Patents
Literature
8 results about "Pattern space" patented technology
Efficacy Topic
Property
Owner
Technical Advancement
Application Domain
Technology Topic
Technology Field Word
Patent Country/Region
Patent Type
Patent Status
Application Year
Inventor
Elastic member and display device comprising same
ActiveUS12632091B2Details for portable computersIdentification meansDisplay deviceMechanical engineering
Owner:LG INNOTEK CO LTD
Double patterning method of manufacturing select gates and word lines
A double patterning method of manufacturing select gates and word lines is provided in the present invention, including forming first string patterns composed of word line patterns and select gate patterns on a target layer, forming a conformal spacer layer on first string patterns, wherein the spacer layer forms trenches between first string patterns, forming a fill layer filling up the trenches on the spacer layer, removing fill layer outside of the trenches, so that fill layer in the trenches forms second string patterns, wherein the second string patterns and the first string patterns are spaced apart, removing exposed spacer layer, so that the first string patterns and the second string patterns constitute target patterns spaced apart from each other on the target layer, and performing an etching process using those target patterns as a mask to remove exposed target layer, so as to form word lines and select gates.
Owner:POWERCHIP SEMICON MFG CORP
A pattern defect detection and repair method, device, equipment and medium
This invention provides a method, apparatus, device, and medium for pattern defect detection and repair. The method includes: preprocessing an input image to obtain a preprocessed image; extracting pattern units from the preprocessed image and calculating parameters for characterizing the pattern space and feature patterns; detecting and locating defects based on the feature vector of the standard unit and the average adjacent spacing; generating a repaired image block; and fusing the repaired image block with the original image. The aim is to completely solve the core pain points of traditional methods, such as strong reliance on manual intervention, high defect miss rate, poor repair effect, and weak scene adaptability.
Owner:XIAMEN ZIXUN INFORMATION TECHNOLOGY CO LTD
Image encoding / decoding method based on spatial geometric partition mode, method for transmitting bitstream, and recording medium on which bitstream is stored
An image encoding / decoding method, a bitstream transmission method, and a computer-readable recording medium storing a bitstream are provided. An image decoding method according to the present disclosure may be an image decoding method performed by an image decoding apparatus, comprising: constructing candidates for a spatial geometric partition mode (spatial geometric partition mode, SGPM), wherein each of the candidates includes a prediction mode for an intra prediction mode of each partition divided by a partition mode of the SGPM; and predicting a current block based on one of the candidates, wherein a prediction mode of a first candidate among the candidates is determined as information indicating an intra block copy prediction mode of a reference position.
Owner:LG ELECTRONICS INC
Photoetching test pattern generation method and computer equipment
The invention provides a photoetching test pattern generation method and computer equipment. The generation method of the photoetching test pattern comprises the following steps: constructing an initial test pattern; training a de-noising diffusion probability model by using the initial test pattern; combining the trained de-noising diffusion probability model with random noise to obtain a generated test pattern; and screening the generated test pattern to obtain a target test pattern. According to the scheme provided by the invention, simple and multivariate test patterns can be automatically generated, excessive dependence on artificial experience is avoided, the test period is shortened, the consistency and stability of a photoetching process are improved, and the photoetching yield is improved; according to the method, pattern exploration is carried out in a design space specified by a process design suite of a current process node, the boundary of a known pattern space is expanded, features in various design spaces are covered as far as possible, the coverage rate is increased, and generation of a photoetching test pattern is accelerated.
Owner:DONGFANG JINGYUAN ELECTRON LTD
Automatic program repairing method based on mode collaboration
The invention discloses an automatic program repairing method based on mode collaboration, which comprises the following steps of: taking defect codes and change contexts thereof as input, establishing a repairing mode space through change feature representation and template semantic induction, and dividing a repairing task into semantic insertion, statement level, expression level, mixing and the like; on the basis of a pre-training code language model, expert adapters with efficient parameters are constructed for different repair modes, a dynamic gating fusion mechanism is introduced, multiple expert capabilities are adaptively selected and weighted and combined according to representation of defect samples, candidate repair patches are output, and an effective repair result is obtained through engineering constraint verification. Compared with a single-model or single-adapter scheme, the problems of non-uniform data distribution and mutual capability interference in a multi-mode repair scene can be relieved, and the patch generation accuracy and stability are improved.
Owner:XIAN UNIV OF POSTS & TELECOMM
Display apparatus
A display apparatus includes a display area, a peripheral area located outside the display area and including sides and a corner peripheral area that is located between two of the sides that extend in different directions, a display element located in the display area, a first dam portion located in the peripheral area and arranged to surround the display area, and a pattern group located in the corner peripheral area such that the first dam portion is between the display area and the pattern group, wherein the pattern group includes a first pattern portion including a plurality of patterns spaced apart from each other along a radial direction.
Owner:SAMSUNG DISPLAY CO LTD
A method for quickly reconstructing electromagnetic characteristics of a variable posture unmanned aerial vehicle group
This invention discloses a method for rapidly reconstructing the electromagnetic characteristics of an unmanned aerial vehicle (UAV) swarm with variable attitude. The method treats each UAV in the swarm as an independently reusable electromagnetic module, constructing its spherical multi-port response model through a single full-wave simulation. It utilizes analytical spherical propagation operators to describe the free-space electromagnetic coupling between UAVs, and analytically characterizes the impact of UAV attitude and position changes on radiation patterns using spherical geometric transformation and translation operators. After assembling the swarm-level linear system in the spherical pattern space, the radiation and scattering electromagnetic characteristics of the UAV swarm under arbitrary attitude and formation conditions can be rapidly reconstructed without re-performing a full-wave simulation.
Owner:UNIV OF ELECTRONICS SCI & TECH OF CHINA