The invention discloses an integratable nanostructure infrared light source. According to the integratable nanostructure infrared light source, the surface of amorphous silicon is subjected to nano-modification processing by using an MEMS/CMOS (Micro-Electro-Mechanical System/Complementary Metal Oxide Semiconductor) process so as to form tapered nanostructures, and then, the tapered nanostructures are subjected to TiN cladding processing; finally, a silicon substrate is subjected to deep silicon etching by using a front XeF2 release technology, and a narrowband infrared light supply is separated from being in contact with the silicon substrate, so that the heat loss during Ohmic heating of silicon wires is reduced, and the operating power of the light source is increased. According to the integratable nanostructure infrared light source, an MEMS/CMOS light source manufacturing technology is adopted, the surface modification for the infrared light source is realized by using a metal-induced crystallization technology so as to obtain the tapered nanostructures, and the tapered nanostructures are subjected to surface TiN cladding processing, so that a surface plasma resonance technology for Si-TiN and TiN-Air is realized; micro cantilevers are formed by adopting a front release technology and support the infrared light source so as to reduce heat loss, and the structure stress is lowered through pre-burying a dielectric layer, namely silicon nitride, below a heating layer.