35results about How to "Reflect the distribution" patented technology

The utility model discloses a wafer cassette internal pollutant sampling device which comprises a fixed seat, a limiting barrel is fixedly mounted on the surface of the fixed seat, a main driving cylinder is fixedly mounted in the limiting barrel, a lifting table is fixedly mounted at the end of an output shaft of the main driving cylinder, and a mounting seat is fixedly mounted at the top of the lifting table. A sampling assembly A, a sampling assembly B, a sampling assembly C, a sampling assembly D and a sampling assembly E are fixedly arranged on the side wall of the mounting seat, a secondary driving cylinder is arranged on the sampling assembly E, a sampling nozzle is fixedly connected to the end part of an output shaft of the secondary driving cylinder, and a stress seat is arranged on the circumferential outer wall of the sampling nozzle. According to the sampling device for the pollutants in the wafer box, the universality of samples sampled by the sampling nozzle is improved; therefore, impurity samples at different positions of the surface of the wafer can be collected more comprehensively, and the distribution condition and the average content of impurities on the surface of the whole wafer can be reflected more accurately. The wafer quality can be evaluated more accurately.