The utility model provides a
semiconductor process device. An optical flatness detection structure obtains surface
topography information of a mechanical arm; the
control unit controls the working state of the optical flatness detection structure; and the analysis and judgment unit receives and analyzes the surface
topography information, judges whether the mechanical arm needs to be cleaned or not, and controls a driving structure and a cleaning structure of the mechanical arm according to a judgment result. According to the utility model, the optical flatness detection structure is arranged to obtain the surface appearance information of the mechanical arm, accurately judge the surface
pollution condition of the mechanical arm, improve the
wafer grabbing reliability of the mechanical arm, avoid cross
contamination of clean wafers caused by the surface
pollution of the mechanical arm, reduce the
downtime risk of a
machine, and improve the product yield; in addition, the surface
pollution of the mechanical arm is detected in time, the maintenance frequency caused by
machine shutdown is reduced, and the production efficiency is improved; and finally, an autonomous
learning unit is arranged, the mechanical
arm surface cleaning alarm accuracy is improved, mechanical
arm surface cleaning is guaranteed, and resource waste caused by invalid cleaning of the mechanical arm is avoided.