The invention discloses an adjustable unbalanced rectangular plane magnetron sputtering cathode. The adjustable unbalanced rectangular plane magnetron sputtering cathode comprises a frame body, wherein a telescopic device is fixedly installed at the bottom in the frame body, a power device is fixedly installed at the upper end of the telescopic device, a storage device is fixedly installed on each of the two sides of the power device, and telescopic rods are fixedly installed at the ends, away from the power device, of the storage devices; a T-shaped rod is fixedly installed at the end, away from each storage device, of each telescopic rod, a sliding groove is formed in the side wall of the frame body, and the T-shaped rods are located in the sliding groove and is in sliding connection with the side wall of the sliding groove. By arranging the power device and the storage device, the horizontal position of a target material can be changed at any time, the situation that the target material is etched unevenly is reduced, the utilization rate of the target material is improved, the waste of the target material is reduced, by arranging the telescopic device, the distance between the target material and an anode can be changed, the etching degree of the target material can be controlled, and great convenience is brought to daily use.