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135results about "Variable capacitor structural combinations" patented technology

Film Actuator Based Mems Device and Method

The present invention discloses a Micro-Electro-Mechanical systems (MEMS) device suitable for use in a range of applications from DC, such as switching electrical signal lines, to RF applications such as tunable capacitors and switches. In an embodiment of the invention, the device comprises a bottom substrate and a top substrate separated at a fixed distance from each other. Disposed between the substrates is a flexible S-shaped membrane having an electrode or an electrically conducting electrode layer with one end attached to the top substrate and the other end in contact with the bottom substrate. An electrically conducting contact block is attached to the underside of the membrane actuator for short circuiting a signal line when the switch is in the closed position. When a voltage is applied between the membrane and an electrode layer on the bottom substrate, the membrane is induced by electrostatic force to deflect in a rolling wave-like motion such that the contact block is displaced into contact with the signal line. The device can be actively opened when a voltage is applied between the membrane actuator and a electrode layer on the top substrate causing the contact block to displace upward breaking contact with the signal line. The MEMS switching device is applicable for use in a switch matrix board for automatically switching telephone lines or in RF applications in the form of a tunable capacitor.
Owner:OBERHAMMER JOACHIM +1

Method of fabricating micro-electromechanical switches on cmos compatible substrates

A method of fabricating micro-electromechanical switches (MEMS) integrated with conventional semiconductor interconnect levels, using compatible processes and materials is described. The method is based upon fabricating a capacitive switch that is easily modified to produce various configurations for contact switching and any number of metal-dielectric-metal switches. The process starts with a copper damascene interconnect layer, made of metal conductors inlaid in a dielectric. All or portions of the copper interconnects are recessed to a degree sufficient to provide a capacitive air gap when the switch is in the closed state, as well as provide space for a protective layer of, e.g., Ta/TaN. The metal structures defined within the area specified for the switch act as actuator electrodes to pull down the movable beam and provide one or more paths for the switched signal to traverse. The advantage of an air gap is that air is not subject to charge storage or trapping that can cause reliability and voltage drift problems. Instead of recessing the electrodes to provide a gap, one may just add dielectric on or around the electrode. The next layer is another dielectric layer which is deposited to the desired thickness of the gap formed between the lower electrodes and the moveable beam that forms the switching device. Vias are fabricated through this dielectric to provide connections between the metal interconnect layer and the next metal layer which will also contain the switchable beam. The via layer is then patterned and etched to provide a cavity area which contains the lower activation electrodes as well as the signal paths. The cavity is then back-filled with a sacrificial release material. This release material is then planarized with the top of the dielectric, thereby providing a planar surface upon which the beam layer is constructed.
Owner:格芯公司
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