3 results about "Sodium phenoxide" patented technology

This application discloses a photocatalytic method for dehydrogenating sodium cyclohexoxide, comprising the following steps: mixing sodium cyclohexoxide with a catalyst, and conducting a photocatalytic reaction under light irradiation to obtain sodium phenolate; the catalyst is selected from metal catalysts and / or supported metal catalysts; the metal catalyst is Rh metal particles; the supported metal catalyst is selected from at least one of Pt / TiO2, Pd / TiO2, Rh / TiO2, Rh / Al2O3, and Rh / C. The photocatalytic sodium cyclohexoxide dehydrogenation method provided in this application can achieve rapid hydrogen release from sodium cyclohexoxide without external heating, and has a faster response speed and a faster dehydrogenation rate compared to thermal catalysis. Furthermore, the photocatalytic sodium cyclohexoxide dehydrogenation method of this application can be carried out under sunlight, and the use of solar energy can effectively reduce the cost of sodium cyclohexoxide dehydrogenation, which is beneficial for its large-scale application.

This invention discloses a method for preparing quinone compounds. The method comprises the following steps: in the presence of a base, a compound as shown in Formula II and a compound as shown in Formula III undergo a condensation reaction to obtain a quinone compound as shown in Formula I; wherein the base is more basic than sodium phenolate. This method is simple to operate and suitable for industrial production.

The invention relates to the technical field of solar cells, and particularly discloses a polishing additive for solving the problem of white spots in the pre-rough polishing process of a BC battery and a using method.The polishing additive is prepared from, by weight, 1.0%-10.0% of accelerant, 0.1%-5% of defoaming agent, 0.1%-0.5% of pH regulator, 0.01%-0.1% of surfactant and the balance deionized water; the accelerant is selected from one or a combination of more than two of sodium p-toluenesulfonate, perbenzoic acid, 2-nitroaniline, parachloronitrobenzene and sodium 2-methoxy-5-nitrophenolate; the accelerant is one or a combination of more than two of sodium p-toluenesulfonate, perbenzoic acid, 2-nitroaniline, parachloronitrobenzene and sodium 2-methoxy-5-nitrophenolate; by adopting an alcohol-free and phosphorus-free environment-friendly component design, the polishing additive obviously reduces the difficulty of subsequent sewage treatment while ensuring the efficient polishing performance, avoids the pollution of a traditional alcohol-containing and phosphorus-containing additive to the environment, effectively solves the problem that a silicon wafer is easy to generate white spots after a previous rough polishing process, and also has the advantages of simple process and low cost. And through an optimized surfactant and defoaming agent compounding technology, the surface flatness of the silicon wafer is further improved, and double breakthrough of environmental protection and performance is realized.