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38results about How to "Eliminate shielding" patented technology

Multi-ring electron beam radiation source based on cold cathode

The invention belongs to the field of microwave, millimeter wave and terahertz wave band electric vacuum, and provides a multi-ring electron beam radiation source based on a cold cathode. The multi-ring electron beam radiation source comprises a high-frequency beam-wave interaction unit, a cathode substrate with one sealed and fixed end, an anode substrate with the other sealed and fixed end, and an output system device, wherein the high-frequency beam-wave interaction unit is designed in a way that a beam-wave interaction space is divided into Q + 1 electron beam channels by Q cylindrical metal partition plates which are distributed in a nested manner; and the nested cold cathode circular ring emitter on the surface of the cathode substrate simultaneously emits electrons to the corresponding nested annular sleeve high-frequency beam-wave interaction unit, so that the generation and stable transmission of multiple annular electron beams are ensured. The beam-wave interaction unit not only can work in a high-order mode, but also can inhibit the generation of a competition mode, thereby enlarging the beam-wave interaction space, and enabling the output power and efficiency of a radiation source to be greatly improved; and the integration degree of the electric vacuum device is greatly improved.
Owner:UNIV OF ELECTRONICS SCI & TECH OF CHINA

Ion beam etching preheating stabilizing device and ion beam etching preheating stabilizing method

The invention relates to an ion beam etching preheating stabilizing device and an ion beam etching preheating stabilizing method. The device comprises a shielding baffle and a side face rotating support connected with the shielding baffle. The shielding baffle and the side rotating support are located in a vacuum chamber cabin door of an ion beam etching machine; the outer end of the side rotatingsupport is connected with a rotating operation rod, the outer section of the rotating operation rod is a threaded rod section, and the rotating operation rod penetrates through the outer wall of thevacuum chamber in a sealed mode and is adjustably and fixedly connected with the vacuum chamber cabin wall through a locking nut connected with the threaded rod section. When the shielding baffle rotates to the vertical state, the shielding baffle and the workbench are arranged in parallel, the shielding baffle is located right in front of the workbench and behind the ion output end of the ion source; when the shielding baffle rotates to the horizontal state, the shielding baffle is located above the workbench. The device is simple in structure and convenient to operate, the method is easy toimplement, and the problem that the groove etching depth of a machined part is out of tolerance is solved.
Owner:TIANJIN NAVIGATION INSTR RES INST
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