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Preparation method of display substrate and display device

The invention provides a preparation method of a display substrate and a display device, and relates to the technical field of display, and oxidization of a conductive structure prepared from copper by an oxide insulating layer can be lowered or avoided. The preparation method comprises the following steps that a conductive structure is formed above a substrate, wherein the conductive structure comprises at least one layer in the thickness direction, wherein a layer of the conductive structure which is farthest from the substrate is made of copper; the substrate with the conductive structure is not preheated, or, the time for carrying out pre-heating treatment on the substrate with the conductive structure is 5 seconds or less; and the oxygen-containing reaction gas and the reaction gas containing a preset element are subjected to a chemical vapor deposition reaction, and an oxide insulating layer for covering the conductive structure is formed, wherein the reaction temperature of thechemical vapor deposition reaction is 200-280 DEG C, and the ratio of oxygen atoms to atoms of the preset element in the oxygen-containing reaction gas and the reaction gas containing the preset element is 40:1 to 60:1.
Owner:HEFEI XINSHENG OPTOELECTRONICS TECH CO LTD +1
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