The embodiment of the invention provides a preparation method of a conductive pattern. The method comprises the following steps: providing an imprint mold with a first pattern shape on a male mold of the imprint mold, smearing a catalyst
colloid on the male mold, forming a first pattern on the surface of the catalyst
colloid, contacting the male mold with a substrate for 1 s < = T < = 10 min under the pressure of 1 Mpa < = P < = 5 Mpa, so that the catalyst
colloid with the first pattern is transferred to the substrate, and soaking the substrate in the
metal plating solution to obtain the conductive pattern. Compared with the traditional photoetching technology, the conductive pattern prepared by the method does not need the complicated steps of
photoresist coating,
exposure, development and the like, and the
transfer printing process of the first pattern can be realized only by applying certain pressure to the first pattern and the substrate. The whole preparation process does not need assistance of a
light source and is not limited by the
light source. The catalyst colloid only needs to be smeared on the male die and then transferred to the base plate, the using amount of the catalyst colloid is saved, the thickness of the
metal coating can be automatically adjusted according to needs, and certain operation flexibility is achieved.