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36results about How to "Avoid vignetting" patented technology

Microlithography reduction objective and projection exposure apparatus

A projection objective formed from six mirrors arranged in a light path between an object plane and an image plane is provided. The projection objective, in some examples, is characterized by having a physical distance between the vertexes of adjacent mirrors that is large enough to allow for the six mirrors to have sufficient thickness and stability properties to prevent surface deformations due to high layer tensions. In some embodiments, mirror thickness are such that surface deformations are prevented with mirrors having layer tensions lower than 350 MPa. Mirror surfaces may comprise multilayer systems of Mo/Be or Mo/Si layer pairs. In some examples, the physical distance between a vertex of the third mirror and a vertex of the sixth mirror (S3S6) satisfies the following relationship: 0.3×(a used diameter of the third mirror S3+a used diameter of the sixth mirror S6)<S3S6. In some examples, a ratio of a physical distance between a vertex of the first mirror and a vertex of the third mirror (S1S3) to a physical distance between the vertex of the first mirror and a vertex of the second mirror (S1S2) is within the range of: 0.5<S1S3/S1S2<2. In some examples, the physical mirror surfaces of the mirrors have a rotational symmetry with respect to a principal axis (PA). In some examples, all physical mirror surfaces are aspherical. In some examples, at most five physical mirror surfaces are aspherical. Other examples are provided, along with microlithography projection exposure apparatuses and processes for producing a microelectronic device.
Owner:CARL ZEISS STIFTUNG

Projection system for EUV lithography

An EUV optical projection system includes at least six reflecting surfaces for imaging an object (OB) on an image (IM). The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a secondary mirror (M2) and a tertiary mirror (M3), such that a primary mirror (M1) and the secondary mirror (M2) form a first optical group (G1) and the tertiary mirror (M3), a fourth mirror (M4), a fifth mirror (M5) and a sixth mirror (M6) form a second optical group (G2). The system also preferably includes an aperture stop (APE) located along the optical path from the object (OB) to the image (IM) between the primary mirror (M1) and the secondary mirror (M2). The secondary mirror (M2) is preferably concave, and the tertiary mirror (M3) is preferably convex. Each of the six reflecting surfaces preferably receives a chief ray (CR) from a central field point at an incidence angle of less than substantially 15°. The system preferably has a numerical aperture greater than 0.18 at the image (IM). The system is preferably configured such that a chief ray (CR) converges toward the optical axis (OA) while propagating between the secondary mirror (M2) and the tertiary mirror (M3).
Owner:CARL ZEISS SMT GMBH

Projection system for EUV lithography

An EUV optical projection system includes at least six reflecting surfaces for imaging an object (OB) on an image (IM). The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a secondary mirror (M2) and a tertiary mirror (M3), such that a primary mirror (M1) and the secondary mirror (M2) form a first optical group (G1) and the tertiary mirror (M3), a fourth mirror (M4), a fifth mirror (M5) and a sixth mirror (M6) form a second optical group (G2). The system also preferably includes an aperture stop (APE) located along the optical path from the object (OB) to the image (IM) between the primary mirror (M1) and the secondary mirror (M2). The secondary mirror (M2) is preferably concave, and the tertiary mirror (M3) is preferably convex. Each of the six reflecting surfaces preferably receives a chief ray (CR) from a central field point at an incidence angle of less than substantially 15°. The system preferably has a numerical aperture greater than 0.18 at the image (IM). The system is preferably configured such that a chief ray (CR) converges toward the optical axis (OA) while propagating between the secondary mirror (M2) and the tertiary mirror (M3).
Owner:CARL ZEISS SMT GMBH

Optical system of large-field wide-band airborne differential absorption imaging spectrometer

InactiveCN109489817AHigh radiation energy utilization efficiencyRadiation energy utilization efficiency is improvedAbsorption/flicker/reflection spectroscopyCamera lensGrating
The invention discloses an optical system of a large-field wide-band airborne differential absorption imaging spectrometer, which comprises a front telescopic imaging system and an Offner-Littrow spectral imaging system, wherein the front telescopic imaging system mainly comprises a front ultraviolet objective lens; the Offner-Littrow spectral imaging system specifically comprises an optical filter, an incident slit, a convex grating and a concave reflector; the front ultraviolet objective lens consists of three independent front lenses according to detection wavebands (200-276 nm, 276-380 nm,380-500 nm), and the field of view of each lens reaches 40 degree. The Offner-Littrow spectral imaging system is also independently composed of three spectrometers according to the above wavebands. Each waveband light is focused from a front lens and enters the incident slit of the spectrometer, three groups of spectra to be detected enter the spectrometer through the optical filter at the rear end of the incident slit of the spectrometer, the corresponding spectral information is reflected by the concave reflector and then is split by the convex grating, and the light path is turned to the concave reflector and then focused on a detector. According to the optical system of the large-field wide-band airborne differential absorption imaging spectrometer, the measurement accuracy is ensured, and the whole optical system is compact in size.
Owner:HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI

Projection system for EUV lithography

An EUV optical projection system includes at least six reflecting surfaces for imaging an object (OB) on an image (IM). The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a secondary mirror (M2) and a tertiary mirror (M3), such that a primary mirror (M1) and the secondary mirror (M2) form a first optical group (G1) and the tertiary mirror (M3), a fourth mirror (M4), a fifth mirror (M5) and a sixth mirror (M6) form a second optical group (G2). The system also preferably includes an aperture stop (APE) located along the optical path from the object (OB) to the image (IM) between the primary mirror (M1) and the secondary mirror (M2). The secondary mirror (M2) is preferably concave, and the tertiary mirror (M3) is preferably convex. Each of the six reflecting surfaces preferably receives a chief ray (CR) from a central field point at an incidence angle of less than substantially 15°. The system preferably has a numerical aperture greater than 0.18 at the image (IM). The system is preferably configured such that a chief ray (CR) converges toward the optical axis (OA) while propagating between the secondary mirror (M2) and the tertiary mirror (M3).
Owner:CARL ZEISS SMT GMBH

Optical lens system, image capturing unit and electronic device

An optical lens system includes, in order from an object side to an image side, a first lens element, a second lens element, a third lens element and a fourth lens element. The first lens element with positive refractive power has an object-side surface being convex in a paraxial region thereof. The second lens element has negative refractive power. The third lens element with positive refractive power has an image-side surface being convex in a paraxial region thereof, wherein both of the surfaces thereof are aspheric. The fourth lens element with negative refractive power has an image-side surface being concave in a paraxial region thereof, wherein the image-side surface of the fourth lens element has at least one convex shape in an off-axis region thereof, and both of the surfaces thereof are aspheric. The optical lens system has a total of four lens elements with refractive power.
Owner:LARGAN PRECISION

Optical lens, camera module and electronic equipment

ActiveCN113484982AShorten the overall lengthBalance chromatic aberrationOptical elementsOphthalmologyOptical axis
The invention discloses an optical lens, a camera module and electronic equipment. The optical lens comprises from an object side to an image side along an optical axis: a first lens, wherein the first lens has positive refractive power, and the object-side surface and the image-side surface of the first lens are convex and concave surfaces near the optical axis; a second lens with negative refractive power, wherein the second lens has an object-side surface and an image-side surface being convex and concave in a paraxial region thereof; a third lens with positive refractive power , wherein the third lens has an object-side surface being convex in a paraxial region thereof; a fourth lens which has an object-side surface being concave in a paraxial region thereof; a fifth lens with negative refractive power, wherein the fifth lens has an object-side surface and an image-side surface being concave and convex in a paraxial region thereof; a sixth lens with positive refractive power; a seventh lens, wherein the object side surface of the seventh lens is a convex surface at the optical axis; and an eighth lens with negative refractive power, wherein the eighth lens has an image-side surface being concave in a paraxial region thereof. The optical lens satisfies the following relational expression: f / EPD is more than or equal to 1.62 and less than or equal to 2.16. The optical lens, the camera module and the electronic equipment provided by the embodiment of the invention have the characteristics of large aperture and large image plane, and can realize high-quality imaging.
Owner:JIANGXI JINGCHAO OPTICAL CO LTD

Optical image-taking lens

The invention discloses an optical image-taking lens. The optical image-taking lens comprises four lenses, the four lenses are successively a first lens having positive focal power, a second lens having a negative focal power, a third lens having a positive focal power and a fourth lens having a negative focal power from the object side to the image side, and an optical face of the image side is provided with at least one inflection point. Each lens comprises at least one aspheric surface. The optical image-taking lens further comprises a diaphragm disposed between a photographed object and the second lens and an image sending assembly disposed on an imaging surface. A distance of the first lens from an object side optical surface to the imaging surface on an optical axis is TTL, an overall optical system focal length of the optical image-taking lens is f, a vertical distance between the optical axis and an intersection point projected on the imaging surface by a light ray which passes through the center of the diaphragm at an incident angle relative to the optical axis from an object side direction is Y1, and the optical image-taking lens meets a relational expression: 1.3<TTL/f<1.8, and 0.8<Y1/f<0.98. The optical image-taking lens has the good resolving power, can reduce the total length, and then can be applied to a camera, a mobile phone camera and the like which have good photographing purpose use demand.
Owner:彩晶光电科技(昆山)有限公司

Optical splicing imaging device

InactiveCN112711126AExpand the field of viewReduced relative aperture requirementsOptical elementsEnergy lossEngineering
The invention provides an optical splicing imaging device which comprises a primary imaging optical system and two secondary imaging optical systems; wherein a light splitting element is arranged on a primary image surface of the primary imaging optical system; an image formed by the primary imaging optical system on the primary image surface is divided into two parts after being reflected by the light splitting element and respectively enters two secondary imaging optical systems to carry out secondary imaging; wherein the light splitting element is provided with two reflecting surfaces which are perpendicular to each other, an included angle of 45 degrees is formed between each of the two reflecting surfaces and an incident light beam, and the intersection of the two reflecting surfaces is located on a primary image surface. According to the invention, seamless splicing of the field of view is achieved in an optical splicing mode without field-of-view blind area; so that the energy loss can be reduced to the minimum through arrangement of the light splitting element, and therefore the requirement for the relative aperture of an optical system is lowered, and the machinability of the lens is guaranteed.
Owner:CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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