79 results about "Focus variation" patented technology

Methods and device structures used to determine the focus quality of a photolithographic pattern or a photolithographic system are disclosed. One aspect of the invention relates to focus masking structures configured to form focus patterns that contain focus information relating to the focus quality. The focus masking structures generally include a plurality of parallel source lines that are separated by alternating phase shift zones. Another aspect of the invention relates to focus patterns that change with changes in focus. The focus patterns generally include a plurality of periodic structures that form measurable shifts therebetween corresponding to the sign and magnitude of defocus. Another aspect of the invention relates to a method of determining the focus quality of a photolithographic pattern or a photolithographic system. The method generally includes: providing a focus masking structure, forming a focus pattern on a work piece with the focus masking structure, and obtaining focus information from the focus pattern. The focus information may be obtained using a variety of techniques, as for example, scatterometry techniques, scanning techniques, imaging techniques, phase based techniques, and the like.

The present invention provides liquid crystal lens element comprising no movable part, having a small size, having a lens function capable of being subjected to stable spherical aberration correction including the power component corresponding to the focus variation of the incident light. The liquid crystal lens element has a variable focal length to the light transmitted through a liquid crystal(16) interposed between a pair of transparent substrates(11, 12). The variable focal length can be varied with the voltage applied to the liquid crystal(16). The liquid crystal lens comprises transparent electrodes(13, 14) provided to the respective transparent substrates(11, 12) and used to apply a voltage to the liquid crystal(16) and an irregular part(17) which has a serrated cross section and a rotational symmetry with respect to the optical axis and is formed of a transparent material on one side of the transparent electrode(13). The liquid crystal(16) is placed at least in the recesses of the irregular part(17) so as to vary the substantial index of refraction of the liquid crystal(16) depending on the applied voltage.

An image-taking apparatus is disclosed which achieves focusing in a reduce time with higher accuracy of an in-focus position search in a TV-AF method to minimize occurrence of unnatural focus changes. The image-taking apparatus includes an image-taking element, a first detector which outputs a focus evaluation value signal based on a predetermined frequency component of an output signal of the image-pickup element, a second detector which outputs a detection signal different from the focus evaluation value signal, and a controller which performs first processing of obtaining information for an in-focus position search of the focus lens based on the focus evaluation value signal. The controller performs second processing of obtaining information on an in-focus position based on the detection signal from the second detector, and performs third processing different depending on a comparison result between the information from the first processing and the information obtained from the second processing.

The invention provides a spectrometer adjusting demonstrator, which comprises a collimator, a telescope and an objective table. The collimator and the telescope are respectively supported at the two sides of the objective table. The spectrometer adjusting demonstrator is characterized in that the collimator and the telescope are assembled together via a convenient-to-assemble/disassemble structure. According to the technical scheme of the invention, the collimator and the telescope are assembled together via the convenient-to-assemble/disassemble structure, so that the internal structure of the spectrometer adjusting demonstrator can be displayed through disassembling the spectrometer adjusting demonstrator at any time as needed. A fluorescent layer arranged on a reticle is capable of displaying the focusing state of the light. Therefore, students can understand the focusing variation condition of the light during the adjusting process.

An exposure measurement apparatus is configured by including a size measurer measuring respective sizes of at least a pair of transferred patterns having mutually different optimal focus positions out of a plurality of transferred patterns formed by being transferred onto a transfer object, a difference value calculator obtaining a difference value between the size of one transferred pattern and the size of the other transferred pattern, a focus variation amount calculator calculating a focus variation amount of the transfer object using the difference value, and an exposure variation amount calculator calculating an exposure error amount of a wafer.

The invention provides a method of acquiring a microscopic image with super field depth. The method comprises the steps: adding a liquid lens with focal length controlled by voltage in a digital microscope light path, performing a series of focusing on the continuous depth range of an observed object by utilizing the liquid lens as a variable focal length element, shooting a series of continuous local focusing pictures, and fusing a super-field-depth clear image including focus information of all heights by utilizing an image fusion processing means. The position where the liquid lens is optimized so as to maintain the amplification factor unchanged in the focus variation process. According to the method, the problems that the traditional optical microscope is excessively small in field depth and objects in a certain depth range cannot be clearly imaged can be effectively solved.

The invention discloses a varifocal reflecting surface system based on a rib column cable network structure, and mainly aims to solve the problems that the focus of a conventional surface cannot be varied and the feed source position is fixed. The varifocal reflecting surface system comprises a feed source (1), a reflecting cable network (2), a support rib rod structure (3), a support cable network (4), vertical pull ropes (5), an annular fixing truss structure (6), a central support rod (7), annular rib joints (9) and a reflecting surface (10), wherein a varifocal sleeve (8) sleeves the outer side of the central support rod (7); the varifocal sleeve (8) is connected with the reflecting cable network (2) and the support cable network (4); the position of the varifocal sleeve (8) is adjusted to change the lengths of the reflecting cable network (2) and the support cable network (4), so that large-scale focus variation that the shape of the reflecting surface (10) transits to a plane from a parabolic plane is achieved. The varifocal reflecting surface system is simple, convenient and flexible in structure, the focus range and the reflection function of the reflecting surface are expanded, and the varifocal reflecting surface system can be applied to convergence or reflection of electromagnetic waves or optical energy of outer space, war ships or the ground.

A method and device is described for compensating ambient temperature dependent magnification and focus change of a zoom lens system, whereby an ambient temperature compensation structure cooperates with a rotational ring and an optical-element adjusting member such that a phase variation between the rotational ring and the optical-element adjusting member in response to an ambient temperature change is compensated and whereby the phase variation characterizes an optical property of the zoom lens system such as magnification or focus.

A method for non-destructive testing a cutting insert to determine coating thickness is disclosed. The method includes the steps of using a source of electromagnetic energy to ablate a surface of the cutting insert to non-destructively form a geometric feature and expose the substrate and each layer of the coating; and measuring the thickness of each layer of the coating. In one example, the geometric feature is a groove with a generally trapezoidal shape. In other examples, the groove can have a U-shape, V-shape, and the like. The thickness of each layer of the coating is determined using focus variation, contrast detection, confocal microscopy, an interferometric microscopy, an imaging interferometric microscopy, or similar technique.

An optical compensation zoom lens comprises a compensating lens group and a zoom lens group. Focus variation of the whole lens is adjusted by changing relative positions of the compensating lens group and the zoom lens assembly. The compensating lens group comprises a convex-concave negative light focal power lens serving as a first lens, a double-concave negative light focal lens serving as a second lens and a double-convex positive light focal lens serving as a third lens, wherein the first lens, the second lens and the third lens are arranged on one side of an object. The zoom lens group comprises a double-convex negative light focal power lens serving as a fourth lens, a concave-concave negative light focal lens serving as a fifth lens and a double-convex positive light focal lens serving as a sixth lens, a concave-concave negative light focal lens serving as a seventh lens, a double-convex positive light focal lens serving as a eighth lens, a concave-concave negative light focal lens serving as a ninth lens, wherein the fourth lens, the fifth lens, the sixth lens, the seventh lens, the eighth lens and the ninth lens are arranged on one side of the object. The optical compensation zoom lens achieves con-focus of visible light imaging and infrared light imaging through the structures of the lens and parameter setting.

A mask with a focus measurement pattern and a method for measuring a focus value in an exposure process using the same that are capable of improving the measurement of a focus change, wherein the mask includes an outer reference pattern which provides a position reference for focus measurement, and focus measurement patterns which are provided apart from the outer reference pattern and formed in a line shape extending in two different directions. Accordingly, the focus change caused in the exposure process can be measured by measuring the line shortening of the focus measurement patterns.

Embodiments of the present invention may be utilized to improve electron beam deflection. One embodiment provides an electrostatic deflection system with electrodes that minimize aberrations and to achieve vertical incidence simultaneously. By using at least two stages of deflection for a deflection direction, the present invention allows the deflected electron beam to pass a back focal plane of an objective lens while deflection capacitors are not disposed across the back focal plane. As a result, deflection electrodes can have an angle of 120° to minimize aberrations and simultaneously achieve vertical incidence of the electron beam on a target to avoid distortions or changes in magnification with height variations of the target or focus variations.

A system and method for calibrating an X-ray tube is provided in which the X-ray tube includes an electronic storage medium associated with the X-ray tube on which calibration information for the X-ray tube is stored. The calibration information includes operating parameters for the focusing elements of the X-ray tube for desired focal spots, tolerance limits for variations in the focal spots and a number of gradient coefficient values corresponding to certain modulation transfer functions (MTF) for the X-ray tube that the imaging system can employ in an iterative manner to correct the operating parameters of the focusing elements to achieve the desired focal spot. This automatic iterative process significantly reduces the time required for the calibration of the X-ray tube. The system and method also employs scan sequencing to minimize the heat generated enabling the scans to be completed in a shorter amount of time than prior calibration processes.