42results about How to "Improve non-uniformity" patented technology

A susceptor for a plasma process apparatus, the susceptor having a graphite main body with a top surface for supporting at least one substrate, the top surface having a plasma sprayed aluminum oxide coating. A vacuum processing chamber, has a main chamber body, a showerhead provided at the ceiling of the chamber body, a pedestal provided inside the chamber body, and a susceptor coupled to the pedestal, the susceptor is made of a graphite main body having a top surface for supporting at least one substrate, the top surface having a dielectric coating such as, e.g., plasma sprayed aluminum oxide coating.

The invention discloses a method for calibrating a thermal infrared imager pixel point. The method comprises black-body radiation calibration and baffle temperature measurement. The mapping relation of the voltage V and temperature T of infrared imaging can be measured through the black-body radiation calibration. An n value which influences the thermal infrared imager pixel point temperature measurement accuracy is determined through deducing a baffle measured value and calculated value calculation formula for a plurality of times, and accordingly, the thermal infrared imager temperature measurement accuracy is increased. The method has the following advantages that 1, a baffle device temperature measurement method is adopted, the precision of n in a thermal infrared imaging temperature measurement formula is effectively improved, and accordingly, the thermal infrared imaging temperature measurement accuracy is improved; 2, the thermal infrared imaging temperature measurement unevenness can be effectively improved through accurately correcting each pixel of an infrared detector; 3, the baffle emissivity influence on an experiment result is not taken into consideration during the measurement experiment; and 4, the temperature influence on the experiment result is not taken into consideration during the measurement experiment.

The invention relates to an infrared focal plane non-uniformity fingerprint extraction and image correction method which belongs to the technical field of infrared imaging. A production process decides, each infrared focal plane is provided with a relatively stable non-uniformity mode and a rule thereof which varies with temperature, and the two are collectively called fingerprints. The invention provides the definitions of non-conformity fingerprints, analyzes the characteristics of the focal plane non-uniformity in a frequency domain by wavelet decomposition, extracts the non-uniformity fingerprints which belong to the focal plane, and then stores the fingerprints in a storage unit of a detector. When in correction, with the environment temperature as the input parameter, the method can carry out non-uniformity correction under the constraint of the fingerprints after reading the non-uniformity fingerprints at the environment temperature. Compared with convention methods, the method does not need to obtain a background frame with a uniform baffle in every time of correction and has simple correction idea, thereby simplifying the correction device and the correction process, and the image non-uniformity after correction is significantly improved.

The invention discloses a pupil shaping unit structure of a lithography machine and a design method for a diffraction optical element of the pupil shaping unit structure. The pupil shaping unit structure comprises a cascade diffraction optical element and a varifocal collimating lens group, wherein the cascade diffraction optical element comprises a first diffraction optical element and a second diffraction optical element; the light transmittance surfaces of the two diffraction optical elements are perpendicular to the optical axis of a lighting system; the two diffraction optical elements are pure phase elements. The design method for the cascade diffraction optical element comprises the following steps of calculating a period of a phase unit; enabling a light beam to be incident, determining the light intensity distribution of the required optical beam and performing discretization processing; entitling initial phase matrixes of the first diffraction optical element and the second diffraction optical element; performing quantification processing through an iteration algorithm to obtain quantified phase matrixes of the first diffraction optical element and the second diffraction optical element; evaluating a design result.

An organic light emitting display is divided into a light emitting region and a non-light emitting region, the non-light emitting region of the organic light emitting display including: a first substrate; a first passivation layer and a second passivation layer sequentially arranged on the first substrate and having a step in an undercut shape; and an auxiliary electrode layer, an El common layer, and a second layer sequentially arranged throughout the non-light emitting region including the first and second passivation layers, the auxiliary electrode layer being shorted to the second layer in the step at the slope of the second passivation layer or shorted to the first passivation layer in the undercut shape arranged under the second passivation layer.

The invention relates to a zero shutter thermal infrared imager based on a voice operated exchange (VOX) detector. The zero shutter thermal infrared imager based on the VOX detector comprises a high-low temperature chamber and a machine core, wherein a monitor, a computer and a power source are respectively connected with the machine core. The use method of the thermal infrared imager includes the following steps: collecting original images; forecasting a background; revising a point 2 and a point 1; and performing image enhancement display processing. Compared with a usual shutter revision method, the zero shutter thermal infrared imager based on the VOX detector and the use method thereof can effectively reduce the size and the power consumption of an infrared machine core, are unlike a conventional method in which a shutter needs to be used to obtain uniform images at every time of revision, and use the original images as background images to revise, and therefore system design is simplified greatly, the size and the power consumption are reduced, and simultaneously due to zero shutter design, the problems of uneven images caused by heat emitting of the shutter and the like are avoided.

A charging member for charging a member to be charged and an image forming apparatus provided with the same have electrically conductive particles and an electrically conductive particle bearing member having elasticity and bearing the electrically conductive particles thereon, and the degree of cohesion of the electrically conductive particles is 0.1 to 85%. Thereby, the non-uniformity of a halftone image peculiar to particle charging can be improved.

The invention discloses a residual heterogeneous noise elimination method for aiming at thermal infrared image after heterogeneous correction. The method comprises the following steps of 1), imaging a black body by means of an infrared imaging system at different temperature for obtaining an infrared image; 2), performing heterogeneous correction on the obtained black body image; 3), calculating a pixel mean value of the black body image after correction; 4), subtracting the pixel mean value from each pixel value in the black body image after correction and storing results; 5), photographing an outdoor scene image and performing heterogeneous correction; and 6), comparing the image pixel value after correction with the image mean values at different temperatures for finding out a subtraction number array which corresponds with a nearest value, and subtracting the value of the corresponding position in the array from the pixel value for obtaining a new image. According to the residual heterogeneous noise elimination method, defects in a traditional infrared image noise elimination method are settled, and furthermore the residual heterogeneous noise is more effectively and more accurately eliminated. According to the residual heterogeneous noise elimination method, the residual heterogeneous noise in the infrared image can be effectively eliminated without original information loss of the image, and furthermore a high-quality restored image is obtained.

A solar battery surface texturing processing method comprises the following steps: a, providing a silicon wafer (1) and an etching agent (2); b, placing the silicon wafer in a reaction chamber in which the etching agent is placed or above the etching agent to perform chemical vapor etching, or immersing the silicon wafer in the etching agent to perform liquid phase etching; and c, repeating step b at least once. In this texturing processing method, better heterogeneity can be formed, and therefore a good porous layer can be obtained for a silicon wafer in another crystal orientation, thereby obtaining a lower luminous reflectance.

A TFT liquid crystal display (LCD) module comprising a timing controller and a reversal data generator is disclosed. The timing controller provides a plurality of signals to the column-driver and row-driver of LCD panel. The reversal data generator outputs a reversal data signal to the timing controller, which in turn outputs a non-periodic reversal signal to the column-driver. The generation of reversal data signal by the reversal data generator is independent of the timing of the timing controller, or the reversal data signal is a non-periodic signal and the non-periodic reversal signal will change its state within a specific time range posterior to the column start signal.

A liquid crystal display device with plastic substrates is disclosed, which comprises: a subsidiary substrate, upper and lower plastic substrates including edge grooves and being fixed on the subsidiary substrate by heat resistant tapes and being joined with liquid crystals sealed there-between, and alignment layers formed on the surfaces which face one another of the upper and lower plastic substrates.

The invention provides an infrared focal plane polarization detection system calibration method. The method comprises the following steps: preparing equipment before micro-displacement radiation calibration and micro-displacement polarization calibration; carrying out micro-displacement radiation calibration on the focal plane detection system, fitting a gain coefficient and a bias coefficient, solving background noise, and obtaining a response image after micro-displacement radiation correction; after micro-displacement radiation calibration, carrying out micro-displacement polarization calibration on the system, and calculating polarization coefficients at different temperatures according to a polarization imaging model; and averaging the calculated polarization coefficient matrixes at different temperatures to obtain a final polarization coefficient, and correcting the polarization camera according to the final polarization coefficient. According to the invention, the spatial noise of the camera can be reduced, and the non-uniformity of the polarization camera can be corrected.

The invention discloses a signal quality stable output circuit of an infrared detector. The signal quality stable output circuit comprises a main processor FPGA, a temperature acquisition circuit, a detector bias control circuit and a detector signal acquisition circuit; the temperature acquisition circuit acquires the working environment temperature of the infrared detector, digitalizes the temperature and sends the digitalized temperature to the main processor FPGA; the main processor FPGA updates a detector bias voltage working instruction according to the temperature acquired by the temperature acquisition circuit and sends the detector bias voltage working instruction to the detector bias voltage control circuit; the detector bias control circuit updates the working voltage VR and Vgpol of the infrared detector according to a detector bias working instruction. The detector signal acquisition circuit corrects an output analog image signal according to the working voltage VR and Vgpol of the infrared detector, digitizes the analog image signal and sends the digitized analog image signal to the main processor FPGA. Acquisition of the environment temperature is completed through the temperature acquisition circuit, the acquired temperature is used as guidance, prior information is read, the detector bias voltage is configured through the detector bias voltage control circuit,bias voltage real-time configuration is achieved, and image signal output is stabilized.

An optical connector that is assembled at the terminal of an optical fiber cable that integrates an optical fiber and a tension-resisting member extending in the longitudinal direction of the optical fiber, the optical connector including: a connector body having a stationary portion at the rear end thereof, the stationary portion having a threaded portion formed on the outer periphery surface, and a fixing cap that is screwed onto the threaded portion of the stationary portion, wherein the fixing cap fixes the tension-resisting member that has been drawn out from the optical fiber cable terminal by sandwiching the tension-resisting member between the fixing cap and the connector body when the fixing cap is screwed onto the stationary portion.

The invention relates to a method for preparing a film on a large-area substrate through magnetron sputtering. The method comprises the steps that the film is prepared on the substrate with the diameter of 6 inches through a target material with the diameter of 2 inches, wherein the distance between the target material and the substrate is smaller than or equal to 17 cm, the included angle betweenthe target material and the substrate is smaller than or equal to 90 degrees, and the non-uniformity of the thickness of the obtained film is smaller than or equal to 5%. According to the method, the2-inch target material is used, the 6-inch film is prepared by adjusting the included angle between the target material and the substrate, the target-substrate distance and other factors, the non-uniformity of the thickness of the obtained film is smaller than or equal to 5%, and compared with an existing method that a 2-inch target material can only be used for preparing a 4-inch film, the novelmethod has obvious improvement and is improved in the respects of film forming quality and efficiency, cost saving and the like; then, 6-inch film material with good uniformity can be prepared on different material interfaces through the novel method; and according to the method, the overall structure is simple, the functions are comprehensive, a research method is provided for magnetron sputtering coating of a small target and a large substrate, the coating efficiency is improved, and the coating cost is reduced.