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47results about How to "Increase bit density" patented technology

Memory cell of flash memory and forming method

The invention discloses a memory cell of a flash memory and a forming method. The memory cell of the flash memory comprises a semiconductor substrate, an isolating layer, a base layer selecting grid, a base layer dielectric layer, control grid layers, a memory plugging array and a plurality of polycrystalline silicon layers. The semiconductor substrate comprises an array area and step areas and the step areas are arranged at two sides of the array area. The isolating layer, the base layer selecting grid and the base layer dielectric layer are sequentially arranged on the surface of the semiconductor substrate. The control grid layers are arranged on the surface of the base layer dielectric layer. The control grid layers further comprises a plurality of polycrystalline silicon layers and a plurality of interlayer dielectric layers arranged on the surfaces of the polycrystalline silicon layers. The memory plugging array penetrates through the control grid layers of the array area in a thickness direction. The polycrystalline silicon layers are arranged in the control grid layers of the step areas and form a ladder layer by layer from the lowermost layer to the topmost layer in a decreasing mode. Projections of steps of all levels of the ladder on the semiconductor substrate are arranged in the shape of a line, and the line is parallel to the boundaries of the array area and the step areas. According to the memory cell of the flash memory, bit density of the flash memory is improved, and cost is reduced.
Owner:SEMICON MFG INT (SHANGHAI) CORP

Formation method of memory device

The invention relates to a formation method of a memory device. The method includes the following steps that: a multi-layer overlapped composite layer is formed on the surface of a substrate, the surface of the composite layer is provided with a mask layer, the composite layers include insulating layers and device layers arranged on the surfaces of the insulating layers; a strengthened layer is formed on a part of the side wall surface of the mask layer, and the strengthened layer exposes the top surface and a part of the side wall surface of the mask layer; with the strengthened layer adopted as a mask, the exposed side wall surface of the mask layer is etched, so that a part of the surface of the composite layer at the top is exposed; with the mask layer and the strengthened layer adopted as a mask, the exposed composite layer is etched, the etching thickness of the composite layer is greater than or equal to the thickness of a single device layer; the steps in which the side wall of the mask layer and the composite layer are etched are repeated for once or by a plurality of times until the size of the projection pattern of the plurality of device layers is gradually decreased from the bottom layer to the top layer along at least one direction, so that the plurality of device layers can form a steeped structure which is shrunk gradually from the bottom layer to the top layer. The memory device formed by the method of the invention has the advantages of low space occupancy rate, high bit density and low bit cost.
Owner:SEMICON MFG INT (SHANGHAI) CORP
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