Characterization of an optical
system is quickly and easily obtained in a single acquisition step by obtaining image data within a volume of image space. A
reticle and
image plane are positioned obliquely with respect to each other such that a
reticle having a plurality of feature sets thereon, including periodic patterns or gratings, is imaged in a volume of space, including the
depth of focus.
Metrology tools are used to analyze the detected or recorded image in the volume of space through the
depth of focus in a
single step or
exposure to determine the imaging characteristics of an optical
system. Focus, field curvature,
astigmatism, spherical,
coma, and / or focal plane deviations can be determined. The present invention is particularly applicable to
semiconductor manufacturing and photolithographic techniques used therein, and is able to quickly characterize an optical
system in a
single exposure with dramatically increased
data quality and continuous coverage of the full parameter space. In embodiments, the test
reticle is holographically generated by interfering two or more beams of
optical radiation. The resulting interference pattern is recorded on a reticle and used for testing the optical system. The geometry of the holographic interference pattern is tightly controlled by the properties of the interfering beams and is therefore more accurate than conventional reticle writing techniques.