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86results about How to "Rapid characterization" patented technology

Method of quickly representing chemical components in sample based on UPLC-QTOF

The invention relates to a method of quickly representing chemical components in a sample based on UPLC-QTOF. Information of the chemical components in the sample is acquired through non-target metabolic profiling analysis of UPLC-QTOF of the sample. The method specifically comprises chromatographic peak extraction, high precision mass spectrometric representation and clustering of ionic fragments of a same substance. The method specifically comprises the following steps: firstly, transforming high resolution mass spectrum data in UPLC-QTOF into a low resolution mass spectrum and extracting chromatographic signals under m / z; correcting a baseline drift problem in the chromatographic signal by means of iterative optimization of local minimum; after baseline correction, optimizing by using a Gaussian smooth ridge line to obtain the positions of the chromatographic peaks in the chromatographic signal; extracting corresponding high-precision mass spectra to represent the chromatographic peaks according to the positions of the chromatographic peaks, wherein each chromatographic peak can correspond to the fragment ionic signal of a compound in a mass spectrum ionic source; and finally, clustering the cracked fragments in the source corresponding to same substance and finally quickly representing the chemical components in the sample.
Owner:NINGXIA MEDICAL UNIV

Method for detecting heat dissipating property of metal heat dissipation device and testing device thereof

ActiveCN104034753AComprehensive thermal performance characterization and evaluationWith modular operationMaterial heat developmentMechanicsHeat spreader
The invention discloses a method for detecting the heat dissipating property of a metal heat dissipation device and a testing device thereof. The method is characterized in that a detected heat dissipation device is arranged in a cavity, a heated end of the detected heat dissipation device is attached with a steady temperature-controllable heat source to raise the temperature of the heat dissipation device, an airflow cooling heat-dissipating device with controllable temperature and adjustable flow rate is arranged at the heat dissipation part of the heat dissipation device, and the temperature of airflows flowing through the heat dissipation device and heated by the heat dissipation device is recorded; when the heat dissipation device is heated and cooled stably, the temperature of the stably heated airflows represents the comprehensive heat dissipation property of the heat dissipation device, that is, the higher the stable temperature of the heated air flows is, the better of the comprehensive heat dissipation property of the heat dissipation device is under the constant heat source with the same temperature and the same cooling condition, therefore, the comprehensive heat dissipation property of the heat dissipation device is represented and estimated; according to the method, the complex heat dissipating process and the contribution of the physical property parameters of the heat dissipating metal and the structural characteristics of the heat dissipation device to the heat dissipating property of the heat dissipation device are comprehensively considered.
Owner:SHANGHAI UNIV

Measure method for combined distribution of nanometer particle concentration and geometrical characteristic quantity

A provided measure method for combined distribution of nanometer particle concentration and geometrical characteristic quantity comprises providing a spectral measurement system; calibrating the spectral measurement system; calibrating the spectral measurement system by utilizing a standard substance; replacing a standard nanoparticle in a measurement sample cell by a to-be measured nanoparticle, and putting a dispersing solvent of the to-be measured nanoparticle into a reference sample cell; then emptying the reference sample cell, and respectively measuring the to-be measured nanoparticle sample, so as to obtain the relative transmittance, the transmittance and a ratio of 90 DEG diffusion light intensity to reference light intensity; obtaining the 90 DEG diffusion light spectrum of the to-be measured nanoparticle; constructing a geometrical model of the to-be measured nanoparticle, and forming a standard spectral database; creating a reverse problem solving model, solving a reverse problem, and connecting the spectrum obtained through measurement and to-be characterized parameter with the standard spectrum data; and calculating the combined distribution of the nanoparticle concentration and the geometrical characteristic quantity, so as to obtain the to-be characterized parameter.
Owner:TSINGHUA UNIV

Methods for making holographic reticles for characterizing optical systems

Characterization of an optical system is quickly and easily obtained in a single acquisition step by obtaining image data within a volume of image space. A reticle and image plane are positioned obliquely with respect to each other such that a reticle having a plurality of feature sets thereon, including periodic patterns or gratings, is imaged in a volume of space, including the depth of focus. Metrology tools are used to analyze the detected or recorded image in the volume of space through the depth of focus in a single step or exposure to determine the imaging characteristics of an optical system. Focus, field curvature, astigmatism, spherical, coma, and/or focal plane deviations can be determined. The present invention is particularly applicable to semiconductor manufacturing and photolithographic techniques used therein, and is able to quickly characterize an optical system in a single exposure with dramatically increased data quality and continuous coverage of the full parameter space. In embodiments, the test reticle is holographically generated by interfering two or more beams of optical radiation. The resulting interference pattern is recorded on a reticle and used for testing the optical system. The geometry of the holographic interference pattern is tightly controlled by the properties of the interfering beams and is therefore more accurate than conventional reticle writing techniques.
Owner:ASML HLDG NV
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