47results about How to "Increased non-uniformity" patented technology

Methods of resputtering material from the wafer surface include at least one operation of resputtering material under a pressure of at least 10 mTorr. The methods can be used in conjunction with an iPVD apparatus, such as hollow cathode magnetron (HCM) or planar magnetron. The resputtered material may be a diffusion barrier material or a conductive layer material. The methods provide process conditions which minimize the damage to the dielectric layer during resputtering. The methods allow considerable etching of the diffusion barrier material at the via bottom, while not damaging exposed dielectric elsewhere on the wafer. Specifically, they provide a solution for the dielectric microtrenching problem occurring during conventional resputter process. Furthermore, the methods increase the etch rate to deposition rate ratio (E / D) and improve the etch back nonuniformity (EBNU) of resputter process. In general, the methods provide IC devices with higher reliability and decrease wafer manufacturing costs.

The disclosure relates to a pixel circuit which includes an LED, a storage capacitor, a driving transistor, and first to third switching transistors. The driving transistor is utilized to control connection / disconnection between a power supply voltage and the LED. The first switching transistor receives a first scanning signal for controlling connection / disconnection between a gate of the driving transistor and the power supply voltage. The second switching transistor receives a second scanning signal for controlling connection / disconnection between the storage capacity and a ground voltage. The third switching transistor receives the first scanning signal for controlling connection / disconnection between the storage capacity and a data voltage. The first scanning signal and the second scanning signal are in antiphase to each other. A driving method thereof is also disclosed.

Disclosed is an FFS (Fringe Field Switching) mode liquid crystal display. The FFS mode liquid crystal display comprises: a lower substrate and an upper substrate; a gate line formed on the lower substrate; a data line crossing perpendicular to the gate line; a first ITO electrode formed in a region defined by the gate line and the data line; a second ITO electrode of a comb-teeth pattern formed on the lower substrate while being overlapped on the first ITO electrode; and a black matrix formed on the upper substrate, wherein, a wedge portion of the second ITO electrode is formed at a position spaced by a predetermined interval to the inside from an edge section of the black matrix.

The present invention relates to a fluid heating device which can instantaneously heat a fluid which is flowing for the purpose of supply or circulation. It comprises: a ceramic heater in the form of a flat plate having terminal lead wires for applying a power source; partition plates, to top and bottom of the ceramic heater, which allow the fluid which is to be heated to move towards the ceramic heater and which said partition plates have horizontal-movement fluid pathways such that fluid which has been heated by means of the ceramic heater is discharged; a flow path forming plate having a fluid through path such that the fluid on the horizontal-movement fluid pathways can move vertically to the fluid pathway of the next layer; an upper cover having an inlet hole for the supply of a fluid for heating the outside surface of the uppermost partition plate; and a final lower cover having an outlet hole for discharging the heated fluid onto the outside surface of the lowermost partition plate.

A roasting oven includes an enclosure coupled to a source of microwave RF energy, an operable door for sealing the enclosure for RF, the operable door having a viewing aperture which prevents the escape of RF from inside the chamber. A rotating support has an axis which is perpendicular to the viewing aperture such that the progress of roasting may be viewed through the viewing aperture and into a food container placed in the rotating support. The applied power of the microwave RF source and the rotational velocity of the rotating support are selected to provide uniform or wide spectrum roasting of the food item. A roasting profile may include a roasting interval during which the microwave RF source and rotating support are both energized, and subsequently a cool-down interval where the microwave RF source is disabled and the rotating support continues to rotate.

A diffusion media and micro-porous media combination for a fuel cell. A diffusion layer is composed of a diffusion media and has a first (electrode) side and an opposite second (flowfield) side, wherein at least one of the first and second sides has a geometric pattern formed therein comprising a multiplicity of mutually spaced apart regions. A micro-porous media fills the multiplicity of regions and a micro-porous layer composed of the micro-porous media is continuously applied to the first surface.

To provide an electrode for a dielectrophoretic apparatus in which a background detected by reflecting an excited light on an electrode present under the substance (molecule) is reduced and an S / N ratio is enhanced. Also, there is provided an dielectrophoretic apparatus, in an apparatus in which a liquid containing substances to be separated is present in a non-uniform electric field formed by a dielectrophoretic electrode, and separation is carried out by a dielectrophoretic force exerting on the substances, wherein the collecting ability of substances is enhanced. The present invention is characterized in that a vacant space is provided in an electrode whereby substances subjected to influence by a negative dielectrophoretic force can be concentrated in said vacant space of an electrode, or above or below portion of the space.

The present invention relates to an OLED pixel driving circuit which has a data input unit for sending out controlling signals, a voltage storage unit for storing voltages from a first power source, a driving unit for receiving the controlling signals from the data input unit to selectively activate the voltage storage unit, a second power source providing a voltage to be stored in the voltage storage unit; and a switch connected to the second power source to offset potential loss of the first power source from the voltage stored in the voltage storage unit. The compensation circuit can not only compensate the non-uniformity of the threshold voltage but also eliminate the non-uniformity of the OLED display caused by the power IR drop, so that the effect of display of the OLED are maximally improved.

A charging member for charging a member to be charged and an image forming apparatus provided with the same have electrically conductive particles and an electrically conductive particle bearing member having elasticity and bearing the electrically conductive particles thereon, and the degree of cohesion of the electrically conductive particles is 0.1 to 85%. Thereby, the non-uniformity of a halftone image peculiar to particle charging can be improved.

This invention discloses a reaction apparatus for wafer treatment, an electrostatic chuck and a wafer temperature control method, in the field of semiconductor processing. The electrostatic chuck comprises an insulating layer for supporting a wafer and a lamp array disposed in the insulating layer. Each lamp of the lamp array can be independently controlled to turn on and off and / or to adjust the output power. By controlling the on / off switch and / or output power of each lamp of the lamp array the temperature of the wafer held on the ESC is adjusted and temperature non-uniformity can be more favorably adjusted, greatly improving wafer temperature uniformity, particularly alleviating non-radial temperature non-uniformity.

The present disclosure relates to an organic light-emitting display device capable of preventing threshold voltage variation in a thin film transistor. In the organic light-emitting display device according to the present disclosure, an upper light-shielding layer overlying a pixel driving circuit which drives a light-emitting element is disposed on the same plane as an anode electrode and a bank is disposed to cover the sides of the upper light-shielding layer, and thus light input to the sides and the upper surface of an active layer can be blocked.

Bender devices are demonstrated by developing non-uniform fields within a homogeneous, non-planar single slab active member material of non-uniform thickness through geometrical constraints and electrode placement. Single slab actuators are demonstrated for semiconductor designs including MEMS applications. Single slab bender periodic designs are demonstrated to be well suited for MEMS fabrication. Shaped actuators having a topological pattern formed across at least one portion are demonstrated to induced strain at the patterned portion of the actuator, causing the patterned portion to flare into open and close positions upon application of an external field. Voltage transformers, spark generators, power sources, and sensors are developed using the non-planar, homogeneous, single slab active member material of non-uniform thickness. Last, semiconductor process design techniques are demonstrated for periodic and other non-planar single slab actuators.

A current driving device comprises: a voltage supply part; a current supply part; and a plurality of current output parts, each comprising a current-voltage converting function, a voltage-current converting function, and a voltage holding capacitance element. The current output part takes three operation modes. Under a voltage supply mode, the current output part receives a voltage from the voltage supply part and holds the voltage in the voltage holding capacitance element. Under a current supply mode, the current output part receives the current from the current supply part, generates a second voltage by the current-voltage converting function and holds the voltage in the voltage holding capacitance element. Under a current output part, the current output part outputs an output current according to the voltage held in the voltage holding capacitance element by the voltage-current converting function. By charging the current output part with the reference voltage before the calibration performed by using the reference current, calibration of the current output part is performed at a high speed.

An invention is provided for a chemical mechanical planarization apparatus for processing 300 millimeter wafers. The CMP apparatus includes a polishing belt having a belt tension in a range of about 3000 lbs to 4000 lbs. In addition, a platen is disposed below the polishing belt at a positive platen height. The platen includes at least three air pressure zones, with each air pressure zone being capable of providing air pressure to a backside of the polishing belt. The platen can include, for example, eight air pressure zones. In this aspect, a second air pressure zone adjacent to a first outermost air pressure zone provides an air pressure in a range of about 30 psi to 50 psi, such as about 34 psi. In addition, a third air pressure zone a fourth pressure zone can each provide an air pressure in a range of about 4 psi to 13 psi, such as about 7 psi. In this aspect, the remaining air pressure zones can be set to 0 psi, which conserves fluid consumption. Additional fluid consumption reduction can be achieved using a plurality of check values disposed within an air supply system coupled to the platen, wherein the check values prevent negative airflow into the platen.

A rotational antenna and a semiconductor manufacturing device provided with the same are disclosed. The rotational antenna includes a plurality of coils connected in parallel to a high frequency power source and arranged at a regular interval around an axis in a symmetrical relationship with respect to the axis, wherein an electromagnetic field for generating inductively coupled plasma is uniformly formed when the coils are rotated about the axis.

A roasting oven includes an enclosure coupled to a source of microwave RF energy, an operable door for sealing the enclosure for RF, the operable door having a viewing aperture which prevents the escape of RF from inside the chamber. A rotating support has an axis which is perpendicular to the viewing aperture such that the progress of roasting may be viewed through the viewing aperture and into a food container placed in the rotating support. The applied power of the microwave RF source and the rotational velocity of the rotating support are selected to provide uniform or wide spectrum roasting of the food item. A roasting profile may include a roasting interval during which the microwave RF source and rotating support are both energized, and subsequently a cool-down interval where the microwave RF source is disabled and the rotating support continues to rotate.

A substrate processing apparatus comprises: a reaction chamber for processing a substrate using a process gas; a pedestal provided in the reaction chamber and placing the substrate; and a shower head for introducing the process gas into the reaction chamber. The shower head includes a gas dispersion plate which is formed with a plurality of penetrating holes for diffusing the process gas and is provided to face the pedestal. The gas dispersion plate includes a central portion and a perimeter portion having a smaller thickness than the central portion, and the ones of the plurality of penetrating holes provided in the perimeter portion have a smaller length than the ones of the plurality of penetrating holes provided in the central portion.

The disclosure relates to a light beam intensity non-uniformity correction device that includes an optical element having a light entrance face with an antireflective property. According to the invention the antireflective property is locally amended in order to enhance light beam intensity uniformity. The disclosure further relates to a method for amending intensity distribution of a light beam in an optical system having one or more optical elements, where the method includes: a) assembling the optical system with the one or more optical elements arranged in predetermined positions, b) measuring intensity distribution, c) calculating locally required increase or decrease in absorption and / or reflection of one of the optical elements to amend measured intensity distribution into a predetermined intensity distribution, d) removing the optical element from the optical system, e) locally amending absorption and / or reflection of the one of the optical elements according to the calculation, f) installing the optical element in the predetermined position in the optical system.

The disclosure relates to a light beam intensity non-uniformity correction device that includes an optical element having a light entrance face with an antireflective property. According to the invention the antireflective property is locally amended in order to enhance light beam intensity uniformity. The disclosure further relates to a method for amending intensity distribution of a light beam in an optical system having one or more optical elements, where the method includes: a) assembling the optical system with the one or more optical elements arranged in predetermined positions, b) measuring intensity distribution, c) calculating locally required increase or decrease in absorption and / or reflection of one of the optical elements to amend measured intensity distribution into a predetermined intensity distribution, d) removing the optical element from the optical system, e) locally amending absorption and / or reflection of the one of the optical elements according to the calculation, f) installing the optical element in the predetermined position in the optical system.

A current driving device comprises: a voltage supply part; a current supply part; and a plurality of current output parts, each comprising a current-voltage converting function, a voltage-current converting function, and a voltage holding capacitance element. The current output part takes three operation modes. Under a voltage supply mode, the current output part receives a voltage from the voltage supply part and holds the voltage in the voltage holding capacitance element. Under a current supply mode, the current output part receives the current from the current supply part, generates a second voltage by the current-voltage converting function and holds the voltage in the voltage holding capacitance element. Under a current output part, the current output part outputs an output current according to the voltage held in the voltage holding capacitance element by the voltage-current converting function. By charging the current output part with the reference voltage before the calibration performed by using the reference current, calibration of the current output part is performed at a high speed.

The present invention relates to a practical optical amplification module and the like realizing a wide-band gain spectrum with a small relative gain non-uniformity in L band. Pumping light from a pumping light source is supplied to a Bi type EDF by way of an optical coupler. Multiplexed signal light of L band inputted by way of an input end reaches the Bi type EDF by way of an optical coupler, an optical isolator, and an optical coupler, and is collectively amplified in the Bi type EDF. The multiplexed signal light amplified in the Bi type EDF is outputted from an output end by way of an optical coupler, an optical isolator, and an optical coupler.

A display device includes: a display including a plurality of pixels; and a controller configured to: receive an external input image signal, adjust the external input image signal to compensate for brightness deviations of the pixels, and transmit corresponding image data signals to the pixels, wherein the controller includes: a data input section configured to receive the external input image signal and transmit a test image data signal to the pixels through a data driver, a luminance information extracting section configured to: extract brightness information for the pixels after displaying a test image in accordance with the test image data signal, and calculate first, second, and third parameters, using the brightness information, and a data compensating section configured to generate the image data signals by adjusting the external input image signal based on the first, second, and third parameters.

A rotational antenna and a semiconductor manufacturing device provided with the same are disclosed. The rotational antenna includes a plurality of coils connected in parallel to a high frequency power source and arranged at a regular interval around an axis in a symmetrical relationship with respect to the axis, wherein an electromagnetic field for generating inductively coupled plasma is uniformly formed when the coils are rotated about the axis.

A display device and a method of driving the same, in which the display device includes: a light-emitting element; a first capacitor connected between first and second contact points; a driving transistor that has a control terminal connected to the second contact point, an input terminal connected to a driving voltage, and an output terminal connected to the light-emitting element; a first switching transistor connected between a data voltage or a sustain voltage and the first contact point; a second switching transistor connected between the second contact point and the output terminal of the driving transistor; and a third switching transistor connected between a reference current source and the output terminal of the driving transistor.

An FFS (Fringe Field Switching) mode liquid crystal display comprises a lower substrate and an upper substrate and a gate line formed on the lower substrate. A data line crosses perpendicular to the gate line. A first ITO electrode is formed in a region defined by the gate line and the data line. A second ITO electrode of a comb-teeth pattern is formed on the lower substrate while being overlapped on the first ITO electrode. A black matrix formed on the upper substrate, wherein, a wedge portion of the second ITO electrode is formed at a position spaced by a predetermined interval to the inside from an edge section of the black matrix.

A process for the manufacture of a composite structure includes the following stages: a) providing a donor substrate comprising a first surface and a support substrate; b) forming a zone of weakening in the donor substrate, the zone of weakening delimiting, with the first surface of the donor substrate, a working layer; c) assembling the support substrate and the donor substrate; d) fracturing the donor substrate along the zone of weakening; and e) thinning the working layer so as to form a thinned working layer. Stage b) is carried out so that the working layer exhibits a thickness profile appropriate for compensating for the nonuniformity in consumption of the working layer during stage e).

A liquid crystal display device with plastic substrates is disclosed, which comprises: a subsidiary substrate, upper and lower plastic substrates including edge grooves and being fixed on the subsidiary substrate by heat resistant tapes and being joined with liquid crystals sealed there-between, and alignment layers formed on the surfaces which face one another of the upper and lower plastic substrates.

In order to make plating thickness uniform in a metal plating apparatus, a metal plating apparatus capable of performing metal plating to a uniform thickness is provided by aligning lines of electric force uniformly and in parallel by disposing a pair of conductive perforated plates 20a and 20b, which are electrically connected to each other, between plating metals 16 immersed in a plating solution and an object 18 to be plated.

A system and method of cell balancing of a battery pack using a cell balancing device of a battery pack is provided and includes a controller that detects an inter-cell voltage deviation in the battery pack. In addition, the controller is configured to determine whether to perform cell balancing on the battery pack and inactivate a relay connected with the battery pack. The controller is further configured to perform cell balancing in the battery pack.

A method for manufacturing a secondary battery capable of preventing the phenomenon of bending of an electrode stack generated in an activation step, and a secondary battery produced thereby are provided. The method of manufacturing a lithium secondary battery includes (a) a step of manufacturing a lithium secondary battery by embedding an electrode stack together with an electrolyte in a battery case, (b) a step of aging the battery at room temperature, (c) a hot press step of applying pressure and heat to the lithium secondary battery, and (d) a step of charging the battery, in which a stack surface of the electrode stack is laminated by the hot press step. In the process of activating the secondary battery in which the electrolyte is injected by performing a hot press step, it is possible laminate the stack surface of the electrode stack before the charging process.