The invention discloses an aperture multi-layer structure-based high-out-of-
band rejection frequency selective
material design method. The method includes the following steps that: (1) a frequency selective material is designed based on an aperture multi-layer structure, wherein the aperture multi-layer structure includes three
layers of structures, namely, a top-layer patch, a bottom-layer patch and a middle coupled aperture layer; (2) an out-of-band transmission null characteristic is realized through constructing a design method of patch displacement of the top-layer patch and the bottom-layer patch, and the
side band cut-off characteristic of the aperture multi-layer structure-based frequency selective material can be further improved; and (3) a unit interdigital technology is adopted to carry out
miniaturization processing on the surface of the frequency selective material, so that the
unit size of the surface of the frequency selective material can be decreased. With the method of the invention adopted, a high-order
coupling characteristic is realized, and the
side band cut-off performance of the frequency selective material can be improved; and the unit interdigital method is adopted, so that the
unit size of the surface of the frequency selective material can be decreased, and angle stability under the incoming of electromagnetic
waves can be improved; and the out-of-
band rejection ability of the frequency selective material is stronger, and the pass-band edge rise performance and sharp drop performance of the frequency selective material are better.