The invention discloses an
automatic process control method and an
automatic process control system for an
evaporator, which are suitable for a thin film
deposition process under various materials and multi-
process conditions. The
system comprises a process initialization module, a
coating control execution module and a post-
processing and data feedback module. The process initialization module is used for parameter configuration, environment preparation and starting condition confirmation before an
evaporation task is completed, and it is ensured that the
system has basic operation conditions for entering a
coating stage; the
coating control execution module is used for completing electronic gun
power control, plating pot rotating speed adjustment, film thickness real-time detection and thickness closed-loop adjustment in the
evaporation process, and dynamic accurate control over the coating thickness is achieved; the post-
processing and data feedback module is used for automatically turning off an electronic gun, cooling a substrate, breaking vacuum of a cavity, recording process data and updating
control parameters after the coating task is finished, so as to ensure the safe shutdown of equipment and the
continuous optimization capability of the system; the system can automatically complete preparation before
evaporation, coating execution and post-treatment operation.