32 results about "Critical edge" patented technology

One embodiment provides a method for determining mask layouts. During operation, the system can receive a design intent. Next, the system can determine a set of critical edges in the design layout, and select a first edge and a second edge. The system can then determine a first trench and a second trench using the first edge and the second edge, respectively. Note that an edge of the first trench may substantially overlap with the first edge, and an edge of the second trench may substantially overlap with the second edge. Next, the system may assign the first trench and the second trench to the first mask layout and the second mask layout, respectively. The system can then increase the first trench and the second trench, thereby improving pattern fidelity. The resulting mask layouts may be used in a double patterning process.

Photolithographic methods for semiconductor manufacturing are provided wherein photomask structures are designed to provide increased lithographic process windows for printing sub-wavelength features. In one aspect, a photomask includes a mask substrate transparent to exposure light of a given wavelength, and a mask pattern formed on a surface of the substrate. The mask pattern comprises a printable element defined by a first and second critical edge, wherein the printable element includes an inner, non-printing feature formed between the first and second critical edges. The inner, non-printing feature is adapted to enhance image contrast at the first and second critical edges of the printable element for the given wavelength of exposure light during a photolithographic process. The non-printing feature comprises a space feature that exposes a region of the mask substrate aligned to the printable element between the first and second critical edges, and a trench feature that is formed in the mask substrate and aligned to the space feature.

An x-ray system for narrow bandwidth imaging of in particular small objects is provided. X-radiation from an x-ray source (1) is focused by chromatic x-ray optics (2) on an x-ray energy dependent distance from the optics. Asymmetric focusing of the x-ray optics is compensated for by choosing an asymmetric focal spot of the source. The energy selective focusing makes possible blocking unwanted x-ray energies (3) from reaching an object (4). In that way optimization of the energy according to the size of the object can be done to minimize dose and maximize signal-to-noise ratio (7). Furthermore, a critical edge subtraction image can be obtained at the object dependent optimal energy if the object is injected with a contrast agent having an absorption edge close to the optimal energy (8). Radiation is registered (5) and processed (6) to combine structural and energy subtraction images.

The present application relates to a method, an apparatus and a storage medium for locating QR codes. For automatically locating a plurality of QR codes in image of any size, the invention provides an apparatus for locating at least one QR code in an image, comprising: characteristic ratio detection means for detecting the potential QR code location symbol areas by carrying out a plurality of detections for detecting the characteristic ratio of the QR code; critical edge detection means for detecting the critical edges of the potential QR code location symbol areas so that the false areas are excluded; location symbol grouping means for matching the detected QR code location symbol areas into potential QR codes; and verification means for excluding the false QR codes. The invention also provides a corresponding method for locating at least one QR code.

The present application is directed a method for determining the position of photomask patterns in a mask making process. The method comprises providing one or more mask rules defining the minimum spacing between photomask patterns. The method further comprises determining the position of a first photomask pattern relative to an adjacent second photomask pattern, the first photomask pattern having a critical edge for defining a critical dimension of a first device structure and a non-critical edge for defining a non-critical dimension. The non-critical edge is attached to the critical edge so that the positioning of the non-critical edge will affect the length of the critical edge. The non-critical edge of the first photomask pattern is positioned a distance X from an edge of the second photomask pattern, wherein the distance X is chosen to be substantially the minimum spacing allowed by the mask rules. Embodiments directed to software modules for implementing the method and patterning processes employing the method are also disclosed.

Methods of the present disclosure can include methods for prioritized path tracing in a statistical timing analysis of integrated circuits. Methods of the present disclosure can include: determining a required arrival time for a merge point in a statistical timing graph, the merge point having a plurality of associated input edges; calculating a plurality of edge slack distributions for each of the plurality of input edges and the required arrival time at the merge point; projecting a representative edge slack from each of the plurality of edge slack distributions; identifying a most critical input edge based on the plurality of representative edge slacks; generating a prioritized listing of input edges from lowest-value representative edge slack to highest-value representative edge slack; and tracing a next-most critical input edge of the prioritized listing, subsequent to tracing a path from the most critical edge to a source point.

The present application is directed a method for determining the position of photomask patterns in a mask making process. The method comprises providing one or more mask rules defining the minimum spacing between photomask patterns. The method further comprises determining the position of a first photomask pattern relative to an adjacent second photomask pattern, the first photomask pattern having a critical edge for defining a critical dimension of a first device structure and a non-critical edge for defining a non-critical dimension. The non-critical edge is attached to the critical edge so that the positioning of the non-critical edge will affect the length of the critical edge. The non-critical edge of the first photomask pattern is positioned a distance X from an edge of the second photomask pattern, wherein the distance X is chosen to be substantially the minimum spacing allowed by the mask rules. Embodiments directed to software modules for implementing the method and patterning processes employing the method are also disclosed.

A method for edge detection of full-depth convolution feature of standard parts, which includes training full convolution feature neural network, As an initial edge detection model (img file= 'DDA0001789553820000011. TIF' wi= '171' he= '95'/), I2, I3... In... IN, where n is [1, N], n is Z, The images of standard parts were extracted from the original edge detection model (img file = 'DDA0001789553820000012. TIF' wi= '139' he= '88'/), The standard part edge map (img file= 'DDA0001789553820000013. TIF' wi= '683' he= '91'/) is obtained to compare the standard part image In with the standard partedge map (img file= 'DDA00017895 53820000014. TIF 'wi=' 125 'he=' 89 '/) Key points on standard part edge plot (img file=' DDA0001789553820000015. TIF 'wi=' 99 'he=' 89 '/) Edge (img file= 'DDA0001789553820000016. TIF' wi= '150' he= '96'/) Non-critical edge (img file= 'DDA0001789553820000017. TIF' wi= '128' he= '93'/) with the wrong edge (img file= 'DDA0001789553820000018. TIF' wi= '147' he= '94'/) and set the critical edge (img file= 'DDA0001 789553820000019. TIF 'wi=' 115 'he=' 93 '/) as a positive sample, Non-critical edges (img file= 'DDA00017895538200000110. TIF' wi= '133' he= '88'/) andincorrect edges (img file= 'DDA00017895538200000111. TIF 'wi=' 118 'he=' 88 '/) as a negative sample, Expert-aided edge map (img file = 'DDA00017895538200000112. TIF' wi= '700' he= '60'/) is obtainedto reinforce the initial edge detection model. The new edge detection model (img file= 'DDA00017895538200000113. TIF' wi= '163' he= '97'/) was obtained using the edge detection model (img file= 'DDA0001789553820 0000114. TIF 'wi=' 139 'he=' 97 '/) extract image edges of standard part, Obtain the standard part edge map (img file= 'DDA00017895538200000115. TIF' wi= '657' he= '88'/) and judge whetherthe key edge is accurately extracted (img file= 'DDA000178955 38200000116. Re-execute Step C if TIF 'wi=' 700 'he=' 80 '/) and the extracted key edges can meet the requirements, if the requirements cannot be met; To meet the detection requirements, the (img file = 'DDA00017895538200000117. TIF' wi= '138' he= '98'/) is used as the final edge detection model MEdge.

The invention belongs to the automobile field and provides a lane offset determination method and an automobile. According to the method, firstly, a panorama image of an automobile is generated, secondly, grey transformation of the panorama image is carried out in a preset mode, edge enhancement processing of the panorama image after grey transformation is carried out, key edge points of the panorama image after edge enhancement are extracted, clustering processing on the key edge points is carried out, and whether a driving lane of the automobile is offset is determined according to the key edge points after clustering processing. The method is advantaged in that on the basis of a panorama system, lane offset detection is carried out in the panorama mode, lane offset detection accuracy isimproved, and a purpose of improvement of the integration degree of the ADAS technology is realized.

The invention provides a method for manufacturing an airbag for plate loading test of a foundation. The method comprises the following steps: cutting to form a stainless steel outer frame; taking a high-strength flexible impervious material as an airbag material, and cutting the material; sleeving the cut high-strength flexible impervious material by the stainless steel outer frame, enabling the bottom surface of the high-strength flexible impervious material to be consistent with the stainless steel outer frame, and after outwardly turning the high-strength flexible impervious material from the stainless steel outer frame, bonding the high-strength flexible impervious material onto the upper surface of the stainless steel outer frame to form the airbag; filling four corners on the inner side of the air bag to form four supports; and after solidification of a filler filling the four corners on the inner side of the airbag, stacking filler on the surface (four peripheries) of the outwardly turned high-strength flexible impervious material and on the four supports, covering with a stainless steel bearing plate, taking down the stainless steel bearing plate after solidification of the filler, and trimming the filler extruded out of the periphery of the airbag. The method can solve the problem that the critical edge pressure and the deformation modulus of the foundation, which are tested by plate loading test of the foundation, have big errors.

The invention discloses a critical edge and cave entrance protective device and a fixing method of the critical edge and cave entrance protective device. The critical edge and cave entrance protective device and the fixing method of the critical edge and cave entrance protective device comprise a steel pipe body. A protective steel pipe penetrates through the steel pipe body. A locking mechanism used for fixing the protective steel pipe is placed on one side of the middle of the steel pipe body, and comprises a fixing nut welded on the steel pipe body. A threaded hole of the fixing nut is communicated with a pipe hole of the steel pipe body. A locking bolt with a nut is placed in the threaded hole of the fixing nut. A screw is welded, relative to the other end of the locking mechanism, on the steel pipe body. The screw is placed perpendicular to the steel pipe body. A locking nut is placed at the end, away from the steel pipe body, of the screw. When in construction, the screw is inserted in a screw hole of a shear wall, and is locked by the locking nut. The critical edge and cave entrance protective device is simple in structure, convenient to fix, capable of being repeatedly used and low in cost.

A Local Clock Buffer (LCB), an IC chip including registers, some of which may include master/slave latches, locally clocked by the LCB, e.g., providing a launch clock and a capture clock each with an identified critical edge. The LCB includes asymmetrically inductively peaked series connected logic gates (e.g., inverters and/or NAND gates), each with an inductor between gate devices and supply (V_dd) or ground. The series connected gates alternate between having the inductor located between gate devices and the supply and located between gate devices and ground, providing asymmetric inductive peaking to maintain the sharpness of the critical edges. Optionally, corresponding logic gates in multiple LCBs may share the same inductor. Asymmetric inductive peaking allows reducing LCB power without degrading performance.

The invention discloses a soil shear strength parameter testing method based on a critical edge loading formula. The shear strength parameter of soil can be tested in an accurate, rapid, and economicmode. A loading test of the loading plate is developed, two different earth surface load values q1 and q2 are applied at two sides of the loading plate, critical edge load values pcr1 and pcr2 are respectively tested according to the different earth surface load values q1 and q2, and soil cohesive force value c and a soil internal friction angle value Phi are subjected to inverse computation by apcr formula.

The invention discloses a bridging coefficient-based command and control network bridge edge identification method. The method specifically comprises steps of first, building a command and control network model, and constructing a network node adjacency matrix; second, performing statistical analysis on degree of each node in the network, wherein the degree of a node refers to a quantity of edgesdirectly connected with the node; third, calculating a number of public neighbor nodes of two ends of any edge in the network; fourth, calculating a number of edges connected between neighbor nodes oftwo ends of any edge in the network; fifth, calculating a number of all possible edges of two ends of any edge in the network and neighbor nodes of the two ends; sixth, calculating a bridging coefficient of each edge in the network; and seventh, calculating an edge critical degree of each edge in the network. The identified critical edges are protected, so that the invulnerability of the commandand control network is improved.