47results about How to "Efficiently exposed" patented technology

Devices and methods for performing assays on materials, particularly biological materials, are provided. The devices and methods make use of self-sealing members, which can be applied to a flat surface to form wells to facilitate immobilization of materials on the flat surface, then removed to yield a flat surface that facilitates thc performance of processes on and / or detection of the immobilized material.

A seed pan apparatus for attachment to a cutting header having a knife and cooperating knife guards mounted along a lower front edge thereof includes a seed pan adapted at a front portion thereof for attachment to a guard finger such that when attached, the seed pan extends upward and rearward from a front portion of the seed pan forward of the guard finger over the guard finger and knife to a rear end thereof located rearward of the knife. Side walls extend upward from side edges of the seed pan, and side edges of the seed pan diverge from a front end to the rear end. The seed pan is configured such that when the seed pan is attached to the guard finger, side edges of the seed pan are located between the attached guard finger and an adjacent guard finger on each side.

A wafer container utilizes a rigid polymer tubular tower with slots and a “getter” therein for absorbing and filtering moisture and vapors within the wafer container. The tower preferably utilizes a purge grommet at the base of the container and may have a check valve therein to control the flow direction of gas (including air) into and out of the container and with respect to the tower. The tower is sealingly connected with the grommet. The tower may have a getter media piece rolled in an elongate circular fashion forming or shaped as a tube and disposed within the tower and may have axially extending. The media can provide active and / or passive filtration as well as having capabilities to be recharged. Front opening wafer containers for 300 mm sized wafers generally have a pair of recesses on each of the left and right side in the inside rear of the container portions. These recesses are preferably utilized for elongate towers, such towers extending substantially from a bottom wafer position to a top wafer position. In alternative embodiment, a tubular shape of getter material is exposed within the front opening container without containment of the getter other than at the ends. The tubular getter form is preferably supported at discrete locations to maximize exposure to the internal container environment. A blocker member can selectively close the apertures. An elastomeric cap can facilitate securement of the tubular component in the container portion.

An immersion type exposure apparatus comprises: an optical member from which an exposure beam is emitted; a first movable member that is movable while holding a substrate, in a predetermined region including a first region including a position facing the optical member and a second region different from the first region; a second movable member that is movable while holding the substrate independently from a first movable member, in a predetermined region including the first region and the second region; a first connection member that is releasably and alternately connected with the first movable member and the second movable member, and moves one movable member in the first region; a second connection member that is releasably and alternately connected with the first movable member and the second movable member, and moves the other movable member in the second region; and a third movable member that is provided on the first connection member and is movable to a position facing the optical member, and at least one of the first movable member, the second movable member, and the third movable member is moved to the position facing the optical member so that a beam path on the emitting side of the optical member is kept filled with a liquid.

The present invention includes a first and a second optical path forming member arranged within a path of light beams from a light source; a first mounting table provided such that the edge portion of the substrate is located within an application region of the light beams from an outlet side of the first optical path forming member, and a second mounting table provided such that the edge portion of the substrate is located within an application region of the light beams from an outlet side of the second optical path forming member, each of the mounting tables being configured to be rotatable about a vertical axis while mounting the substrate thereon; and a light blocking means for blocking application of light from each of the first and second optical path forming members. A common light source can be used to perform edge exposure for the substrates on the first and second mounting tables, for example, at the same time, so that a high processing ability can be offered and an increase in size of the apparatus can be prevented.

Devices and methods for performing assays on materials, particularly biological materials, are provided. The devices and methods make use of self-sealing members, which can be applied to a flat surface to form wells to facilitate immobilization of materials on the flat surface, then removed to yield a flat surface that facilitates the performance of processes on and / or detection of the immobilized material.

An exposure apparatus for a photosensitive film includes: light-emitting diodes for generating rays to expose a photosensitive film; a light shield positioned between the light-emitting diodes to prevent noise; a stage for receiving a substrate having the photosensitive film thereon; and a parallelizer positioned between the light-emitting diodes and the stage for redirecting the rays from the light-emitting diodes to be perpendicularly incident upon the photosensitive film.

The present invention provides a manufacturing method of a bearing ring member such as an outer ring comprising an installation portion on the outer peripheral surface and a double row of outer-ring raceways on the inner peripheral surface, in which a raw material is processed to obtain a final stage intermediate member through a first upsetting process, a forward-backward extrusion process, a second upsetting process, a burr removing process, and a punching process, wherein a movable die which leaves a stationary die in the final step is used in the second upsetting process, and the excess metal material is moved toward outside in the radial direction to a portion which become the installation section and a burr formation section, exposing a high pure metal material at least in a portion where the load of rolling bodies acts so as to ensure the rolling fatigue life of the both of outer-ring raceways.

Disclosed herein are an apparatus and a method for mixing and / or mulling a sample, the apparatus comprising at least one container made of a flexible material and containing a sample, means for holding the container, and means for impacting the container, wherein the means for holding and the means for impacting are movable relative to each other, and wherein the means for holding, the means for impacting, and the container are arranged such that the means for impacting and the container can repeatedly collide, whereby an energy of collision can be imparted to the sample, thereby mixing and / or mulling the sample. Also disclosed is an assembly for performing high throughput experiments including the apparatus for mixing and / or mulling a sample and an extruder configured to receive a sample weighing less than 100 grams.

An exposure apparatus includes a projection optical system that has a first object field area and a second object field area different from the first object field area and that projects an image of a pattern onto a first image field and a second image field. The image of the pattern is formed in the first image field by exposure light via the first object field area, and the image of the pattern is formed in the second image field by exposure light via the second object field area. A first substrate is exposed with the image of the pattern formed in the first image field, and a second substrate is exposed with the image of the pattern formed in the second image field.