in the reference digital image and the shifted image regions, computing a fitting function that provides an estimated merit function value as a function of spatial offset; and determining the motion estimate responsive to the determined non-integer spatial offset. A combined motion estimate is determined using weighting coefficients determined responsive to the shapes of the fitting functions.

Photomask patterns are represented using contours defined by level-set functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks.

A process for designing and manufacturing an omnidirectional structural color (OSC) multilayer stack. The process can include providing a digital processor operable to execute at least one module and a table of index of refraction values corresponding to different materials that are usable for manufacturing an OSC multilayer stack. An initial design for the OSC multilayer stack can be provided and at least one additional layer is added to the initial design OSC multilayer stack to create a modified OSC multilayer stack. In addition, the thickness of each layer of the modified OSC multilayer stack is calculated using a merit function module until an optimized OSC multilayer stack has been calculated.

Photomask patterns are represented using contours defined by level-set functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks.

A symmetric multiprocessing system includes multiple processing units and corresponding instances of an adaptive partition processing scheduler. Each instance of the adaptive partition processing scheduler selectively allocates the respective processing unit to run process threads of one or more adaptive partitions based on a comparison between merit function values of the one or more adaptive partitions. The merit function for a particular partition of the one or more adaptive partitions may be based on whether the adaptive partition has available budget on the respective central processing unit. The merit function for a particular partition associated with an instance of the adaptive partition scheduler also, or in the alternative, may be based on whether the adaptive partition has available global budget on the symmetric multiprocessing system.

In a method of manufacturing projection objectives including defining an initial design for a projection objective and optimizing the design using a merit function, a set of related projection objectives including a first projection objective and at least one second projection objective is defined. Further, a plurality of merit function components, each of which reflects a particular quality parameter, is defined. One of these merit function components defines a common module requirement requiring that the first projection objective and the second projection objective each include at least one common optical module that is constructed to be substantially identical for the first and the second projection objective. The method results in a set of projection objectives having at least one common optical module. Employing the method in the manufacturing of complex projection objectives, such as projection objectives for microlithography, facilitates the manufacturing process and allows substantial cost savings.

An imaging system on which a calibration method is practiced includes: a light source; a substrate for supporting an object; a patterning mask that generates a substantially periodic spatial pattern on the object; a phase shifter that adjusts the relative position of the patterning mask and object to shift the position of the pattern on the object; a detector that detects images of the object; and an analyzer that analyzes at least three images of the object, each of which represents a different spatial shift of the pattern, the analyzer being configured to remove the spatial pattern from the images to generate an optically sectioned image of the object. The calibration method includes: calibrating the position of the mask relative to the substrate via a phase-voltage technique; calibrating the position of the mask relative to the substrate via a merit function technique; and operating the calibrated imaging system.

Photomask patterns are represented using contours defined by mask functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks. Merit function may approximate electromagnetic field using model of mask pattern as infinitely thin, perfectly conducting pattern. Model may also be used for other lithographic methods, including simulation and verification.

A method for iterative reconstruction of an object containing noise using the pixon method determines the pixon map from a variable that is used to update the object in the iteration. The updating variable is based on an optimized merit function, and smoothes the updating variable during each iteration. The updating variable depends on the reconstruction method, but is typically a gradient of a merit function or a multiplicative update factor. The updated object can optionally also be further smoothed at the end of the iteration, using the pixon map determined during the iteration.

The method for mixing light of LED cluster is disclosed. Firstly, a plurality of LED cluster are provided, then the step is importing the related data, then the step for the continuous genetic algorithm and the merit function are respectively carried out, finally the step for exporting data is achieved. The applied field of the invention is able to comprise LED cluster, fluorescence light source array, and fluorescence lamp array, as well as the other light source field etc.

A method for stabilizing contact lenses includes providing a lens design with a nominal set of stabilization zone parameters, applying a merit function to the lens design based on balancing moments of momentum, and creating a contact lens design with improved stabilization based on the application of the merit functions to the lens design with a nominal set of stabilization zone parameters.