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31results about How to "Improved piezoelectric response" patented technology

Piezoelectric ceramic material with high voltage electric response and high Curie temperature and preparation method thereof

ActiveCN109626988APrecise and controllable stoichiometric ratioShort preparation cycleAdhesiveSlurry
The invention relates to a piezoelectric ceramic material with high voltage electric response and a high Curie temperature and a preparation method thereof. A stoichiometric ratio accords with a chemical general formula (1-x)(K0.48Na0.52)(Nb1-ySby)O3-xBi0.5(Na0.8K0.2)0.5ZrO3; wherein x is more than or equal to 0.02 and less than or equal to 0.04, and y is more than or equal to 0.02 and less than or equal to 0.04. The preparation method comprises the following steps of: (1), preparing a base material according to the stoichiometric ratio and a sodium niobate (NaNbO3) sheet template for texturegrowth of crystal grains; (2), weighing the base material, the template and a MnO2 sintering aid according to the stoichiometric ratio, placing the weighed base material, template and MnO2 sintering aid in a nylon tank, adding a solvent, a dispersant and a binder, and uniformly stirring the mixture to obtain casting slurry with good fluidity; (3) casting the slurry to obtain a strip-shaped thick film, cutting the thick film after the thick film is dried, laminating and hot pressing the thick film into a ceramic blank body; (4) removing the blank body from the adhesive, and sintering the blankbody by using a two-step sintering process to obtain lead-free textured piezoelectric ceramic, wherein the lead-free textured piezoelectric ceramic has high piezoelectric performance and a high Curietemperature. The environment-friendly lead-free piezoelectric ceramic material has higher practical value in the fields of low and medium temperature sensors, transducers, drivers and the like.
Owner:TONGJI UNIV

Method for preparing C-axis preferred orientation aluminum nitride polycrystalline film through magnetron sputtering and aluminum nitride polycrystalline film

The invention provides a method for preparing a C-axis preferred orientation aluminum nitride polycrystalline film through magnetron sputtering and the aluminum nitride polycrystalline film, and relates to the technical field of film material preparation. According to the method, the semiconductor material substrate and the high-purity sputtering aluminum target are relatively vertically arranged,so that the energy of migration movement of sputtering aluminum atomic groups parallel to the surface of the substrate after reaching the substrate can be greatly improved, the C-axis preferred orientation growth of the aluminum nitride film is convenient, and the piezoelectric response and electromechanical coupling coefficient of the film are improved; according to the method, the heating wireis arranged near the semiconductor material substrate, and high-temperature radiation generated by the heating wire performs rapid heat treatment on the aluminum nitride film, so that the crystallization degree of the film can be improved. Therefore, according to the method, the C-axis preferred orientation aluminum nitride thin film can be grown by utilizing the magnetron sputtering technology ata lower temperature, and the obtained aluminum nitride thin film is high in crystallinity, has a higher piezoelectric response coefficient and an electromechanical coupling coefficient, and can be used as a chip material to be applied to a surface acoustic wave device or a bulk acoustic wave device.
Owner:河南科之诚第三代半导体碳基芯片有限公司 +1

C-axis vertical preferred orientation AlN piezoelectric film and preparation method thereof

The invention relates to the technical field of thin film material preparation, in particular to a C-axis vertical preferred orientation AlN piezoelectric thin film and a preparation method thereof, and the preparation method comprises the step: a self-buffer layer AlN thin film, a metal electrode layer and an AlN piezoelectric thin film are sequentially prepared on a sapphire or YAG crystal. Andthe self-buffer layer AlN film induces the orientation of the metal electrode layer, so that the highly C-axis preferred orientation AlN film is prepared on the electrode layer. The sapphire or YAG crystal and the high-purity sputtering target form an angle of 45 degrees, so that the energy of migration motion parallel to the surface of the substrate after sputtering atomic groups reach the substrate is effectively regulated and controlled, the growth of a buffer layer and the C-axis preferred orientation growth of the AlN piezoelectric film are facilitated, and the piezoelectric response andelectromechanical coupling coefficient of the film are improved. According to the method disclosed by the invention, the C-axis preferred orientation AlN film can be grown by utilizing a magnetron sputtering technology at a relatively low temperature, and the obtained AlN film is high in crystallinity and has a relatively high piezoelectric response coefficient and a relatively high electromechanical coupling coefficient.
Owner:CHINA ELECTRONICS TECH GRP NO 26 RES INST

Tin and cerium-strontium titanate solid solution piezoelectric hydrogen production catalyst as well as preparation method and application thereof

The invention relates to the technical field of piezoelectric catalytic hydrogen production materials, and provides a tin and cerium-strontium titanate solid solution piezoelectric hydrogen production catalyst as well as a preparation method and application thereof. The chemical general formula of the material prepared according to the invention is SnxCeySr(1-x-y)TiO3 (x is more than 0 and less than or equal to 0.15, and y is more than 0 and less than or equal to 0.15). A Sr source, a Ce source, a Sn source and a Ti source are mixed with water and ethylene glycol, a coprecipitation method is adopted, a precursor of the tin and cerium-strontium titanate solid solution piezoelectric hydrogen production catalyst is prepared, and finally the solid solution piezoelectric hydrogen production catalyst is formed through high-temperature calcination. The result of the embodiment shows that the piezoelectric hydrogen production performance of SrTiO3 is greatly improved due to the introduction of Sn and Ce. Moreover, when x is equal to 0.1 and y is equal to 0.1, the hydrogen production efficiency is the best, reaches 411 [mu]mol/g and is far higher than 53.45 [mu]mol/g of SrTiO3.
Owner:广东粤绿环境工程有限公司

A method for preparing c-axis preferred orientation aluminum nitride polycrystalline film by magnetron sputtering and aluminum nitride polycrystalline film

The invention provides a method for preparing a C-axis preferred orientation aluminum nitride polycrystalline film by magnetron sputtering and the aluminum nitride polycrystalline film, and relates to the technical field of film material preparation. In the present invention, the semiconductor material substrate and the high-purity sputtering aluminum target are relatively vertically placed, which can greatly increase the energy of migrating and moving parallel to the surface of the substrate after the sputtered aluminum atomic group reaches the substrate, and is conducive to the growth of the C-axis preferred orientation of the aluminum nitride film. Improve the piezoelectric response and electromechanical coupling coefficient of the film; the invention arranges a hot wire near the semiconductor material substrate, and the high-temperature radiation generated by the hot wire performs rapid heat treatment on the aluminum nitride film, which can improve the crystallization degree of the film. Therefore, the method provided by the present invention can realize the growth of C-axis preferred orientation aluminum nitride film by using magnetron sputtering technology at a lower temperature, and the obtained aluminum nitride film has high crystallinity, high piezoelectric response coefficient and electromechanical coupling The coefficient can be used as a chip material in surface acoustic wave devices or bulk acoustic wave devices.
Owner:河南科之诚第三代半导体碳基芯片有限公司 +1

Piezoelectric ceramic material with high piezoelectric response and high Curie temperature and preparation method thereof

ActiveCN109626988BPrecise and controllable stoichiometric ratioShort preparation cycleSlurrySodium niobate
The invention relates to a piezoelectric ceramic material with high piezoelectric response and high Curie temperature and a preparation method thereof, the stoichiometric ratio conforms to the general chemical formula (1-x)(K 0.48 Na 0.52 )(Nb 1‑y Sb y )O 3 ‑xBi 0.5 (Na 0.8 K 0.2 ) 0.5 ZrO 3 ; Wherein, 0.02≤x≤0.04, 0.02≤y≤0.04, its preparation method is: (1) prepare the base material that meets above-mentioned stoichiometric ratio and the sodium niobate (NaNbO 3 ) sheet template; (2) base material, template and MnO 2 The sintering aid is weighed according to the stoichiometric ratio and placed in a nylon tank, and the solvent, dispersant and binder are added and stirred evenly to obtain a casting slurry with good fluidity; (3) the slurry is cast to obtain a long strip Thick film, after the thick film is dried, it is cut, laminated and hot-pressed into a ceramic green body; (4) The green body is debonded, and then the lead-free textured piezoelectric ceramic obtained by sintering with a two-step sintering process has High piezoelectric properties and high Curie temperature. The environment-friendly lead-free piezoelectric ceramic material has high practical value in the fields of low and medium temperature sensors, transducers and drivers.
Owner:TONGJI UNIV
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